Predicted protein targets (top 14)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ACE2 | Q9BYF1 | 1/20 | 0.43 |
| ▸ | GPR84 | Q9NQS5 | 7/20 | 0.42 |
| ▸ | CA1 | P00915 | 2/20 | 0.42 |
| ▸ | FFAR1 | O14842 | 2/20 | 0.42 |
| ▸ | ZDHHC7 | Q9NXF8 | 1/20 | 0.42 |
| ▸ | MAPT | P10636 | 1/20 | 0.41 |
| ▸ | LCK | P06239 | 1/20 | 0.41 |
| ▸ | PPARD | Q03181 | 1/20 | 0.41 |
| ▸ | ZDHHC20 | Q5W0Z9 | 1/20 | 0.41 |
| ▸ | ZDHHC2 | Q9UIJ5 | 1/20 | 0.41 |
| ▸ | FAAH | O00519 | 1/20 | 0.40 |
| ▸ | CA2 | P00918 | 1/20 | 0.40 |
| ▸ | FFAR4 | Q5NUL3 | 1/20 | 0.39 |
| ▸ | FDPS | P14324 | 1/20 | 0.38 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2491510 | 0.84 | ZDHHC7 (0.46) | ACE2GPR84CA1FFAR1ZDHHC7 | |
| SCHEMBL272762 | 0.82 | ACE2 (0.44) | ACE2GPR84CA1FFAR1MAPT | |
| SCHEMBL29647839 | 0.79 | OPRM1 (0.48) | ACE2GPR84FDPS | |
| SCHEMBL16782308 | 0.79 | OPRM1 (0.48) | ACE2GPR84FDPS | |
| Bicarbonate SCHEMBL29385221 | 0.76 | HMGCR (0.44) | ACE2GPR84FFAR1MAPT | |
| SCHEMBL273813 | 0.76 | CA2 (0.42) | ACE2GPR84CA1FFAR1MAPT | |
| SCHEMBL31112701 | 0.75 | SPHK1 (0.43) | ACE2GPR84CA1FFAR1MAPT | |
| SCHEMBL21218968 | 0.75 | SPHK1 (0.43) | ACE2GPR84CA1FFAR1MAPT | |
| SCHEMBL5068321 | 0.75 | SPHK1 (0.43) | ACE2GPR84CA1FFAR1MAPT | |
| SCHEMBL28783023 | 0.75 | SPHK1 (0.43) | ACE2GPR84CA1FFAR1MAPT |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 23 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1536285-B1 | Photosensitive composition, compound for use in the photosensitive composition, and pattern forming method using the photosensitive composition | FUJIFILM CORP (JP) | 2016-01-06 | — | — | EP | disclosed |
| US-9046782-B2 | Resist composition for negative tone development and pattern forming method using the same | FUJIFILM CORPORATION (JP) | 2015-06-02 | — | — | US | disclosed |
| EP-2353048-B1 | PATTERN FORMING METHOD USING DEVELOPER CONTAINING ORGANIC SOLVENT AND RINSING SOLUTION FOR USE IN THE PATTERN FORMING METHOD | FUJIFILM CORP (JP) | 2015-02-25 | — | — | EP | disclosed |
| EP-2157477-B1 | USE OF A RESIST COMPOSITION FOR NEGATIVE WORKING-TYPE DEVELOPMENT, AND METHOD FOR PATTERN FORMATION USING THE RESIST COMPOSITION | FUJIFILM CORP (JP) | 2014-08-06 | — | — | EP | disclosed |
| US-8709704-B2 | Pattern forming method using developer containing organic solvent and rinsing solution for use in the pattern forming method | FUJIFILM CORPORATION (JP) | 2014-04-29 | — | — | US | disclosed |
| US-20110229832-A1 | PATTERN FORMING METHOD USING DEVELOPER CONTAINING ORGANIC SOLVENT AND RINSING SOLUTION FOR USE IN THE PATTERN FORMING METHOD | FUJIFILM CORPORATION (JP) | 2011-09-22 | — | — | US | disclosed |
| EP-2353048-A2 | PATTERN FORMING METHOD USING DEVELOPER CONTAINING ORGANIC SOLVENT AND RINSING SOLUTION FOR USE IN THE PATTERN FORMING METHOD | FUJIFILM Corporation (JP) | 2011-08-10 | — | — | EP | disclosed |
| US-20100190106-A1 | RESIST COMPOSITION FOR NEGATIVE TONE DEVELOPMENT AND PATTERN FORMING METHOD USING THE SAME | FUJIFILM CORPORATION (JP) | 2010-07-29 | — | — | US | disclosed |
| WO-2010061977-A2 | PATTERN FORMING METHOD USING DEVELOPER CONTAINING ORGANIC SOLVENT AND RINSING SOLUTION FOR USE IN THE PATTERN FORMING METHOD | FUJIFILM CORPORATION (JP) | 2010-06-03 | — | — | WO | disclosed |
| EP-2157477-A1 | RESIST COMPOSITION FOR NEGATIVE WORKING-TYPE DEVELOPMENT, AND METHOD FOR PATTERN FORMATION USING THE RESIST COMPOSITION | Fujifilm Corporation (JP) | 2010-02-24 | — | — | EP | disclosed |
| US-20080081294-A1 | PHOTOSENSITIVE RESIN COMPOSITION, PRODUCTION METHOD OF CURED RELIEF PATTERN USING THE SAME AND SEMICONDUCTOR DEVICE | FUJIFILM CORPORATION (JP) | 2008-04-03 | — | — | US | disclosed |
| EP-1906246-A2 | Photosensitive resin composition, production method of cured relief pattern using the same and semiconductor device | FUJIFILM Corporation (JP) | 2008-04-02 | — | — | EP | disclosed |
| US-7348122-B2 | Photosensitive resin composition and method for manufacturing semiconductor device using the same | FUJIFILM CORPORATION (JP) | 2008-03-25 | — | — | US | disclosed |
| US-7341817-B2 | Photosensitive composition, compound for use in the photosensitive composition, and pattern forming method using the photosensitive composition | FUJIFILM CORPORATION (JP) | 2008-03-11 | — | — | US | disclosed |
| US-20070087288-A1 | Positive-working photosensitive composition and pattern forming method using the same | FUJIFILM CORPORATION | 2007-04-19 | — | — | US | disclosed |
| US-20070048656-A1 | Photosensitive resin composition and method for manufacturing semiconductor device using the same | FUJI PHOTO FILM CO., LTD. | 2007-03-01 | — | — | US | disclosed |
| US-20060210922-A1 | Positive resist composition and pattern forming method using the resist composition | FUJI PHOTO FILM CO., LTD. | 2006-09-21 | — | — | US | disclosed |
| EP-1703322-A2 | Positive resist composition and pattern forming method using the resist composition | FUJI PHOTO FILM CO., LTD. (JP) | 2006-09-20 | — | — | EP | disclosed |
| US-20050123859-A1 | Photosensitive composition, compound for use in the photosensitive composition, and pattern forming method using the photosensitive composition | FUJI PHOTO FILM CO., LTD. | 2005-06-09 | — | — | US | disclosed |
| EP-1536285-A2 | Photosensitive composition, compound for use in the photosensitive composition, and pattern forming method using the photosensitive composition | FUJI PHOTO FILM CO., LTD. (JP) | 2005-06-01 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20110229832-A1 | PATTERN FORMING METHOD USING DEVELOPER CONTAINING ORGANIC SOLVENT AND RINSING SOLUTION FOR USE IN THE PATTERN FORMING METHOD | RER1, RARA, RARG | ACE2 4648/4885GPR84 2217/4885CA1 483/4885 |
| US-20050123859-A1 | Photosensitive composition, compound for use in the photosensitive composition, and pattern forming method using the photosensitive composition | PFN1, SPIN4, PPOX | ACE2 4806/4885GPR84 3358/4885CA1 1359/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.