Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 10/20 | 0.65 |
| ▸ | KDM4E | B2RXH2 | 9/20 | 0.65 |
| ▸ | HPGD | P15428 | 7/20 | 0.65 |
| ▸ | KMT2A | Q03164 | 5/20 | 0.65 |
| ▸ | MEN1 | O00255 | 4/20 | 0.65 |
| ▸ | MAPT | P10636 | 3/20 | 0.65 |
| ▸ | HTT | P42858 | 1/20 | 0.65 |
| ▸ | LMNA | P02545 | 2/20 | 0.60 |
| ▸ | THRB | P10828 | 1/20 | 0.60 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.54 |
| ▸ | HSD17B10 | Q99714 | 2/20 | 0.50 |
| ▸ | ERCC1 | P07992 | 1/20 | 0.50 |
| ▸ | FEN1 | P39748 | 1/20 | 0.50 |
| ▸ | ERCC4 | Q92889 | 1/20 | 0.50 |
| ▸ | CYP1B1 | Q16678 | 1/20 | 0.50 |
| ▸ | CES2 | O00748 | 1/20 | 0.48 |
| ▸ | BCHE | P06276 | 1/20 | 0.48 |
| ▸ | CES1 | P23141 | 1/20 | 0.48 |
| ▸ | MCL1 | Q07820 | 1/20 | 0.48 |
| ▸ | PKM | P14618 | 1/20 | 0.47 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL21259178 | 0.89 | KDM4E (0.52) | ALDH1A1KDM4EHPGDKMT2AMEN1 | |
| SCHEMBL66141 | 0.83 | KDM4E (0.61) | ALDH1A1KDM4EHPGDKMT2AMEN1 | |
| SCHEMBL3683874 | 0.83 | KDM4E (0.44) | ALDH1A1KDM4EHPGDKMT2AMEN1 | |
| SCHEMBL5019502 | 0.83 | ALDH1A1 (0.61) | ALDH1A1KDM4EHPGDKMT2AMEN1 | |
| SCHEMBL14262744 | 0.83 | ALDH1A1 (0.65) | ALDH1A1KDM4EHPGDKMT2AMEN1 | |
| SCHEMBL13495450 | 0.83 | ALDH1A1 (0.65) | ALDH1A1KDM4EHPGDKMT2AMEN1 | |
| SCHEMBL28210968 | 0.83 | ALDH1A1 (0.65) | ALDH1A1KDM4EHPGDKMT2AMEN1 | |
| SCHEMBL13741778 | 0.82 | ALDH1A1 (0.60) | ALDH1A1KDM4EHPGDKMT2AMEN1 | |
| SCHEMBL20273092 | 0.81 | KDM4E (0.46) | ALDH1A1KDM4EHPGDKMT2AMEN1 | |
| SCHEMBL17617840 | 0.81 | KDM4E (0.46) | ALDH1A1KDM4EHPGDKMT2AMEN1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 319 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-112094232-B | Synthesis method of N-hydroxynaphthalimide mesylate | 河北凯力昂生物科技有限公司 | 2022-04-08 | — | — | CN | claimed |
| CN-112094232-A | Synthesis method of N-hydroxynaphthalimide mesylate | 河北凯力昂生物科技有限公司 | 2020-12-18 | — | — | CN | claimed |
| US-12036078-B2 | Oral products and methods for producing the same | PolySpectra, Inc. (US) | 2024-07-16 | — | — | US | disclosed |
| US-20240030030-A1 | METHOD FOR MANUFACTURING SEMICONDUCTOR SUBSTRATE AND COMPOSITION | JSR CORPORATION (JP) | 2024-01-25 | — | — | US | disclosed |
| US-20240021429-A1 | METHOD FOR MANUFACTURING SEMICONDUCTOR SUBSTRATE AND COMPOSITION | JSR CORPORATION (JP) | 2024-01-18 | — | — | US | disclosed |
| US-20230350297-A1 | METHODS FOR MAKING FLOW CELL SURFACES | ILLUMINA, INC. | 2023-11-02 | — | — | US | disclosed |
| US-11803122-B2 | Chemical amplification-type photosensitive composition, photosensitive dry film, production method of patterned resist layer, production method of plated molded article, compound, and production method of compound | TOKYO OHKA KOGYO CO., LTD. (JP) | 2023-10-31 | — | — | US | disclosed |
| US-11803122-B2 | Chemical amplification-type photosensitive composition, photosensitive dry film, production method of patterned resist layer, production method of plated molded article, compound, and production method of compound | TOKYO OHKA KOGYO CO., LTD. (JP) | 2023-10-31 | — | — | US | disclosed |
| CN-110892325-B | Photoresist composition | 株式会社LG化学 | 2023-10-20 | — | — | CN | disclosed |
| US-20230314943-A1 | CHEMICALLY AMPLIFIED RESIST COMPOSITION AND METHOD FOR MANUFACTURING RESIST FILM USING THE SAME | MERCK PATENT GMBH (DE) | 2023-10-05 | — | — | US | disclosed |
| CN-110892326-B | Photosensitive resin composition and cured film | 株式会社LG化学 | 2023-09-29 | — | — | CN | disclosed |
| US-20030171618-A1 | Process for producing organic compounds using nitrites | DAICEL CHEMICAL INDUSTRIES, LTD. (JP) | 2003-09-11 | — | — | US | disclosed |
| EP-1342715-A2 | Process for producing oximes using nitirites | Daicel Chemical Industries, Ltd. (JP) | 2003-09-10 | — | — | EP | disclosed |
| EP-1342714-A1 | Process for producing azine compounds and oxime compounds | Daicel Chemical Industries, Ltd. (JP) | 2003-09-10 | — | — | EP | disclosed |
| US-20020058205-A1 | High molecular weight silicone compounds, resist compositions, and patterning method | NAKASHIMA MUTSUO (JP) | 2002-05-16 | — | — | US | disclosed |
| US-6309796-B1 | PHOTORESISTS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2001-10-30 | — | — | US | disclosed |
| US-5972560-A | A CROSSLINKED POLYSILOXANE PHOTOACID GENERATOR HAVING HIGH TRANSPARENCY, HIGH RESOLUTION, IMPROVED LATITUDE OF EXPOSURE, PROCESS ADAPTABILITY, AND FOR PRECISE MICRO-PROCESSING | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 1999-10-26 | — | — | US | disclosed |
| US-5449705-A | Silicon-containing polyamic acid derivative and photosensitive resin composition using it | CHISSO CORPORATION (JP) | 1995-09-12 | — | — | US | disclosed |
| EP-0058638-B1 | CURABLE COMPOSITIONS CONTAINING AN ACID-CURABLE RESIN, AND PROCESS FOR CURING THEM | CIBA-GEIGY AG (CH) | 1985-08-28 | — | — | EP | disclosed |
| EP-0058638-A2 | Curable compositions containing an acid-curable resin, and process for curing them | CIBA-GEIGY AG (CH) | 1982-08-25 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20030171618-A1 | Process for producing organic compounds using nitrites | NOS1, NOS2, NOS3 | ALDH1A1 327/4885KDM4E 1959/4885HPGD 27/4885 |
| US-12036078-B2 | Oral products and methods for producing the same | CROCC, RPAP1, RUVBL1 | ALDH1A1 4171/4885KDM4E 706/4885HPGD 1873/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.