Predicted protein targets (top 9)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | NPC1 | O15118 | 1/20 | 0.49 |
| ▸ | ALDH1A1 | P00352 | 5/20 | 0.49 |
| ▸ | LMNA | P02545 | 3/20 | 0.49 |
| ▸ | MAPT | P10636 | 3/20 | 0.49 |
| ▸ | POLB | P06746 | 2/20 | 0.43 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.43 |
| ▸ | GLA | P06280 | 1/20 | 0.41 |
| ▸ | HTT | P42858 | 1/20 | 0.39 |
| ▸ | OPRM1 | P35372 | 1/20 | 0.36 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL24943767 | 0.95 | ALDH1A1 (0.49) | NPC1ALDH1A1LMNAMAPTPOLB | |
| SCHEMBL24944296 | 0.91 | KEAP1 (0.45) | NPC1ALDH1A1LMNAMAPTPOLB | |
| SCHEMBL24944714 | 0.82 | HNF4A (0.48) | OPRM1 | |
| SCHEMBL26413827 | 0.81 | SCN1A (0.51) | OPRM1 | |
| SCHEMBL24944290 | 0.79 | TTR (0.47) | NPC1ALDH1A1LMNAMAPTL3MBTL1 | |
| SCHEMBL24944623 | 0.78 | RXFP1 (0.46) | NPC1ALDH1A1POLBL3MBTL1OPRM1 | |
| SCHEMBL24944311 | 0.78 | HPGD (0.44) | NPC1ALDH1A1LMNAMAPTOPRM1 | |
| SCHEMBL24944294 | 0.78 | NR4A1 (0.44) | ALDH1A1MAPTPOLBL3MBTL1HTT | |
| SCHEMBL24944269 | 0.78 | OPRM1 (0.42) | LMNAOPRM1 | |
| SCHEMBL24944624 | 0.78 | OPRM1 (0.39) | ALDH1A1LMNAOPRM1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11644753-B2 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-05-09 | — | — | US | disclosed |
| US-11644753-B2 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-05-09 | — | — | US | disclosed |
| US-20230131303-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-04-27 | — | — | US | disclosed |
| US-20230021453-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-01-26 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-11644753-B2 | Resist composition and patterning process | HNRNPU, NSUN2, HNRNPR | NPC1 4818/4885ALDH1A1 4767/4885LMNA 2930/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.