SCHEMBL2220142

SCHEMBL2220142

Cc1ccc(C)c(S(=O)(=O)OS(c2ccccc2)(c2ccccc2)c2ccccc2)c1

nearest known ligand 0.51

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 9/20 0.51
MAPT P10636 5/20 0.51
HTT P42858 3/20 0.51
KMT2A Q03164 2/20 0.51
KDM4E B2RXH2 2/20 0.51
F2 P00734 2/20 0.51
XBP1 P17861 1/20 0.51
TDP1 Q9NUW8 1/20 0.43
APAF1 O14727 1/20 0.41
TSHR P16473 2/20 0.40
LMNA P02545 2/20 0.39
SMN1; SMN2 Q16637 2/20 0.39
HPGD P15428 2/20 0.39
HSD11B1 P28845 1/20 0.39
FFAR4 Q5NUL3 1/20 0.39
GAA P10253 2/20 0.39
MEN1 O00255 1/20 0.39
G6PD P11413 1/20 0.39
L3MBTL1 Q9Y468 1/20 0.39
POLB P06746 2/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2323791 0.82 ALDH1A1 (0.54) ALDH1A1MAPTHTTKMT2AKDM4E
SCHEMBL2955938 0.78 VDR (0.49) ALDH1A1HTTKMT2AKDM4ETDP1
SCHEMBL2964106 0.78 VDR (0.49) ALDH1A1HTTKMT2AKDM4ETDP1
SCHEMBL2962485 0.78 VDR (0.49) ALDH1A1HTTKMT2AKDM4ETDP1
SCHEMBL3144536 0.78 VDR (0.49) ALDH1A1HTTKMT2AKDM4ETDP1
SCHEMBL64190 0.78 VDR (0.49) ALDH1A1HTTKMT2AKDM4ETDP1
SCHEMBL30963734 0.78 ALDH1A1 (0.51) ALDH1A1MAPTHTTKMT2AKDM4E
SCHEMBL757794 0.78 ALDH1A1 (0.51) ALDH1A1MAPTHTTKMT2AKDM4E
SCHEMBL4861379 0.77 ALDH1A1 (0.48) ALDH1A1MAPTHTTKMT2AKDM4E
SCHEMBL4581355 0.77 FFAR4 (0.49) ALDH1A1MAPTHTTKMT2AKDM4E

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1975711-B1 Chemically amplified negative resist composition and patterning process SHINETSU CHEMICAL CO (JP) 2015-08-19 EP disclosed
US-9075306-B2 Chemically amplified negative resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2015-07-07 US disclosed
US-20110177464-A1 CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2011-07-21 US disclosed
US-20080241751-A1 CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2008-10-02 US disclosed
EP-1975711-A1 Chemically amplified negative resist composition and patterning process Shin-Etsu Chemical Co., Ltd. (JP) 2008-10-01 EP disclosed