SCHEMBL22580580

SCHEMBL22580580

Cc1ccc(C(=O)Nc2ccc3c(c2)Cc2cc(NC(=O)c4ccc(C)c(C)c4)ccc2-3)cc1C

nearest known ligand 0.58

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ KDM4E B2RXH2 4/20 0.58
▸ ALDH1A1 P00352 3/20 0.58
▸ GAA P10253 1/20 0.58
▸ MAPT P10636 4/20 0.57
▸ HPGD P15428 1/20 0.57
▸ RAB9A P51151 9/20 0.56
▸ NPC1 O15118 8/20 0.56
▸ KMT2A Q03164 5/20 0.56
▸ MEN1 O00255 3/20 0.56
▸ LMNA P02545 2/20 0.56
▸ TDP1 Q9NUW8 1/20 0.56
▸ KCNQ3 O43525 1/20 0.53
▸ KCNQ2 O43526 1/20 0.53
▸ SMN1; SMN2 Q16637 2/20 0.52
▸ NFKB1 P19838 1/20 0.52
▸ NFKB2 Q00653 1/20 0.52
▸ RELA Q04206 1/20 0.52
▸ CYP1A2 P05177 1/20 0.51
▸ ADRA2A P08913 1/20 0.51
▸ MAOA P21397 1/20 0.51

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL15214341 0.85 RAB9A (0.71) KDM4EALDH1A1GAAMAPTHPGD
SCHEMBL13400967 0.84 RAB9A (0.67) KDM4EMAPTRAB9ANPC1KMT2A
SCHEMBL823156 0.84 RAB9A (0.75) MAPTRAB9ANPC1KMT2AMEN1
SCHEMBL25815389 0.82 NPC1 (0.72) ALDH1A1MAPTRAB9ANPC1KMT2A
SCHEMBL22580647 0.81 ACE2 (0.61) ALDH1A1GAAMAPTRAB9ANPC1
SCHEMBL10001968 0.79 TDP1 (0.61) MAPTRAB9ANPC1KMT2AMEN1
SCHEMBL30153426 0.79 FKBP5 (0.63) ALDH1A1MAPTRAB9ANPC1KMT2A
SCHEMBL1949548 0.79 FKBP5 (0.63) ALDH1A1MAPTRAB9ANPC1KMT2A
SCHEMBL25970319 0.78 KDM4E (0.74) KDM4EALDH1A1GAAMAPTHPGD
SCHEMBL22580596 0.78 NPC1 (0.55) ALDH1A1MAPTRAB9ANPC1KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230260787-A1 COMPOSITION FOR FORMING PROTECTIVE FILM AGAINST ALKALINE AQUEOUS HYDROGEN PEROXIDE, SUBSTRATE FOR PRODUCING SEMICONDUCTOR APPARATUS, METHOD FOR FORMING PROTECTIVE FILM, AND METHOD FOR FORMING PATTERN SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-08-17 — — US disclosed
US-11692066-B2 Material for forming organic film, substrate for manufacturing semiconductor device, method for forming organic film, patterning process, and compound for forming organic film SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-07-04 — — US disclosed
US-11676814-B2 Material for forming organic film, substrate for manufacturing semiconductor apparatus, method for forming organic film, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-06-13 — — US disclosed
US-20210311395-A1 MATERIAL FOR FORMING ORGANIC FILM, SUBSTRATE FOR MANUFACTURING SEMICONDUCTOR DEVICE, METHOD FOR FORMING ORGANIC FILM, PATTERNING PROCESS, AND COMPOUND FOR FORMING ORGANIC FILM SHIN-ETSU CHEMICAL CO., LTD. (JP) 2021-10-07 — — US disclosed
US-20200381247-A1 MATERIAL FOR FORMING ORGANIC FILM, SUBSTRATE FOR MANUFACTURING SEMICONDUCTOR APPARATUS, METHOD FOR FORMING ORGANIC FILM, AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2020-12-03 — — US disclosed
US-20200332062-A1 MATERIAL FOR FORMING ORGANIC FILM, SUBSTRATE FOR MANUFACTURING SEMICONDUCTOR DEVICE, METHOD FOR FORMING ORGANIC FILM, PATTERNING PROCESS, AND COMPOUND FOR FORMING ORGANIC FILM SHIN-ETSU CHEMICAL CO., LTD. (JP) 2020-10-22 — — US disclosed
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