SCHEMBL24944290

SCHEMBL24944290

O=C(OC1(c2ccccc2)CCNCC1)c1ccc2c(c1)C(=O)c1ccccc1-2

nearest known ligand 0.47

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TTR P02766 3/20 0.47
MAPT P10636 5/20 0.46
NPC1 O15118 4/20 0.46
RAB9A P51151 4/20 0.46
ALDH1A1 P00352 2/20 0.46
LMNA P02545 2/20 0.46
SMN1; SMN2 Q16637 2/20 0.46
PTPRC P08575 4/20 0.46
GAA P10253 1/20 0.41
L3MBTL1 Q9Y468 1/20 0.41
HTR7 P34969 1/20 0.40
HTR2B P41595 1/20 0.40
HTT P42858 1/20 0.40
HPGD P15428 1/20 0.40
KDM4E B2RXH2 1/20 0.39
CYP1A2 P05177 1/20 0.39
CYP2D6 P10635 1/20 0.39
CYP2C9 P11712 1/20 0.39
CYP2C19 P33261 1/20 0.39
CTSL P07711 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL24943771 0.81 PDK2 (0.40) OPRM1
SCHEMBL24943664 0.80 OPRM1 (0.46) ALDH1A1LMNAGAAOPRM1
SCHEMBL24944621 0.80 ESR1 (0.44) MAPTGAAL3MBTL1KDM4EOPRM1
SCHEMBL24944151 0.80 SLC6A4 (0.42) MAPTNPC1RAB9ALMNASMN1; SMN2
SCHEMBL26413409 0.79 SLC6A2 (0.41) MAPTALDH1A1GAACYP2D6OPRM1
SCHEMBL24943768 0.79 SLC6A4 (0.39) MAPTNPC1RAB9AOPRM1
SCHEMBL24944295 0.79 NPC1 (0.49) MAPTNPC1ALDH1A1LMNAL3MBTL1
SCHEMBL24943754 0.78 SMN1; SMN2 (0.43) MAPTALDH1A1SMN1; SMN2HPGDKDM4E
SCHEMBL24944313 0.78 ESR1 (0.42) MAPTALDH1A1LMNAOPRM1
SCHEMBL26413775 0.78 ALDH1A1 (0.46) ALDH1A1LMNAL3MBTL1ATMOPRM1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11644753-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-09 US disclosed
US-11644753-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-09 US disclosed
US-20230131303-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 US disclosed
US-20230021453-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-01-26 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-11644753-B2 Resist composition and patterning process HNRNPU, NSUN2, HNRNPR TTR 2495/4885MAPT 2648/4885NPC1 4818/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.