SCHEMBL24944714

SCHEMBL24944714

O=C(OC1(c2ccccc2)CCNCC1)c1cccc(-c2ccccc2)c1O

nearest known ligand 0.48

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
HNF4A P41235 1/20 0.48
SCN1A P35498 3/20 0.42
SCN2A Q99250 3/20 0.42
SCN3A Q9NY46 3/20 0.42
OPRM1 P35372 2/20 0.37
CHRNB2 P17787 2/20 0.37
CHRNB4 P30926 2/20 0.37
CHRNA3 P32297 2/20 0.37
CHRNA4 P43681 2/20 0.37
PLAU P00749 1/20 0.36
PLAT P00750 1/20 0.36
HDAC4 P56524 1/20 0.35
HDAC2 Q92769 1/20 0.35
HDAC8 Q9BY41 1/20 0.35
HDAC6 Q9UBN7 1/20 0.35
CHRM3 P20309 2/20 0.34
BCAT2 O15382 1/20 0.34
PTPN1 P18031 1/20 0.34
ITGA4 P13612 1/20 0.33
ITGB7 P26010 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL26413827 0.90 SCN1A (0.51) SCN1ASCN2ASCN3AOPRM1CHRNB2
SCHEMBL24944624 0.86 OPRM1 (0.39) OPRM1TSHR
SCHEMBL24944854 0.84 HPGD (0.44) OPRM1
SCHEMBL24944222 0.82 SIGMAR1 (0.42) OPRM1TSHR
SCHEMBL26413848 0.82 SCN1A (0.46) SCN1ASCN2ASCN3AOPRM1CHRNB2
SCHEMBL24944295 0.82 NPC1 (0.49) OPRM1
SCHEMBL24944296 0.82 KEAP1 (0.45) OPRM1
SCHEMBL24943767 0.82 ALDH1A1 (0.49) OPRM1RECQL
SCHEMBL24944311 0.82 HPGD (0.44) OPRM1TSHR
SCHEMBL26413459 0.81 OPRM1 (0.39) OPRM1RECQL

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11644753-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-09 US disclosed
US-11644753-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-09 US disclosed
US-20230131303-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 US disclosed
US-20230021453-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-01-26 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-11644753-B2 Resist composition and patterning process HNRNPU, NSUN2, HNRNPR HNF4A 2119/4885SCN1A 2344/4885SCN2A 2149/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.