SCHEMBL247790

SCHEMBL247790

O[Si](O)(O)O.[Na+].[Na+].[O-][Si]([O-])(O)O

nearest known ligand 0.00

Known targets — ChEMBL curated mechanism

ABCC8ACEADORA1ADORA2AADORA2BADORA3ALDH5A1ALOX5ALOX5APATP4AATP4BBRAFCA1CA12CA2CA4CYSLTR1DHFRDPEP1EDNRAEDNRBESR2F10FDPSFGF1GABBR1GABBR2GABRA1GABRA2GABRA3GABRA4GABRA5GABRA6GABRB1GABRB2GABRB3GABRDGABREGABRG1GABRG2GABRG3GABRPGABRQGARTGNRHRGSC1HMGCRIMPDH1IMPDH2KCNJ11LY96NOD2NR3C1NS3NS4ANS5bP2RY1P2RY12P2RY2P2RY4P2RY6PBP2XPDE3APDE3BPDE4APDE4BPDE4CPDE4DPDK1PDK2PDK3PDK4PPARGPPATPTGIRPTGS1PTGS2RAF1RYR1RYR3SCN10ASCN11ASCN1ASCN2ASCN3ASCN4ASCN5ASCN7ASCN8ASCN9ASERPINC1SLC12A1SLC12A3SYKTHRATHRBTLR3TLR4TLR9TUBA1ATUBA1BTUBA1CTUBA3CTUBA3ETUBA4ATUBBTUBB1TUBB2ATUBB2BTUBB3TUBB4ATUBB4BTUBB6TUBB8TYMSVKORC1XDHblablaIMP-1blaOXA-33blaOXA-58blaT-3blaT-4blaT-5blaT-6dacAdacBdacCfolAfolPfolP1ftsIfusAgaggyrAgyrBmecAmrcAmrcBmrdApbp1apbp1bpbp2pbp2apbp2bpbp3pbp4pbpApbpBpbpCpbpFpolponBrplArplBrplCrplDrplErplFrplJrplKrplLrplMrplNrplOrplPrplQrplRrplSrplTrplUrplVrplWrplXrplYrpmArpmBrpmCrpmDrpmErpmFrpmGrpmHrpmIrpmJrpoArpoBrpoCrpoZrpsArpsBrpsCrpsDrpsErpsFrpsGrpsHrpsIrpsJrpsKrpsLrpsMrpsNrpsOrpsPrpsQrpsRrpsSrpsTrpsUykgMykgO

The experimentally established mechanism targets of None. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9701937 1.00
SCHEMBL11480483 1.00
Potassium Ion SCHEMBL2946727 0.94 CA4 (0.31)
Lithium Ion SCHEMBL16927417 0.94
SCHEMBL2812924 0.94
SCHEMBL1324841 0.88
Lithium Ion SCHEMBL18286122 0.88
Silver SCHEMBL8975834 0.88
Potassium Ion SCHEMBL9297905 0.88
SCHEMBL11115411 0.88

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 22 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-106242616-A A kind of modified glue powder doping heat-insulating wall block and preparation method thereof 西南科技大学 2016-12-21 CN claimed
WO-2024204931-A1 SEMICONDUCTOR- AND CONTACT COMBUSTION-TYPE COMPOSITE GAS SENSOR 아트센서랩 주식회사 2024-10-03 WO disclosed
CN-117597424-A Compositions with improved moisture management properties 汉高股份有限及两合公司 2024-02-23 CN disclosed
WO-2024008220-A2 COATING COMPOSITE MATERIAL, COATING ABRASIVE AND PREPARATION METHOD THEREFOR 华北理工大学 2024-01-11 WO disclosed
WO-2023054840-A1 IRON OXIDE COMPOSITE INCLUDING DOUBLE LAYER AND METHOD FOR PRODUCING SAME 고려대학교 산학협력단 2023-04-06 WO disclosed
EP-4100499-A1 DETERGENT COMPOSITION The Procter & Gamble Company (US) 2022-12-14 EP disclosed
WO-2019153646-A1 CEMENTING WORKING FLUID PREPARED BY USING RED MUD, SLAG AND WASTE DRILLING FLUID 西南石油大学 2019-08-15 WO disclosed
CN-109179431-A A kind of preparation method of high bulk density silica 安徽山河药用辅料股份有限公司 2019-01-11 CN disclosed
CN-104693851-A Nanoscale attapulgite inorganic zinc-rich anticorrosion coating and preparation method thereof QINGDAO HUICHENG PETROCHEMICAL TECHNOLOGY CO LTD 2015-06-10 CN disclosed
CN-104151880-A Nanometer carbon powder modified solar heat absorption coating TAICANG PAIOU TECHNOLOGY CONSULTING SERVICE CO LTD 2014-11-19 CN disclosed
WO-2012138870-A1 MULTI-ARM HYDROPHILIC URETHANE POLYMERS, METHODS OF MAKING THEM, AND COMPOSITIONS AND PROCESSES EMPLOYING THEM STEPAN COMPANY (US) 2012-10-11 WO disclosed
WO-2012000915-A1 COATED PARTICLES OF A GLUMATIC ACID N,N-DIACETATE CHELATING AGENT AKZO NOBEL CHEMICALS INTERNATIONAL B.V. (NL) 2012-01-05 WO disclosed
CN-101984783-B Method for reducing lead content in ginseng root UNIV JILIN AGRICULTURAL 2011-10-26 CN disclosed
CN-101984783-A Method for reducing lead content in ginseng root UNIV JILIN AGRICULTURAL 2011-03-16 CN disclosed
CN-100339426-C Polychloroprene latex composition, water-base primer and adhesive bonding process DENKI KAGAKU KOGYO KK (JP) 2007-09-26 CN disclosed
CN-1582315-A Polychloroprene latex composition, water-based primer, and method for adhesion of same DENKI KAGAKU KOGYO KK (JP) 2005-02-16 CN disclosed
WO-2005007792-A1 A PROCESS FOR PRODUCING A POWDER CONSISTING OF SODIUMSESQUICARBONATE AND LAYERED SILICATE CLENVI CO., LTD. (KR) 2005-01-27 WO disclosed
US-4990428-A Photopolymerizable compound overcoating aluminum(or alloy therof), and aluminum oxide layers MITSUBISHI KASEI CORPORATION (JP) 1991-02-05 US disclosed
US-4741858-A Timed-release hypochlorite bleach compositions THE CLOROX COMPANY (US) 1988-05-03 US disclosed
CN-85105510-A The curing that contains the slug of high concentration of boric acid 1987-01-21 CN disclosed