Acrylic Acid

Acrylic Acid

SCHEMBL233722

C=CC(=O)O.O

nearest known ligand 0.00

Full drug profile on Sugi Atlas →

Known targets — ChEMBL curated mechanism

ABCC9ABL1ACEACHEACVR1ADORA1ADORA2AADORA2BADORA3ADRA1AADRA1BADRA1DADRA2AADRA2BADRA2CADRB1ADRB2ADRB3AGTR1ALOX5ATP4AATP4BBCRBTKCACNA1ACACNA1BCACNA1CCACNA1DCACNA1ECACNA1FCACNA1GCACNA1HCACNA1ICACNA1SCACNA2D1CACNA2D2CACNA2D3CACNA2D4CACNB1CACNB2CACNB3CACNB4CACNG1CACNG2CACNG3CACNG4CACNG5CACNG6CACNG7CACNG8CALCRLCFBCHRM1CHRM2CHRM3CHRM4CHRM5CHRNA1CHRNB1CHRNDCHRNECHRNGCRBNCUL4ACXCR1CXCR2DDB1DDCDHFRDPP4DRD2DRD3DRD4EGFRERBB2ERBB4ESR1ESR2FDPSFKBP1AFLT1FLT3FLT4GARTGHSRGRIA1GRIA2GRIA3GRIA4GRIK1GRIK2GRIK3GRIK4GRIK5GRIN2AGSK3AGSK3BHDAC1HDAC10HDAC11HDAC2HDAC3HDAC4HDAC5HDAC6HDAC7HDAC8HDAC9HRH1HTR1AHTR1BHTR1DHTR1EHTR1FHTR2AHTR2BHTR2CHTR3AHTR3BHTR3CHTR3DHTR3EHTR4HTR5AHTR6HTR7IDH1IDH2IMPA1ITGA2BITGB3JAK1JAK2JAK3KCNJ11KCNK3KCNK9KDRKITMEN1METMMP1MMP13MMP7MMP8NANOD2NS5bODC1OPG057OPRD1OPRK1OPRM1PPARP1PARP2PDE3APDE3BPDE4APDE4BPDE4CPDE4DPDGFRBPIK3CAPIK3CBPIK3CDPIK3CGPIK3R1PIK3R2PIK3R3PIK3R5PKLRPPARDPPATPTGS1PTGS2RBX1ROCK1ROCK2RRM1RRM2RRM2BSCN10ASCN11ASCN1ASCN2ASCN3ASCN4ASCN5ASCN7ASCN8ASCN9ASCNN1ASCNN1BSCNN1GSIGMAR1SLC10A2SLC5A2SLC6A2SLC6A3SLC6A4SLC9A3SYKTACR1THRATHRBTOP1TUBA1ATUBA1BTUBA1CTUBA3CTUBA3ETUBA4ATUBBTUBB1TUBB2ATUBB2BTUBB3TUBB4ATUBB4BTUBB6TUBB8TYK2TYMSVDRampCblablaT-3blaT-4blaT-5blaT-6blaUOE-1dacAdacBdacCfolAfolPftsIgyrAgyrBileSmecAmrcAmrcBmrdAparCparEpbp2pbp4pbpApbpFrplArplBrplCrplDrplErplFrplIrplJrplKrplLrplMrplNrplOrplPrplQrplRrplSrplTrplUrplVrplWrplXrplYrpmArpmBrpmCrpmDrpmErpmE2rpmFrpmGrpmG1rpmG2rpmG3rpmHrpmIrpmJrpsArpsBrpsCrpsDrpsErpsFrpsGrpsHrpsIrpsJrpsKrpsLrpsMrpsNrpsOrpsPrpsQrpsRrpsSrpsTrpsUthyAykgMykgO

The experimentally established mechanism targets of Acrylic Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Acrylic Acid SCHEMBL9694843 1.00
Acrylic Acid SCHEMBL27997220 1.00 LMNA (0.91)
Acrylic Acid SCHEMBL21612747 1.00 LMNA (0.91)
Acrylic Acid SCHEMBL27528758 1.00 LMNA (0.91)
Acrylic Acid SCHEMBL28796751 1.00 LMNA (0.91)
Acrylic Acid SCHEMBL3625552 1.00 LMNA (0.91)
Acrylic Acid SCHEMBL6048303 1.00
Acrylic Acid SCHEMBL7778846 0.96
Acrylic Acid SCHEMBL2373298 0.96 LMNA (0.83)
Acrylic Acid SCHEMBL7778848 0.96

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Appears in 2309 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-120158860-A Durable water-splashing-preventing environment-friendly knitted three-dimensional fabric and production process thereof 东丽酒伊织染(南通)有限公司 2025-06-17 CN claimed
CN-119017787-B Impervious bentonite waterproof blanket and preparation method thereof 长沙建益新材料有限公司 2025-06-13 CN claimed
CN-119798517-A Acrylic acid water-absorbent resin and preparation method thereof 万华化学集团股份有限公司 2025-04-11 CN claimed
CN-119529276-A Polyimide and preparation method and application thereof 安徽大学绿色产业创新研究院 2025-02-28 CN claimed
CN-119350093-A Preparation method of slow-release urea and application of slow-release urea in saline-alkali soil remediation 西北师范大学 2025-01-24 CN claimed
CN-116535241-B High-strength low-expansion glaze sand coating and preparation method thereof 江西爱瑞达电瓷电气有限公司 2024-11-29 CN claimed
CN-119017787-A Impervious bentonite waterproof blanket and preparation method thereof 长沙建益新材料有限公司 2024-11-26 CN claimed
CN-118996898-A Manufacturing method of recyclable high-barrier paper 正创堂(深圳)新材料科技有限公司 2024-11-22 CN claimed
CN-118880637-A Water-absorbing deformation water-based printing adhesive, and preparation method and application thereof 东莞长联新材料科技股份有限公司 2024-11-01 CN claimed
CN-221895429-U Cold chain beverage separation paper 江西锐泽纸基环保新材料有限公司 2024-10-25 CN claimed
US-5334645-A Inorganic fibers has high dielectric constant, low dielectric loss tangent, acid and alkali resistance, waterproofing, high strain points MATSUSHITA ELECTRIC WORKS, LTD. (JP) 1994-08-02 US claimed
US-5275878-A Secondary particles formed by agglomerating primary particles which are sintered to be mutually coupled MATSUSHITA ELECTRIC WORKS, LTD. (JP) 1994-01-04 US claimed
EP-0498425-A1 Glass fiber forming composition, glass fibers obtained from the composition and substrate for circuit board including the glass fibers as reinforcing material MATSUSHITA ELECTRIC WORKS, LTD. (JP) 1992-08-12 EP claimed
EP-0441441-A2 Composite dielectric and printed-circuit use substrate utilizing the same MATSUSHITA ELECTRIC WORKS, LTD. (JP) 1991-08-14 EP claimed
EP-0220648-A2 Ultraviolet curable outer coatings for optical fiber DeSOTO, INC. (US) 1987-05-06 EP claimed
US-4645555-A Hot stamping method ASAHI SCREEN PROCESS INSATSU KABUSHIKI KAISHA (JP) 1987-02-24 US claimed
EP-0072017-B1 METHACRYLATE RESIN COMPOSITION FOR OPTICAL INFORMATION RECORDING MEDIUM MITSUBISHI RAYON CO., LTD. (JP) 1985-11-21 EP claimed
US-4510279-A WITH SURFACTANT CONTAINING A FLUOROALKYL GROUP MITSUBISHI RAYON CO., LTD. (JP) 1985-04-09 US claimed
EP-0072017-A1 Methacrylate resin composition for optical information recording medium MITSUBISHI RAYON CO., LTD. (JP) 1983-02-16 EP claimed
US-4082564-A CROSSLINKED QUATERNARY AMMONIUM ACRYLAMIDE RESIN ROHM AND HAAS COMPANY (US) 1978-04-04 US claimed