SCHEMBL22277410

SCHEMBL22277410

C=CCOC(=O)N1CCC(C(C)(C)OC(=O)c2c(I)ccc(I)c2I)CC1

nearest known ligand 0.37

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
LMNA P02545 1/20 0.37
MAPK1 P28482 1/20 0.37
RAB9A P51151 1/20 0.37
GPR119 Q8TDV5 4/20 0.36
ERN1 O75460 3/20 0.33
F2 P00734 1/20 0.32
F10 P00742 1/20 0.32
PLG P00747 1/20 0.32
SIGMAR1 Q99720 1/20 0.32
MEN1 O00255 1/20 0.31
KMT2A Q03164 1/20 0.31
CHRM1 P11229 1/20 0.31
FAAH O00519 1/20 0.31
L3MBTL1 Q9Y468 1/20 0.31
GRIN2B Q13224 1/20 0.31
KDM4E B2RXH2 1/20 0.30
PKM P14618 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL22277391 0.84 GPR119 (0.44) MAPK1RAB9AGPR119KMT2AL3MBTL1
SCHEMBL24179408 0.83 LMNA (0.37) LMNAMAPK1RAB9AGPR119ERN1
SCHEMBL22277405 0.83 SMN1; SMN2 (0.51) RAB9AMEN1KMT2AFAAHGRIN2B
SCHEMBL22277398 0.82 GPR119 (0.34) MAPK1RAB9AGPR119L3MBTL1KDM4E
SCHEMBL22277416 0.81 L3MBTL1 (0.37) GPR119MEN1KMT2AL3MBTL1KDM4E
SCHEMBL26785391 0.77 RAB9A (0.41) LMNAMAPK1RAB9AGPR119ERN1
SCHEMBL23870680 0.77 LMNA (0.38) LMNAMAPK1RAB9AGPR119ERN1
SCHEMBL12991287 0.73 CYP2D6 (0.42) LMNAMAPK1RAB9AGPR119ERN1
SCHEMBL21705235 0.72 GPR119 (0.48) GPR119KDM4EPKM
SCHEMBL21705236 0.70 GPR119 (0.40) GPR119KDM4EPKM

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20200241417-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2020-07-30 US disclosed
US-20200241414-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2020-07-30 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20200241414-A1 RESIST COMPOSITION AND PATTERNING PROCESS INSR, HNRNPU, HNRNPR LMNA 1448/4885MAPK1 2182/4885RAB9A 2749/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.