SCHEMBL22373379

SCHEMBL22373379

COc1cccc(C(=O)OC(C)(C)C2CCNCC2)c1

nearest known ligand 0.51

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
ESR1 P03372 1/20 0.48
ESR2 Q92731 1/20 0.48
HTR2C P28335 2/20 0.47
CES2 O00748 1/20 0.47
CES1 P23141 1/20 0.47
PARP1 P09874 1/20 0.44
ALDH1A1 P00352 1/20 0.44
TYRO3 Q06418 1/20 0.43
THRB P10828 1/20 0.42
TP53 P04637 1/20 0.42
SMN1; SMN2 Q16637 1/20 0.42
ABCG2 Q9UNQ0 1/20 0.42
OPRM1 P35372 1/20 0.42
OPRD1 P41143 1/20 0.42
MEN1 O00255 1/20 0.41
KMT2A Q03164 1/20 0.41
REN P00797 1/20 0.41
P4HB P07237 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL22373531 0.90 ITGB3 (0.40) ALDH1A1TYRO3MEN1KMT2A
SCHEMBL22374189 0.88 NPC1 (0.47) SMN1; SMN2MEN1KMT2A
SCHEMBL22372838 0.87 MEN1 (0.40) HTR2CALDH1A1TYRO3SMN1; SMN2ABCG2
SCHEMBL22372982 0.86 HPGDS (0.49) ALDH1A1SMN1; SMN2
SCHEMBL22372743 0.85 FYN (0.39) ALDH1A1SMN1; SMN2OPRM1OPRD1MEN1
SCHEMBL22373188 0.85 P4HB (0.42) ESR1ESR2PARP1P4HB
SCHEMBL22373108 0.85 HTR2C (0.42) ESR1ESR2HTR2CPARP1SMN1; SMN2
SCHEMBL22373370 0.84 ELANE (0.50) CES2CES1PARP1ALDH1A1SMN1; SMN2
SCHEMBL26785375 0.84 ESR1 (0.38) ESR1ESR2ALDH1A1TYRO3THRB
SCHEMBL22277445 0.84 TP53BP1 (0.36) TYRO3MEN1KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11644753-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-09 US disclosed
US-20230131303-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 US disclosed
US-20230131303-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 US disclosed
US-20200272049-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2020-08-27 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-11644753-B2 Resist composition and patterning process HNRNPU, NSUN2, HNRNPR ESR1 2739/4885ESR2 3290/4885HTR2C 3398/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.