SCHEMBL221936

SCHEMBL221936

[Al+3].[Na+].[O-2].[O-2]

nearest known ligand 0.00

Known targets — ChEMBL curated mechanism

ABCC8ACEADORA1ADORA2AADORA2BADORA3ALDH5A1ALOX5ALOX5APATP4AATP4BBRAFCA1CA12CA2CA4CYSLTR1DHFRDPEP1EDNRAEDNRBESR2F10FDPSFGF1GABBR1GABBR2GABRA1GABRA2GABRA3GABRA4GABRA5GABRA6GABRB1GABRB2GABRB3GABRDGABREGABRG1GABRG2GABRG3GABRPGABRQGARTGNRHRGSC1HMGCRIMPDH1IMPDH2KCNJ11LY96NOD2NR3C1NS3NS4ANS5bP2RY1P2RY12P2RY2P2RY4P2RY6PBP2XPDE3APDE3BPDE4APDE4BPDE4CPDE4DPDK1PDK2PDK3PDK4PPARGPPATPTGIRPTGS1PTGS2RAF1RYR1RYR3SCN10ASCN11ASCN1ASCN2ASCN3ASCN4ASCN5ASCN7ASCN8ASCN9ASERPINC1SLC12A1SLC12A3SYKTHRATHRBTLR3TLR4TLR9TUBA1ATUBA1BTUBA1CTUBA3CTUBA3ETUBA4ATUBBTUBB1TUBB2ATUBB2BTUBB3TUBB4ATUBB4BTUBB6TUBB8TYMSVKORC1XDHblablaIMP-1blaOXA-33blaOXA-58blaT-3blaT-4blaT-5blaT-6dacAdacBdacCfolAfolPfolP1ftsIfusAgaggyrAgyrBmecAmrcAmrcBmrdApbp1apbp1bpbp2pbp2apbp2bpbp3pbp4pbpApbpBpbpCpbpFpolponBrplArplBrplCrplDrplErplFrplJrplKrplLrplMrplNrplOrplPrplQrplRrplSrplTrplUrplVrplWrplXrplYrpmArpmBrpmCrpmDrpmErpmFrpmGrpmHrpmIrpmJrpoArpoBrpoCrpoZrpsArpsBrpsCrpsDrpsErpsFrpsGrpsHrpsIrpsJrpsKrpsLrpsMrpsNrpsOrpsPrpsQrpsRrpsSrpsTrpsUykgMykgO

The experimentally established mechanism targets of None. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28094092 1.00
Lithium Ion SCHEMBL31115309 0.87
SCHEMBL30909501 0.87
SCHEMBL1812705 0.82 CA1 (0.33)
SCHEMBL6475092 0.82
SCHEMBL9765580 0.82
SCHEMBL5488590 0.82
SCHEMBL4956668 0.82
SCHEMBL10379776 0.82
SCHEMBL16731977 0.82

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 370 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20260015248-A1 METHOD FOR PRODUCING IOTA ALUMINA AND IOTA ALUMINA NIPPON LIGHT METAL CO (JP) 2026-01-15 US claimed
US-12479726-B2 Method for the high efficiency recycling of iron phosphate black powder slag HUANG ROBERT BRIAN (US) 2025-11-25 US claimed
CN-120149417-A Current collector of non-negative metal battery, preparation method of current collector and non-negative metal battery 江苏中兴派能电池有限公司 2025-06-13 CN claimed
EP-4566994-A1 METHOD FOR PRODUCING IOTA-ALUMINA, AND IOTA-ALUMINA Nippon Light Metal Company, Ltd. (JP) 2025-06-11 EP claimed
US-20240331955-A1 MESOPOROUS NANOCRYSTALLINE FILM ARCHITECTURE FOR CAPACITIVE STORAGE DEVICES THE REGENTS OF THE UNIVERSITY OF CALIFORNIA (US) 2024-10-03 US claimed
CN-114174215-B Method for producing sodium borohydride 日本轻金属株式会社 2024-08-02 CN claimed
US-20240182304-A1 METHOD FOR THE HIGH EFFICIENCY RECYCLING OF IRON PHOSPHATE BLACK POWDER SLAG Watix Technology LLC (US) 2024-06-06 US claimed
CN-117699934-B Water purifying agent and preparation method thereof 克拉玛依市弘智油田技术服务有限公司 2024-05-10 CN claimed
US-20240093020-A1 RESIN COMPOSITION, ADHESIVE SHEET, PREPREG, AND LAMINATE RISHO KOGYO CO., LTD. (JP) 2024-03-21 US claimed
CN-117699934-A Water purifying agent and preparation method thereof 克拉玛依市弘智油田技术服务有限公司 2024-03-15 CN claimed
EP-1409028-A1 BANDAGE USING MOLECULAR SIEVES On Site Gas Systems, Inc. (US) 2004-04-21 EP claimed
US-20030133990-A1 Bandage using molecular sieves Z-MEDICA, LLC 2003-07-17 US claimed
CN-1105401-C Modified wurtzite structrue oxide compounds as substrates for III-V nitride compound semiconductor epitaxial thin film growth UNIV OF CENTRAL FLORIDA (US) 2003-04-09 CN claimed
WO-2002030479-A1 BANDAGE USING MOLECULAR SIEVES ON SITE GAS SYSTEMS, INC. (US) 2002-04-18 WO claimed
CN-1082384-C Catalysts for the treatment of gas containing sulphur compounds, use and process for the treatment of a gas containing sulphur compounds FRANCE PETROLEUM ADMINISTRATIO (FR) 2002-04-10 CN claimed
CN-1159251-A Modified wurtzite structrue oxide compounds as substrates for III-V nitride compound semiconductor epitaxial thin film growth UNIV OF CENTRAL FLORIDA (US) 1997-09-10 CN claimed
US-5625202-A Modified wurtzite structure oxide compounds as substrates for III-V nitride compound semiconductor epitaxial thin film growth UNIVERSITY OF CENTRAL FLORIDA (US) 1997-04-29 US claimed
WO-1996042114-A1 MODIFIED WURTZITE STRUCTURE OXIDE COMPOUNDS AS SUBSTRATES FOR III-V NITRIDE COMPOUND SEMICONDUCTOR EPITAXIAL THIN FILM GROWTH UNIVERSITY OF CENTRAL FLORIDA (US) 1996-12-27 WO claimed
US-5512300-A Prevention of ibuprofen from forming low melting eutectics with other therapeutic agents in solid dosage forms WARNER-LAMBERT COMPANY (US) 1996-04-30 US claimed
US-4212931-A Arrangement comprising a compartment and a conduit COMPAGNIE GENERALE DES ETABLISSEMENTS MICHELIN (FR) 1980-07-15 US claimed