Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CA12 | O43570 | 4/20 | 0.48 |
| ▸ | CA1 | P00915 | 4/20 | 0.48 |
| ▸ | CA9 | Q16790 | 4/20 | 0.48 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.48 |
| ▸ | ALDH2 | P05091 | 1/20 | 0.48 |
| ▸ | CA2 | P00918 | 2/20 | 0.44 |
| ▸ | MMP1 | P03956 | 1/20 | 0.44 |
| ▸ | MMP2 | P08253 | 1/20 | 0.44 |
| ▸ | MMP3 | P08254 | 1/20 | 0.44 |
| ▸ | MMP8 | P22894 | 1/20 | 0.44 |
| ▸ | GRIN2D | O15399 | 1/20 | 0.40 |
| ▸ | GRIN3B | O60391 | 1/20 | 0.40 |
| ▸ | GRIN1 | Q05586 | 1/20 | 0.40 |
| ▸ | GRIN2A | Q12879 | 1/20 | 0.40 |
| ▸ | GRIN2B | Q13224 | 1/20 | 0.40 |
| ▸ | GRIN2C | Q14957 | 1/20 | 0.40 |
| ▸ | GRIN3A | Q8TCU5 | 1/20 | 0.40 |
| ▸ | MGLL | Q99685 | 1/20 | 0.37 |
| ▸ | SPHK2 | Q9NRA0 | 1/20 | 0.35 |
| ▸ | SPHK1 | Q9NYA1 | 1/20 | 0.35 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL15603424 | 1.00 | CA12 (0.48) | CA12CA1CA9ALDH1A1ALDH2 | |
| Phosphine SCHEMBL28550953 | 0.97 | CA12 (0.46) | CA12CA1CA9ALDH1A1ALDH2 | |
| SCHEMBL23458079 | 0.92 | CA12 (0.50) | CA12CA1CA9ALDH1A1ALDH2 | |
| SCHEMBL17710568 | 0.92 | CA12 (0.50) | CA12CA1CA9ALDH1A1ALDH2 | |
| SCHEMBL17710479 | 0.89 | CA12 (0.54) | CA12CA1CA9ALDH1A1ALDH2 | |
| SCHEMBL15603354 | 0.89 | CA12 (0.54) | CA12CA1CA9ALDH1A1ALDH2 | |
| SCHEMBL17710571 | 0.89 | CA12 (0.54) | CA12CA1CA9ALDH1A1ALDH2 | |
| SCHEMBL16443318 | 0.89 | CA12 (0.54) | CA12CA1CA9ALDH1A1ALDH2 | |
| SCHEMBL15603403 | 0.89 | CA12 (0.54) | CA12CA1CA9ALDH1A1ALDH2 | |
| SCHEMBL16443695 | 0.89 | CA12 (0.54) | CA12CA1CA9ALDH1A1ALDH2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 103 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-115052853-B | Process for preparing 1- [ 4-nitro-2- (trifluoromethyl) phenyl ] alkanone | 巴斯夫农业公司 | 2024-10-25 | — | — | CN | claimed |
| EP-4103540-B1 | PROCESS FOR THE PREPARATION OF 1-[4-NITRO-2-(TRIFLUOROMETHYL)PHENYL]-ALKANONES | BASF AGRO BV (NL) | 2023-11-01 | — | — | EP | claimed |
| EP-4103540-A1 | PROCESS FOR THE PREPARATION OF 1-[4-NITRO-2-(TRIFLUOROMETHYL)PHENYL]-ALKANONES | BASF Agro B.V. (NL) | 2022-12-21 | — | — | EP | claimed |
| CN-115052853-A | Preparation method of 1- [ 4-nitro-2- (trifluoromethyl) phenyl ] alkanone | 巴斯夫农业公司 | 2022-09-13 | — | — | CN | claimed |
| US-10023723-B2 | Process for preparing rubber compositions and articles made therefrom | MOMENTIVE PERFORMANCE MATERIALS INC. (US) | 2018-07-17 | — | — | US | claimed |
| CN-101765631-B | Process for preparing rubber compositions and articles made therefrom | MOMENTIVE PERFORMANCE MAT INC | 2013-06-12 | — | — | CN | claimed |
| CN-101765631-A | Process for preparing rubber compositions and articles made therefrom | MOMENTIVE PERFORMANCE MAT INC | 2010-06-30 | — | — | CN | claimed |
| EP-2152799-A1 | PROCESS FOR PREPARING RUBBER COMPOSITIONS AND ARTICLES MADE THEREFROM | Momentive Performance Materials Inc. (US) | 2010-02-17 | — | — | EP | claimed |
| WO-2008153876-A1 | PROCESS FOR PREPARING RUBBER COMPOSITIONS AND ARTICLES MADE THEREFROM | MOMENTIVE PERFORMANCE MATERIALS INC. (US) | 2008-12-18 | — | — | WO | claimed |
| US-20080306213-A1 | Process for preparing rubber compositions and articles made therefrom | MOMENTIVE PERFORMANCE MATERIALS, INC. | 2008-12-11 | — | — | US | claimed |
| US-20080196626-A1 | High silicon-content resin composition used to form thin film thermosets; form low k dielectric constant materials; hard mask and underlayer materials with anti-reflective properties for photolithography industry | MERCK PATENT GMBH (DE) | 2008-08-21 | — | — | US | claimed |
| EP-1590316-A1 | METHOD FOR PURIFYING CHLOROMETHYL CHLOROFORMATE | PPG Industries Ohio, Inc. (US) | 2005-11-02 | — | — | EP | claimed |
| US-6911558-B2 | Method for purifying chloromethyl chloroformate | PPG INDUSTRIES OHIO, INC. (US) | 2005-06-28 | — | — | US | claimed |
| WO-2004072014-A1 | METHOD FOR PURIFYING CHLOROMETHYL CHLOROFORMATE | PPG INDUSTRIES OHIO INC. (US) | 2004-08-26 | — | — | WO | claimed |
| US-20040152911-A1 | Method for purifying chloromethyl chloroformate | ROYAL MOULDINGS LIMITED | 2004-08-05 | — | — | US | claimed |
| EP-0960092-B1 | METHOD FOR THE PREPARATION OF ALPHA-CHLORINATED CHLOROFORMATES | PPG IND OHIO INC (US) | 2002-04-10 | — | — | EP | claimed |
| EP-0960092-A1 | METHOD FOR THE PREPARATION OF ALPHA-CHLORINATED CHLOROFORMATES | PPG Industries Ohio, Inc. (US) | 1999-12-01 | — | — | EP | claimed |
| WO-1998030533-A1 | METHOD FOR THE PREPARATION OF ALPHA-CHLORINATED CHLOROFORMATES | PPG INDUSTRIES OHIO, INC. (US) | 1998-07-16 | — | — | WO | claimed |
| US-5712407-A | Method for the preparation of alpha-chlorinated chloroformates | PPG INDUSTRIES, INC. (US) | 1998-01-27 | — | — | US | claimed |
| CN-115052853-B | Process for preparing 1- [ 4-nitro-2- (trifluoromethyl) phenyl ] alkanone | 巴斯夫农业公司 | 2024-10-25 | — | — | CN | disclosed |
| EP-3018118-B1 | BASE GENERATOR, BASE-REACTIVE COMPOSITION CONTAINING SAID BASE GENERATOR, AND BASE GENERATION METHOD | FUJIFILM WAKO PURE CHEMICAL CORP (JP) | 2023-07-05 | — | — | EP | disclosed |
| CN-113631392-B | Inkjet ink, infrared absorption image forming method, and image forming method | 富士胶片株式会社 | 2023-02-14 | — | — | CN | disclosed |
| CN-115052853-A | Preparation method of 1- [ 4-nitro-2- (trifluoromethyl) phenyl ] alkanone | 巴斯夫农业公司 | 2022-09-13 | — | — | CN | disclosed |
| EP-3327002-B1 | ACID-RESISTANT BASE AND/OR RADICAL GENERATOR, AND CURABLE RESIN COMPOSITION CONTAINING SAID BASE AND/OR RADICAL GENERATOR | FUJIFILM WAKO PURE CHEMICAL CORP (JP) | 2020-08-19 | — | — | EP | disclosed |
| CN-110536891-A | Mesoionic imidazopyridines as pesticides | BAYER AG | 2019-12-03 | — | — | CN | disclosed |
| US-10428014-B2 | Base generator, base-reactive composition containing said base generator, and base generation method | FUJIFILM WAKO PURE CHEMICAL CORPORATION (JP) | 2019-10-01 | — | — | US | disclosed |
| US-10428015-B2 | Acid-resistant base and/or radical generator, and curable resin composition containing said base and/or radical generator | FUJIFILM WAKO PURE CHEMICAL CORPORATION (JP) | 2019-10-01 | — | — | US | disclosed |
| CN-110225915-A | Mesoionic imidazopyridines as pesticides | 拜耳公司 | 2019-09-10 | — | — | CN | disclosed |
| CN-106103414-B | Substituted benzamides for arthropod processing | 拜耳作物科学股份公司 | 2019-07-16 | — | — | CN | disclosed |
| CN-106661220-B | Alkylene oxide polymerization catalyst and method for manufacturing polyalkylene oxide using the same | 东曹株式会社 | 2019-03-08 | — | — | CN | disclosed |
| CN-109337060-A | Alkylene oxide polymerization catalyst and the method for manufacturing polyalkylene oxide using it | 东曹株式会社 | 2019-02-15 | — | — | CN | disclosed |
| US-20190002403-A1 | ACID-RESISTANT BASE AND/OR RADICAL GENERATOR, AND CURABLE RESIN COMPOSITION CONTAINING SAID BASE AND/OR RADICAL GENERATOR | FUJIFILM WAKO PURE CHEMICAL CORPORATION (JP) | 2019-01-03 | — | — | US | disclosed |
| EP-3098226-B1 | BORATE-BASED BASE GENERATOR, AND BASE-REACTIVE COMPOSITION COMPRISING SUCH BASE GENERATOR | FUJIFILM WAKO PURE CHEMICAL CORP (JP) | 2018-12-12 | — | — | EP | disclosed |
| US-10100070-B2 | Borate-based base generator, and base-reactive composition comprising such base generator | FUJIFILM WAKO PURE CHEMICAL CORPORATION (JP) | 2018-10-16 | — | — | US | disclosed |
| CN-105339340-B | Generated base alkaline agent, the alkali reactive composition containing the generated base alkaline agent and production alkali method | 富士胶片和光纯药株式会社 | 2018-10-12 | — | — | CN | disclosed |
| CN-108602819-A | Mesoionically halogenated 3- (acetyl) -1- [ (1, 3-thiazol-5-yl) methyl ] -1H-imidazo [1, 2-a ] pyridin-4-ium-2-alkoxide derivatives and related compounds as pesticides | 拜耳作物科学股份公司 | 2018-09-28 | — | — | CN | disclosed |
| CN-106414461-B | Borate-based generated base alkaline agent and alkali reactive composition containing the generated base alkaline agent | 富士胶片和光纯药株式会社 | 2018-09-11 | — | — | CN | disclosed |
| US-10023723-B2 | Process for preparing rubber compositions and articles made therefrom | MOMENTIVE PERFORMANCE MATERIALS INC. (US) | 2018-07-17 | — | — | US | disclosed |
| EP-3327002-A1 | ACID-RESISTANT BASE AND/OR RADICAL GENERATOR, AND CURABLE RESIN COMPOSITION CONTAINING SAID BASE AND/OR RADICAL GENERATOR | Wako Pure Chemical Industries, Ltd. (JP) | 2018-05-30 | — | — | EP | disclosed |
| EP-2152799-B1 | PROCESS FOR PREPARING RUBBER COMPOSITIONS AND ARTICLES MADE THEREFROM | MOMENTIVE PERFORMANCE MAT INC (US) | 2017-08-23 | — | — | EP | disclosed |
| CN-106661220-A | Alkylene oxide polymerization catalyst and method for manufacturing polyalkylene oxide using the same | 东曹株式会社 | 2017-05-10 | — | — | CN | disclosed |
| CN-106459000-A | NOVEL 3-[(PYRAZOL-5-YL)-HETEROARYL]-BENZAMIDE DERIVATIVES | 拜耳作物科学股份公司 | 2017-02-22 | — | — | CN | disclosed |
| CN-106414461-A | BORATE-BASED BASE GENERATOR, AND BASE-REACTIVE COMPOSITION COMPRISING SUCH BASE GENERATOR | 和光纯药工业株式会社 | 2017-02-15 | — | — | CN | disclosed |
| EP-3098226-A1 | BORATE-BASED BASE GENERATOR, AND BASE-REACTIVE COMPOSITION COMPRISING SUCH BASE GENERATOR | Wako Pure Chemical Industries, Ltd. (JP) | 2016-11-30 | — | — | EP | disclosed |
| US-20160340374-A1 | BORATE-BASED BASE GENERATOR, AND BASE-REACTIVE COMPOSITION COMPRISING SUCH BASE GENERATOR | FUJIFILM WAKO PURE CHEMICAL CORPORATION (JP) | 2016-11-24 | — | — | US | disclosed |
| CN-106103414-A | The substituted benzamides processed for arthropod | 拜耳作物科学股份公司 | 2016-11-09 | — | — | CN | disclosed |
| CN-105873906-A | Novel compounds for controlling arthropods | 拜耳作物科学股份公司 | 2016-08-17 | — | — | CN | disclosed |
| EP-3018118-A1 | BASE GENERATOR, BASE-REACTIVE COMPOSITION CONTAINING SAID BASE GENERATOR, AND BASE GENERATION METHOD | Wako Pure Chemical Industries, Ltd. (JP) | 2016-05-11 | — | — | EP | disclosed |
| US-20160122292-A1 | BASE GENERATOR, BASE-REACTIVE COMPOSITION CONTAINING SAID BASE GENERATOR, AND BASE GENERATION METHOD | TOKYO UNIVERSITY OF SCIENCE FOUNDATION (JP) | 2016-05-05 | — | — | US | disclosed |
| CN-105339340-A | Base generator, base-reactive composition containing said base generator, and base generation method | WAKO PURE CHEM IND LTD | 2016-02-17 | — | — | CN | disclosed |
| US-8999746-B2 | Method of forming metal chalcogenide dispersion, metal chalcogenide dispersion, method of producing light absorbing layer of solar cell, method of producing solar cell | TOKYO OHKA KOGYO CO., LTD. (JP) | 2015-04-07 | — | — | US | disclosed |
| US-20150044813-A1 | METHOD OF FORMING METAL CHALCOGENIDE DISPERSION, METAL CHALCOGENIDE DISPERSION, METHOD OF PRODUCING LIGHT ABSORBING LAYER OF SOLAR CELL, METHOD OF PRODUCING SOLAR CELL | TOKYO OHKA KOGYO CO., LTD. (JP) | 2015-02-12 | — | — | US | disclosed |
| US-8911929-B2 | Developer and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-12-16 | — | — | US | disclosed |
| US-8911929-B2 | Developer and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-12-16 | — | — | US | disclosed |
| US-20140141377-A1 | DEVELOPER AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-05-22 | — | — | US | disclosed |
| US-20140141377-A1 | DEVELOPER AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-05-22 | — | — | US | disclosed |
| CN-101765631-B | Process for preparing rubber compositions and articles made therefrom | MOMENTIVE PERFORMANCE MAT INC | 2013-06-12 | — | — | CN | disclosed |
| EP-2450412-A1 | Silicone coating composition | AZ Electronic Materials USA Corp. (US) | 2012-05-09 | — | — | EP | disclosed |
| US-8026040-B2 | High silicon-content resin composition used to form thin film thermosets; form low k dielectric constant materials; hard mask and underlayer materials with anti-reflective properties for photolithography industry | AZ ELECTRONIC MATERIALS USA CORP. (US) | 2011-09-27 | — | — | US | disclosed |
| CN-101765631-A | Process for preparing rubber compositions and articles made therefrom | MOMENTIVE PERFORMANCE MAT INC | 2010-06-30 | — | — | CN | disclosed |
| EP-2152799-A1 | PROCESS FOR PREPARING RUBBER COMPOSITIONS AND ARTICLES MADE THEREFROM | Momentive Performance Materials Inc. (US) | 2010-02-17 | — | — | EP | disclosed |
| CN-101617010-A | Silicone coating composition | AZ ELECTRONIC MATERIALS USA | 2009-12-30 | — | — | CN | disclosed |
| EP-2121857-A1 | SILICONE COATING COMPOSITION | AZ Electronic Materials USA Corp. (US) | 2009-11-25 | — | — | EP | disclosed |
| WO-2008153876-A1 | PROCESS FOR PREPARING RUBBER COMPOSITIONS AND ARTICLES MADE THEREFROM | MOMENTIVE PERFORMANCE MATERIALS INC. (US) | 2008-12-18 | — | — | WO | disclosed |
| US-20080306213-A1 | Process for preparing rubber compositions and articles made therefrom | MOMENTIVE PERFORMANCE MATERIALS, INC. | 2008-12-11 | — | — | US | disclosed |
| WO-2008102256-A1 | SILICONE COATING COMPOSITION | AZ ELECTRONIC MATERIALS USA CORP. (DE) | 2008-08-28 | — | — | WO | disclosed |
| CN-1267410-C | Process for preparing cyclohexanol derivatives | WYETH CORP (US) | 2006-08-02 | — | — | CN | disclosed |
| EP-1590316-A1 | METHOD FOR PURIFYING CHLOROMETHYL CHLOROFORMATE | PPG Industries Ohio, Inc. (US) | 2005-11-02 | — | — | EP | disclosed |
| US-6911558-B2 | Method for purifying chloromethyl chloroformate | PPG INDUSTRIES OHIO, INC. (US) | 2005-06-28 | — | — | US | disclosed |
| CN-1173925-C | Process for preparation of carbonates and polycarbonates | 索罗蒂亚公司 | 2004-11-03 | — | — | CN | disclosed |
| CN-1531524-A | Process for preparing cyclohexanol derivatives | — | 2004-09-22 | — | — | CN | disclosed |
| WO-2004072014-A1 | METHOD FOR PURIFYING CHLOROMETHYL CHLOROFORMATE | PPG INDUSTRIES OHIO INC. (US) | 2004-08-26 | — | — | WO | disclosed |
| US-20040152911-A1 | Method for purifying chloromethyl chloroformate | ROYAL MOULDINGS LIMITED | 2004-08-05 | — | — | US | disclosed |
| EP-0960092-B1 | METHOD FOR THE PREPARATION OF ALPHA-CHLORINATED CHLOROFORMATES | PPG IND OHIO INC (US) | 2002-04-10 | — | — | EP | disclosed |
| CN-1073088-C | method for preparing organic disulphides and polysulphides in the presence of polystyrene-divinylbenzene (PS-DVB) resins containing guanidine and amidine groups | ELF AQUITAINE (FR) | 2001-10-17 | — | — | CN | disclosed |
| CN-1059435-C | Process for preparing carbamate and its polymer | MONSANTO CO (US) | 2000-12-13 | — | — | CN | disclosed |
| EP-0869940-B1 | METHOD FOR PREPARING ORGANIC DISULPHIDES AND POLYSULPHIDES IN THE PRESENCE OF POLYSTYRENE-DIVINYLBENZENE (PS-DVB) RESINS HAVING GUANIDINE OR AMIDINE GROUPS | ELF AQUITAINE (FR) | 2000-04-05 | — | — | EP | disclosed |
| EP-0960092-A1 | METHOD FOR THE PREPARATION OF ALPHA-CHLORINATED CHLOROFORMATES | PPG Industries Ohio, Inc. (US) | 1999-12-01 | — | — | EP | disclosed |
| US-5973080-A | MODIFIED DIVINYLBENZENE-STYRENE COPOLYMER | ELF AQUITAINE PRODUCTION (FR) | 1999-10-26 | — | — | US | disclosed |
| CN-1204317-A | Method for preparing organic disulphides and polysulphides in presence of polystyrene-divinylbenzene (PS-DVB) resins having guanidine or amidine groups | ELF AQUITAINE (FR) | 1999-01-06 | — | — | CN | disclosed |
| EP-0869940-A1 | METHOD FOR PREPARING ORGANIC DISULPHIDES AND POLYSULPHIDES IN THE PRESENCE OF POLYSTYRENE-DIVINYLBENZENE (PS-DVB) RESINS HAVING GUANIDINE OR AMIDINE GROUPS | ELF AQUITAINE PRODUCTION (FR) | 1998-10-14 | — | — | EP | disclosed |
| US-5817716-A | MODIFIED DIVINYLBENZENE-STYRENE COPOLYMER | ELF AQUITAINE PRODUCTION (FR) | 1998-10-06 | — | — | US | disclosed |
| WO-1998030533-A1 | METHOD FOR THE PREPARATION OF ALPHA-CHLORINATED CHLOROFORMATES | PPG INDUSTRIES OHIO, INC. (US) | 1998-07-16 | — | — | WO | disclosed |
| US-5767229-A | REACTING SULFUR WITH MERCAPTAN OR LOWER ORDER POLYSULFIDE TO FORM DISULFIDE OR HIGHER ORDER POLYSULFIDE | ELF AQUITAINE PRODUCTION (FR) | 1998-06-16 | — | — | US | disclosed |
| US-5726253-A | REACTING DIVINYLBENZENE-STYRENE RESIN WITH CHLOROFORMAMIDINIUM CHLORIDE IN BASE | ELF AQUITAINE PRODUCTION (FR) | 1998-03-10 | — | — | US | disclosed |
| US-5712407-A | Method for the preparation of alpha-chlorinated chloroformates | PPG INDUSTRIES, INC. (US) | 1998-01-27 | — | — | US | disclosed |
| EP-0511948-B1 | Preparation of urethane and carbonate products | MONSANTO CO (US) | 1997-11-05 | — | — | EP | disclosed |
| WO-1997021673-A1 | METHOD FOR PREPARING ORGANIC DISULPHIDES AND POLYSULPHIDES IN THE PRESENCE OF POLYSTYRENE-DIVINYLBENZENE (PS-DVB) RESINS HAVING GUANIDINE OR AMIDINE GROUPS | ELF AQUITAINE PRODUCTION (FR) | 1997-06-19 | — | — | WO | disclosed |
| US-5349048-A | Reaction of carbon dioxide with alcohol to form salt in solvent and reacting with hydrocarbyl halide | MONSANTO COMPANY (US) | 1994-09-20 | — | — | US | disclosed |
| US-5344934-A | Reaction of carbon dioxide and amine in aprotic solvents | MONSANTO COMPANY (US) | 1994-09-06 | — | — | US | disclosed |
| US-5260473-A | Reaction of alcohol and carbon dioxide in aprotic solvent and strong amidine or guanidine base | MONSANTO COMPANY (US) | 1993-11-09 | — | — | US | disclosed |
| EP-0556538-A1 | Blocked tricarbamate compounds | MONSANTO COMPANY (US) | 1993-08-25 | — | — | EP | disclosed |
| CN-1075475-A | Process for the preparation of carbamate and carbonate products | MONSANTO CO (US) | 1993-08-25 | — | — | CN | disclosed |
| US-5223638-A | Reacting primary or secondary amine with carbon dioxide in presence of strong amidine or guanidine base to form ammonium carbamate salt, reacting in polar aprotic solvent with primary or secondary hydrocarbyl halide | MONSANTO COMPANY (US) | 1993-06-29 | — | — | US | disclosed |
| EP-0511948-A2 | Preparation of urethane and carbonate products | MONSANTO COMPANY (US) | 1992-11-04 | — | — | EP | disclosed |
| US-4492661-A | Process for producing triarylphosphites | CIBA-GEIGY CORPORATION (US) | 1985-01-08 | — | — | US | disclosed |
| US-4440696-A | FROM A PHENOL AND PHOSPHORUS TRIHALIDE, AMINE OR AMIDE CATALYST | CIBA-GEIGY CORPORATION (US) | 1984-04-03 | — | — | US | disclosed |
| US-4312818-A | CATALYZED REACTION OF A PHENOL WITH A PHOSPHORUS HALIDE | CIBA-GEIGY CORPORATION (US) | 1982-01-26 | — | — | US | disclosed |
| EP-0000757-B1 | PROCESS FOR THE PREPARATION OF TRIARYLPHOSPHITES | CIBA-GEIGY AG (CH) | 1981-08-05 | — | — | EP | disclosed |
| US-4251469-A | ADDITIVES FOR EXTREME PRESSURE LUBRICANTS | CIBA-GEIGY CORPORATION (US) | 1981-02-17 | — | — | US | disclosed |
| US-4197209-A | Lubricant compositions containing sulfur-containing esters of phosphoric acid | CIBA-GEIGY CORPORATION (US) | 1980-04-08 | — | — | US | disclosed |
| US-4189453-A | FROM MERCAPTANS AND PHOSPHORUS TRIHALIDE, CATALYTIC | CIBA-GEIGY CORPORATION (US) | 1980-02-19 | — | — | US | disclosed |
| EP-0000757-A1 | Process for the preparation of triarylphosphites | CIBA-GEIGY AG (CH) | 1979-02-21 | — | — | EP | disclosed |
| EP-0000757-A1 | Process for the preparation of triarylphosphites | CIBA-GEIGY AG (CH) | 1979-02-21 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (7 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-10428015-B2 | Acid-resistant base and/or radical generator, and curable resin composition containing said base and/or radical generator | REV1, RER1, CBR1 | CA12 1148/4885CA1 275/4885CA9 457/4885 |
| US-10100070-B2 | Borate-based base generator, and base-reactive composition comprising such base generator | BLM, HPRT1, BROX | CA12 212/4885CA1 356/4885CA9 335/4885 |
| US-10428014-B2 | Base generator, base-reactive composition containing said base generator, and base generation method | HPRT1, GNG2, BLM | CA12 310/4885CA1 291/4885CA9 267/4885 |
| US-20040152911-A1 | Method for purifying chloromethyl chloroformate | MCCC2, CMBL, CBX3 | CA12 223/4885CA1 275/4885CA9 15/4885 |
| US-20190002403-A1 | ACID-RESISTANT BASE AND/OR RADICAL GENERATOR, AND CURABLE RESIN COMPOSITION CONTAINING SAID BASE AND/OR RADICAL GENERATOR | REV1, RER1, CBR1 | CA12 1148/4885CA1 275/4885CA9 457/4885 |
| US-20160340374-A1 | BORATE-BASED BASE GENERATOR, AND BASE-REACTIVE COMPOSITION COMPRISING SUCH BASE GENERATOR | ENPP3, GNG2, ENPP1 | CA12 2476/4885CA1 2081/4885CA9 1304/4885 |
| US-20160122292-A1 | BASE GENERATOR, BASE-REACTIVE COMPOSITION CONTAINING SAID BASE GENERATOR, AND BASE GENERATION METHOD | GNG2, EPHX2, ARHGEF1 | CA12 2407/4885CA1 1024/4885CA9 1316/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.