SCHEMBL10001968

SCHEMBL10001968

Cc1ccc(C(=O)Nc2ccc(-c3ccc(NC(=O)c4ccc(C)c(C)c4)cc3C(=O)O)c(C(=O)O)c2)cc1C

nearest known ligand 0.62

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
▸ TDP1 Q9NUW8 2/20 0.61
▸ RAB9A P51151 7/20 0.60
▸ NPC1 O15118 6/20 0.60
▸ KMT2A Q03164 4/20 0.60
▸ CYP1A2 P05177 1/20 0.58
▸ MEN1 O00255 3/20 0.58
▸ MAPT P10636 3/20 0.58
▸ LMNA P02545 1/20 0.58
▸ NR1H4 Q96RI1 3/20 0.56
▸ SMN1; SMN2 Q16637 4/20 0.56
▸ FKBP5 Q13451 1/20 0.54
▸ KCNQ3 O43525 1/20 0.53
▸ KCNQ2 O43526 1/20 0.53
▸ CSF1R P07333 1/20 0.52
▸ IMPDH2 P12268 1/20 0.51
▸ PPARG P37231 1/20 0.50
▸ PPARA Q07869 1/20 0.50
▸ TP53 P04637 1/20 0.49

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13400967 0.84 RAB9A (0.67) RAB9ANPC1KMT2ACYP1A2MEN1
SCHEMBL823156 0.84 RAB9A (0.75) TDP1RAB9ANPC1KMT2ACYP1A2
SCHEMBL14291460 0.83 KMT2A (0.69) TDP1RAB9ANPC1KMT2ACYP1A2
SCHEMBL25815389 0.82 NPC1 (0.72) TDP1RAB9ANPC1KMT2AMEN1
SCHEMBL22580647 0.81 ACE2 (0.61) TDP1RAB9ANPC1KMT2AMEN1
SCHEMBL16583885 0.80 RAB9A (0.79) RAB9ANPC1KMT2ACYP1A2MEN1
SCHEMBL22580580 0.79 KDM4E (0.58) TDP1RAB9ANPC1KMT2ACYP1A2
SCHEMBL17118228 0.79 NR1H4 (0.52) TDP1RAB9ANPC1KMT2ACYP1A2
SCHEMBL30153426 0.79 FKBP5 (0.63) TDP1RAB9ANPC1KMT2AMEN1
SCHEMBL1949548 0.79 FKBP5 (0.63) TDP1RAB9ANPC1KMT2AMEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8673540-B2 Photosensitive polymides ETERNAL CHEMICAL CO., LTD. (TW) 2014-03-18 — — US disclosed
US-20130095426-A1 PHOTOSENSITIVE POLYMIDES ETERNAL CHEMICAL CO., LTD. (TW) 2013-04-18 — — US disclosed
US-8349539-B2 Photosensitive polymides ETERNAL CHEMICAL CO., LTD. (TW) 2013-01-08 — — US disclosed
US-8349539-B2 Photosensitive polymides ETERNAL CHEMICAL CO., LTD. (TW) 2013-01-08 — — US disclosed
US-8105752-B2 Photosensitive polyimides ETERNAL CHEMICAL CO., LTD. (TW) 2012-01-31 — — US disclosed
US-8105752-B2 Photosensitive polyimides ETERNAL CHEMICAL CO., LTD. (TW) 2012-01-31 — — US disclosed
US-20110212402-A1 PHOTOSENSITIVE RESIN COMPOSITION AND ITS APPLICATION ETERNAL CHEMICAL CO., LTD. (TW) 2011-09-01 — — US disclosed
US-20100086874-A1 Photosensitive polymides ETERNAL CHEMICAL CO., LTD. (TW) 2010-04-08 — — US disclosed
US-20100086874-A1 Photosensitive polymides ETERNAL CHEMICAL CO., LTD. (TW) 2010-04-08 — — US disclosed
US-20100086871-A1 PHOTOSENSITIVE POLYIMIDES ETERNAL CHEMICAL CO., LTD. 2010-04-08 — — US disclosed
US-20100086871-A1 PHOTOSENSITIVE POLYIMIDES ETERNAL CHEMICAL CO., LTD. 2010-04-08 — — US disclosed
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