Acetic Acid

Acetic Acid

SCHEMBL2400937

CC(=O)O.CCCCCCCCCCCCCOCCCCCCCCCCCCC

nearest known ligand 0.68

Full drug profile on Sugi Atlas →

Known targets — ChEMBL curated mechanism

ADRA2AADRA2BADRA2CADRB2AGTR1AVPR1AAVPR1BAVPR2BDKRB2CALCRCHRNA3CHRNB4ESR1ESR2GHSRGNRHRGSC1HSPA8MALT1MC1RMC4RNOS1NOS2NOS3OPRK1OXTRRAMP1RAMP2RAMP3SCN5ASSTR1SSTR2SSTR3SSTR4SSTR5dacAdacBdacCfolPftsImrcAmrcBmrdArplArplBrplCrplDrplErplFrplJrplKrplLrplMrplNrplOrplPrplQrplRrplSrplTrplUrplVrplWrplXrplYrpmArpmBrpmCrpmDrpmErpmFrpmGrpmHrpmIrpmJrpsArpsBrpsCrpsDrpsErpsFrpsGrpsHrpsIrpsJrpsKrpsLrpsMrpsNrpsOrpsPrpsQrpsRrpsSrpsTrpsUykgMykgO

The experimentally established mechanism targets of Acetic Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ESR1 known ✓ P03372 1/20 0.48
CES2 O00748 2/20 0.68
MEN1 O00255 2/20 0.60
KMT2A Q03164 2/20 0.60
THRB P10828 1/20 0.60
HTT P42858 1/20 0.60
MAPT P10636 1/20 0.60
NAAA Q02083 1/20 0.52
TSHR P16473 5/20 0.52
PLA2G2C Q5R387 2/20 0.50
HCAR2 Q8TDS4 1/20 0.48
EPHX1 P07099 1/20 0.48
PPARG P37231 5/20 0.48
PPARD Q03181 5/20 0.48
PPARA Q07869 5/20 0.48
HDAC11 Q96DB2 4/20 0.48
GPR84 Q9NQS5 3/20 0.48
ALDH1A1 P00352 2/20 0.48
TLR2 O60603 2/20 0.48
TDP1 Q9NUW8 2/20 0.48

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Acetic Acid SCHEMBL138223 1.00 CES2 (0.68) CES2MEN1KMT2ATHRBHTT
Acetic Acid SCHEMBL4930252 1.00 CES2 (0.68) CES2MEN1KMT2ATHRBHTT
Acetic Acid SCHEMBL353029 1.00 CES2 (0.68) CES2MEN1KMT2ATHRBHTT
Acetic Acid SCHEMBL3426392 1.00 CES2 (0.68) CES2MEN1KMT2ATHRBHTT
Acetic Acid SCHEMBL3139068 1.00 CES2 (0.68) CES2MEN1KMT2ATHRBHTT
Acetic Acid SCHEMBL2863329 1.00 CES2 (0.68) CES2MEN1KMT2ATHRBHTT
Acetic Acid SCHEMBL537713 1.00 CES2 (0.68) CES2MEN1KMT2ATHRBHTT
Acetic Acid SCHEMBL9550103 0.98 CES2 (0.65) CES2MEN1KMT2ATHRBHTT
Acetic Acid SCHEMBL3264543 0.97 CES2 (0.64) CES2MEN1KMT2ATHRBHTT
Acetic Acid SCHEMBL28328015 0.95 CES2 (0.61) CES2MEN1KMT2ATHRBHTT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 63 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-3808330-B1 W/O EMULSION COMPOSITION CONTAINING CERAMIDES KAO CORP (JP) 2025-08-27 EP disclosed
US-12312499-B2 Surface treatment method, method for producing semiconductor substrate including the surface treatment method, composition for surface treatment, and system for producing semiconductor substrate including the composition for surface treatment FUJIMI INCORPORATED (JP) 2025-05-27 US disclosed
US-12275921-B2 Treatment liquid and substrate treatment method FUJIFILM CORPORATION (JP) 2025-04-15 US disclosed
CN-118338888-A Surfactant composition for cosmetic material and cosmetic material 三洋化成工业株式会社 2024-07-12 CN disclosed
US-11896688-B2 W/O emulsion composition KAO CORPORATION (JP) 2024-02-13 US disclosed
US-20230416579-A1 AEROSOL RAW MATERIAL COMPOSITION, AEROSOL COMPOSITION, AND AEROSOL PRODUCT AGC Inc. (JP) 2023-12-28 US disclosed
CN-117015368-A Spray out product 株式会社大造 2023-11-07 CN disclosed
CN-117015586-A Aerosol raw material composition, aerosol composition and aerosol product AGC株式会社 2023-11-07 CN disclosed
CN-113164372-B Salt-sensitive particles 花王株式会社 2023-09-26 CN disclosed
US-20230287304-A1 TREATMENT LIQUID AND SUBSTRATE TREATMENT METHOD FUJIFILM CORPORATION (JP) 2023-09-14 US disclosed
US-20050168552-A1 Ink for ink jet recording, ink jet recording method, ink cartridge and ink jet recording apparatus ARITA HITOSHI (JP) 2005-08-04 US disclosed
US-6899751-B2 Ink for ink jet recording, ink jet recording method, ink cartridge and ink jet recording apparatus RICOH COMPANY, LTD. (JP) 2005-05-31 US disclosed
US-20050007431-A1 Pretreatment liquid for recording material and image recording method using the pretreatment liquid KOYANO MASAYUKI (JP) 2005-01-13 US disclosed
US-20040156802-A1 Cosmetics or external preparations for skin AJINOMOTO CO., INC. (JP) 2004-08-12 US disclosed
EP-1374831-A1 COMSETICS OR EXTERNAL PREPARAIOTNS FOR SKIN Ajinomoto Co., Inc. (JP) 2004-01-02 EP disclosed
EP-0782849-B1 Shampoo composition containing pyriproxifen SUMITOMO CHEMICAL CO (JP) 2003-03-19 EP disclosed
US-20020083866-A1 Ink for ink jet recording, ink jet recording method, ink cartridge and ink jet recording apparatus RICOH COMPANY, LTD. (JP) 2002-07-04 US disclosed
US-5866152-A CONTAINING PYRIPROXYFEN SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 1999-02-02 US disclosed
EP-0782849-A1 Shampoo composition containing pyriproxifen SUMITOMO CHEMICAL COMPANY LIMITED (JP) 1997-07-09 EP disclosed
EP-0422683-A1 Washing-off agent composition for dyed cellulose fiber articles NIHON SURFACTANT KOGYO K.K. (JP) 1991-04-17 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-11896688-B2 W/O emulsion composition SGMS2, SGMS1, DEGS1 ESR1 287/4885CES2 493/4885MEN1 2733/4885
US-20040156802-A1 Cosmetics or external preparations for skin CUTA, PSAP, CTH ESR1 2747/4885CES2 498/4885MEN1 2838/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.