SCHEMBL24944296

SCHEMBL24944296

O=C(OC1(c2ccccc2)CCNCC1)c1cccc2c1-c1ccccc1C2=O

nearest known ligand 0.45

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
KEAP1 Q14145 4/20 0.45
NFE2L2 Q16236 1/20 0.45
ALDH1A1 P00352 5/20 0.43
L3MBTL1 Q9Y468 1/20 0.43
SMN1; SMN2 Q16637 2/20 0.41
TP53 P04637 1/20 0.40
KMT2A Q03164 3/20 0.40
MEN1 O00255 2/20 0.40
ATM Q13315 1/20 0.39
POLB P06746 2/20 0.38
NPC1 O15118 1/20 0.38
MAPT P10636 3/20 0.37
LMNA P02545 2/20 0.37
USP2 O75604 1/20 0.37
PKM P14618 1/20 0.37
GAA P10253 1/20 0.37
OPRM1 P35372 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL24943767 0.95 ALDH1A1 (0.49) KEAP1NFE2L2ALDH1A1L3MBTL1SMN1; SMN2
SCHEMBL24944295 0.91 NPC1 (0.49) ALDH1A1L3MBTL1POLBNPC1MAPT
SCHEMBL24944714 0.82 HNF4A (0.48) OPRM1
SCHEMBL26413827 0.81 SCN1A (0.51) SMN1; SMN2KMT2AMEN1OPRM1
SCHEMBL26413478 0.80 SIGMAR1 (0.46) ALDH1A1L3MBTL1KMT2AMEN1NPC1
SCHEMBL24944290 0.79 TTR (0.47) ALDH1A1L3MBTL1SMN1; SMN2ATMNPC1
SCHEMBL24944311 0.78 HPGD (0.44) ALDH1A1SMN1; SMN2NPC1MAPTLMNA
SCHEMBL24944623 0.78 RXFP1 (0.46) ALDH1A1L3MBTL1SMN1; SMN2TP53KMT2A
SCHEMBL24944294 0.78 NR4A1 (0.44) ALDH1A1L3MBTL1SMN1; SMN2KMT2AMEN1
SCHEMBL24944269 0.78 OPRM1 (0.42) KMT2ALMNAOPRM1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11644753-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-09 US disclosed
US-11644753-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-09 US disclosed
US-20230131303-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 US disclosed
US-20230021453-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-01-26 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-11644753-B2 Resist composition and patterning process HNRNPU, NSUN2, HNRNPR KEAP1 3312/4885NFE2L2 3379/4885ALDH1A1 4767/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.