Known targets — ChEMBL curated mechanism
ABCC9ABL1ACEACHEACVR1ADORA1ADORA2AADORA2BADORA3ADRA1AADRA1BADRA1DADRA2AADRA2BADRA2CADRB1ADRB2ADRB3AGTR1ALOX5ATP4AATP4BBCRBTKCACNA1ACACNA1BCACNA1CCACNA1DCACNA1ECACNA1FCACNA1GCACNA1HCACNA1ICACNA1SCACNA2D1CACNA2D2CACNA2D3CACNA2D4CACNB1CACNB2CACNB3CACNB4CACNG1CACNG2CACNG3CACNG4CACNG5CACNG6CACNG7CACNG8CALCRLCFBCHRM1CHRM2CHRM3CHRM4CHRM5CHRNA1CHRNB1CHRNDCHRNECHRNGCRBNCUL4ACXCR1CXCR2DDB1DDCDHFRDPP4DRD2DRD3DRD4EGFRERBB2ERBB4ESR1ESR2FDPSFKBP1AFLT1FLT3FLT4GARTGHSRGRIA1GRIA2GRIA3GRIA4GRIK1GRIK2GRIK3GRIK4GRIK5GRIN2AGSK3AGSK3BHDAC1HDAC10HDAC11HDAC2HDAC3HDAC4HDAC5HDAC6HDAC7HDAC8HDAC9HRH1HTR1AHTR1BHTR1DHTR1EHTR1FHTR2AHTR2BHTR2CHTR3AHTR3BHTR3CHTR3DHTR3EHTR4HTR5AHTR6HTR7IDH1IDH2IMPA1ITGA2BITGB3JAK1JAK2JAK3KCNJ11KCNK3KCNK9KDRKITMEN1METMMP1MMP13MMP7MMP8NANOD2NS5bODC1OPG057OPRD1OPRK1OPRM1PPARP1PARP2PDE3APDE3BPDE4APDE4BPDE4CPDE4DPDGFRBPIK3CAPIK3CBPIK3CDPIK3CGPIK3R1PIK3R2PIK3R3PIK3R5PKLRPPARDPPATPTGS1PTGS2RBX1ROCK1ROCK2RRM1RRM2RRM2BSCN10ASCN11ASCN1ASCN2ASCN3ASCN4ASCN5ASCN7ASCN8ASCN9ASCNN1ASCNN1BSCNN1GSIGMAR1SLC10A2SLC5A2SLC6A2SLC6A3SLC6A4SLC9A3SYKTACR1THRATHRBTOP1TUBA1ATUBA1BTUBA1CTUBA3CTUBA3ETUBA4ATUBBTUBB1TUBB2ATUBB2BTUBB3TUBB4ATUBB4BTUBB6TUBB8TYK2TYMSVDRampCblablaT-3blaT-4blaT-5blaT-6blaUOE-1dacAdacBdacCfolAfolPftsIgyrAgyrBileSmecAmrcAmrcBmrdAparCparEpbp2pbp4pbpApbpFrplArplBrplCrplDrplErplFrplIrplJrplKrplLrplMrplNrplOrplPrplQrplRrplSrplTrplUrplVrplWrplXrplYrpmArpmBrpmCrpmDrpmErpmE2rpmFrpmGrpmG1rpmG2rpmG3rpmHrpmIrpmJrpsArpsBrpsCrpsDrpsErpsFrpsGrpsHrpsIrpsJrpsKrpsLrpsMrpsNrpsOrpsPrpsQrpsRrpsSrpsTrpsUthyAykgMykgO
The experimentally established mechanism targets of Water. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MEN1 known ✓ | O00255 | 2/20 | 0.41 |
| ▸ | CACNA1B known ✓ | Q00975 | 1/20 | 0.41 |
| ▸ | GRIN2A known ✓ | Q12879 | 1/20 | 0.36 |
| ▸ | TUBB4A known ✓ | P04350 | 1/20 | 0.33 |
| ▸ | TUBB known ✓ | P07437 | 1/20 | 0.33 |
| ▸ | TUBA3C known ✓ | P0DPH7 | 1/20 | 0.33 |
| ▸ | TUBA1B known ✓ | P68363 | 1/20 | 0.33 |
| ▸ | TUBA4A known ✓ | P68366 | 1/20 | 0.33 |
| ▸ | TUBB4B known ✓ | P68371 | 1/20 | 0.33 |
| ▸ | TUBB3 known ✓ | Q13509 | 1/20 | 0.33 |
| ▸ | TUBB2A known ✓ | Q13885 | 1/20 | 0.33 |
| ▸ | TUBB8 known ✓ | Q3ZCM7 | 1/20 | 0.33 |
| ▸ | TUBA3E known ✓ | Q6PEY2 | 1/20 | 0.33 |
| ▸ | TUBA1A known ✓ | Q71U36 | 1/20 | 0.33 |
| ▸ | TUBA1C known ✓ | Q9BQE3 | 1/20 | 0.33 |
| ▸ | TUBB6 known ✓ | Q9BUF5 | 1/20 | 0.33 |
| ▸ | TUBB2B known ✓ | Q9BVA1 | 1/20 | 0.33 |
| ▸ | TUBB1 known ✓ | Q9H4B7 | 1/20 | 0.33 |
| ▸ | PDE3B known ✓ | Q13370 | 1/20 | 0.32 |
| ▸ | PDE3A known ✓ | Q14432 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Water SCHEMBL29778699 | 1.00 | FABP6 (0.42) | FABP6MAPTKDM4EMEN1KMT2A | |
| SCHEMBL271074 | 0.98 | FABP6 (0.43) | FABP6MAPTKDM4EMEN1KMT2A | |
| Water SCHEMBL11194637 | 0.96 | FABP6 (0.39) | FABP6MAPTKDM4EMEN1KMT2A | |
| Water SCHEMBL11187894 | 0.93 | FABP6 (0.41) | FABP6MAPTKDM4EMEN1KMT2A | |
| SCHEMBL18331057 | 0.83 | FABP6 (0.33) | FABP6MAPTKDM4EMEN1KMT2A | |
| SCHEMBL202829 | 0.83 | GRIN2D (0.47) | FABP6MAPTKDM4EMEN1KMT2A | |
| SCHEMBL30036958 | 0.83 | GRIN2D (0.47) | FABP6MAPTKDM4EMEN1KMT2A | |
| SCHEMBL31716781 | 0.83 | AMY1A (0.33) | FABP6MAPTKDM4EMEN1KMT2A | |
| SCHEMBL1021802 | 0.80 | TERT (0.47) | FABP6MAPTKDM4EMEN1KMT2A | |
| SCHEMBL21314047 | 0.80 | BCHE (0.32) | FABP6AMY1A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 23 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-109252165-A | A kind of preparation method for subtracting copper liquid subtracting copper composition and include the composition | 苏州纳勒电子科技有限公司 | 2019-01-22 | — | — | CN | claimed |
| EP-2014797-A2 | Coating composition for interconnection part of electrode and plasma display panel including the same | Samsung SDI Co., Ltd. (KR) | 2009-01-14 | — | — | EP | claimed |
| US-20080303439-A1 | Coating composition for interconnection part of electrode and plasma display panel including the same | SAMSUNG SDI CO., LTD., A CORP. OF THE REPUBLIC OF KOREA (KR) | 2008-12-11 | — | — | US | claimed |
| EP-0069685-B1 | THERMOGRAPHIC RECORDING COMPOSITIONS AND RELATIVE SHEET MATERIALS | AUSSEDAT-REY (FR) | 1986-09-17 | — | — | EP | claimed |
| US-11940730-B2 | Photoresist compositions and pattern formation methods | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2024-03-26 | — | — | US | disclosed |
| US-20220229366-A1 | PHOTORESIST COMPOSITIONS AND PATTERN FORMATION METHODS | U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT | 2022-07-21 | — | — | US | disclosed |
| CN-114690557-A | Photoresist composition and pattern forming method | 罗门哈斯电子材料有限责任公司 | 2022-07-01 | — | — | CN | disclosed |
| CN-108267933-B | Radiation-sensitive composition and patterning and metallization process | 罗门哈斯电子材料有限责任公司 | 2021-12-03 | — | — | CN | disclosed |
| US-10962880-B2 | Radiation-sensitive compositions and patterning and metallization processes | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2021-03-30 | — | — | US | disclosed |
| US-20200201175-A1 | RADIATION-SENSITIVE COMPOSITIONS AND PATTERNING AND METALLIZATION PROCESSES | U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT | 2020-06-25 | — | — | US | disclosed |
| CN-109252165-A | A kind of preparation method for subtracting copper liquid subtracting copper composition and include the composition | 苏州纳勒电子科技有限公司 | 2019-01-22 | — | — | CN | disclosed |
| CN-108267933-A | Radiation-sensitive composition and patterning and method for metallising | 罗门哈斯电子材料有限责任公司 | 2018-07-10 | — | — | CN | disclosed |
| US-8330039-B2 | Solar cell modules with poly(vinyl butyral) encapsulant comprising unsaturated heterocyclic compound | E I DU PONT DE NEMOURS AND COMPANY (US) | 2012-12-11 | — | — | US | disclosed |
| EP-2380208-A1 | SOLAR CELL MODULES WITH POLY(VINYL BUTYRAL) ENCAPSULANT COMPRISING UNSATURATED HETEROCYCLIC COMPOUND | E. I. du Pont de Nemours and Company (US) | 2011-10-26 | — | — | EP | disclosed |
| WO-2010085664-A1 | SOLAR CELL MODULES WITH POLY(VINYL BUTYRAL) ENCAPSULANT COMPRISING UNSATURATED HETEROCYCLIC COMPOUND | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 2010-07-29 | — | — | WO | disclosed |
| US-20100180947-A1 | SOLAR CELL MODULES WITH POLY(VINYL BUTYRAL) ENCAPSULANT COMPRISING UNSATURATED HETEROCYCLIC COMPOUND | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 2010-07-22 | — | — | US | disclosed |
| EP-2014797-A2 | Coating composition for interconnection part of electrode and plasma display panel including the same | Samsung SDI Co., Ltd. (KR) | 2009-01-14 | — | — | EP | disclosed |
| US-20080303439-A1 | Coating composition for interconnection part of electrode and plasma display panel including the same | SAMSUNG SDI CO., LTD., A CORP. OF THE REPUBLIC OF KOREA (KR) | 2008-12-11 | — | — | US | disclosed |
| US-4418139-A | Film units containing thermally induced water-releasing benzotriazole complex | POLAROID CORPORATION (US) | 1983-11-29 | — | — | US | disclosed |
| US-4359397-A | WATER RELEASING WHEN MELTED | POLAROID CORPORATION (US) | 1982-11-16 | — | — | US | disclosed |