SCHEMBL22580647

SCHEMBL22580647

Cc1ccc(C(=O)Nc2ccc3c(c2)C(=O)c2ccc(NC(=O)c4ccc(C)c(C)c4)cc2C3=O)cc1C

nearest known ligand 0.61

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ ACE2 Q9BYF1 1/20 0.61
▸ MAPT P10636 6/20 0.60
▸ POLB P06746 3/20 0.60
▸ NPC1 O15118 7/20 0.57
▸ RAB9A P51151 7/20 0.57
▸ KMT2A Q03164 6/20 0.57
▸ MEN1 O00255 5/20 0.56
▸ MCL1 Q07820 2/20 0.56
▸ OPRM1 P35372 1/20 0.56
▸ OPRD1 P41143 1/20 0.56
▸ CTDSP1 Q9GZU7 1/20 0.56
▸ TDP1 Q9NUW8 1/20 0.56
▸ KCNQ3 O43525 1/20 0.55
▸ KCNQ2 O43526 1/20 0.55
▸ ALDH1A1 P00352 2/20 0.54
▸ HTT P42858 1/20 0.54
▸ SMN1; SMN2 Q16637 3/20 0.53
▸ GAA P10253 1/20 0.53
▸ MAOA P21397 1/20 0.53
▸ TP53 P04637 1/20 0.52

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13400967 0.86 RAB9A (0.67) MAPTPOLBNPC1RAB9AKMT2A
SCHEMBL823156 0.85 RAB9A (0.75) MAPTPOLBNPC1RAB9AKMT2A
SCHEMBL25815389 0.84 NPC1 (0.72) MAPTNPC1RAB9AKMT2AMEN1
SCHEMBL22580580 0.81 KDM4E (0.58) MAPTPOLBNPC1RAB9AKMT2A
SCHEMBL10001968 0.81 TDP1 (0.61) MAPTNPC1RAB9AKMT2AMEN1
SCHEMBL30153426 0.80 FKBP5 (0.63) MAPTNPC1RAB9AKMT2AMEN1
SCHEMBL1949548 0.80 FKBP5 (0.63) MAPTNPC1RAB9AKMT2AMEN1
SCHEMBL22580596 0.79 NPC1 (0.55) MAPTPOLBNPC1RAB9AKMT2A
SCHEMBL22580585 0.79 NPC1 (0.66) MAPTNPC1RAB9AKMT2AMEN1
SCHEMBL22580645 0.79 NPC1 (0.66) MAPTNPC1RAB9AKMT2AMEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230260787-A1 COMPOSITION FOR FORMING PROTECTIVE FILM AGAINST ALKALINE AQUEOUS HYDROGEN PEROXIDE, SUBSTRATE FOR PRODUCING SEMICONDUCTOR APPARATUS, METHOD FOR FORMING PROTECTIVE FILM, AND METHOD FOR FORMING PATTERN SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-08-17 — — US disclosed
US-11692066-B2 Material for forming organic film, substrate for manufacturing semiconductor device, method for forming organic film, patterning process, and compound for forming organic film SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-07-04 — — US disclosed
US-11676814-B2 Material for forming organic film, substrate for manufacturing semiconductor apparatus, method for forming organic film, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-06-13 — — US disclosed
US-20210311395-A1 MATERIAL FOR FORMING ORGANIC FILM, SUBSTRATE FOR MANUFACTURING SEMICONDUCTOR DEVICE, METHOD FOR FORMING ORGANIC FILM, PATTERNING PROCESS, AND COMPOUND FOR FORMING ORGANIC FILM SHIN-ETSU CHEMICAL CO., LTD. (JP) 2021-10-07 — — US disclosed
US-20200381247-A1 MATERIAL FOR FORMING ORGANIC FILM, SUBSTRATE FOR MANUFACTURING SEMICONDUCTOR APPARATUS, METHOD FOR FORMING ORGANIC FILM, AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2020-12-03 — — US disclosed
US-20200332062-A1 MATERIAL FOR FORMING ORGANIC FILM, SUBSTRATE FOR MANUFACTURING SEMICONDUCTOR DEVICE, METHOD FOR FORMING ORGANIC FILM, PATTERNING PROCESS, AND COMPOUND FOR FORMING ORGANIC FILM SHIN-ETSU CHEMICAL CO., LTD. (JP) 2020-10-22 — — US disclosed
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