SCHEMBL2494588

SCHEMBL2494588

CCN(CC)C(=Cc1ccccc1)c1ccc2ccccc2n1

nearest known ligand 0.51

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MEN1 O00255 7/20 0.51
KMT2A Q03164 7/20 0.51
MAPT P10636 7/20 0.51
KDM4E B2RXH2 7/20 0.51
ALDH1A1 P00352 6/20 0.51
HPGD P15428 1/20 0.51
MGAM O43451 1/20 0.45
LMNA P02545 4/20 0.44
SMN1; SMN2 Q16637 6/20 0.43
GAA P10253 5/20 0.43
RAB9A P51151 5/20 0.43
NPC1 O15118 2/20 0.43
L3MBTL1 Q9Y468 1/20 0.42
CNR2 P34972 2/20 0.42
KDM4C Q9H3R0 1/20 0.40
RECQL P46063 1/20 0.40
PKM P14618 1/20 0.40
NFKB1 P19838 1/20 0.39
NFKB2 Q00653 1/20 0.39
RELA Q04206 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1348645 0.84 LMNA (0.55) MEN1KMT2AMAPTKDM4EALDH1A1
SCHEMBL8520463 0.83 KDM4E (0.49) MEN1KMT2AMAPTKDM4EALDH1A1
SCHEMBL9804033 0.81 RAB9A (0.44) MEN1KMT2AMAPTKDM4EALDH1A1
SCHEMBL9617201 0.79 MAPT (0.54) MEN1KMT2AMAPTKDM4EALDH1A1
SCHEMBL8822084 0.77 MAPT (0.48) MEN1KMT2AMAPTKDM4EALDH1A1
SCHEMBL15549323 0.75 MAPT (0.62) MEN1KMT2AMAPTKDM4EALDH1A1
SCHEMBL9803850 0.75 NPC1 (0.49) MEN1KMT2AMAPTKDM4EALDH1A1
SCHEMBL12411252 0.74 NPC1 (0.49) MEN1KMT2AMAPTALDH1A1HPGD
SCHEMBL11206642 0.74 NPC1 (0.49) MEN1KMT2AMAPTALDH1A1HPGD
SCHEMBL29044143 0.74 MEN1 (0.66) MEN1KMT2AMAPTKDM4EALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 21 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-4985470-A Three component photoinitiator system, printing plates, photoresists, inks, paints, adhesives MITSUBISHI KASEI CORPORATION (JP) 1991-01-15 US claimed
US-12559468-B2 Method for producing organic compound DAIKIN INDUSTRIES, LTD. (JP) 2026-02-24 US disclosed
EP-4257576-A2 METHOD FOR PRODUCING ORGANIC COMPOUND Daikin Industries, Ltd. (JP) 2023-10-11 EP disclosed
EP-3922625-A1 METHOD FOR PRODUCING ORGANIC COMPOUND DAIKIN INDUSTRIES, LTD. (JP) 2021-12-15 EP disclosed
US-20210371391-A1 METHOD FOR PRODUCING ORGANIC COMPOUND DAIKIN INDUSTRIES, LTD. (JP) 2021-12-02 US disclosed
CN-113412249-A Method for producing organic compound 大金工业株式会社 2021-09-17 CN disclosed
WO-2020162630-A1 METHOD FOR PRODUCING ORGANIC COMPOUND ダイキン工業株式会社 2020-08-13 WO disclosed
US-8575288-B2 Photocurable resin composition for forming overcoats RGB pixels black matrixes or spacers in color filter production, and color filters DAI NIPPON PRINTING CO., LTD. (JP) 2013-11-05 US disclosed
US-8029877-B2 Curable resin composition, curable resin composition for forming photosensitive pattern, color filter, liquid crystal panel substrate and liquid crystal panel DAI NIPPON PRINTING CO., LTD. (JP) 2011-10-04 US disclosed
US-20100238388-A1 CURABLE RESIN COMPOSITION, CURABLE RESIN COMPOSITION FOR FORMING PHOTOSENSITIVE PATTERN, COLOR FILTER, LIQUID CRYSTAL PANEL SUBSTRATE AND LIQUID CRYSTAL PANEL DAI NIPPON PRINTING CO., LTD. (JP) 2010-09-23 US disclosed
US-7399574-B2 Curable resin for photo-patterning, process for producing the same, curable resin composition, color filter, liquid crystal panel substrate, and liquid crystal panel DAI NIPPON PRINTING CO., LTD. (JP) 2008-07-15 US disclosed
US-7371783-B2 Alkali-soluble maleimide copolymer and liquid crystal display comprising the same NIPPON SHOKUBAI CO., LTD. (JP) 2008-05-13 US disclosed
US-20060229376-A1 Curable resin composition, photosensitive pattern-forming curable resin composition,color filter, substrate for liquid crystalline panel, and liquid crystalline panel DAI NIPPON PRINTING CO., LTD. (JP) 2006-10-12 US disclosed
US-20050074563-A1 Alkali-soluble maleimide copolymer and liquid crystal display comprising the same DAINIPPON PRINTING CO., LTD. (JP) 2005-04-07 US disclosed
US-20030118922-A1 Curable resin for photo-patterning, process for producing the same, curable resin composition, color filter, liquid crystal panel substrate, and liquid crystal panel DAI NIPPON PRINTING CO., LTD. (JP) 2003-06-26 US disclosed
WO-2003027156-A1 ALKALI-SOLUBLE MALEIMIDE COPOLYMER AND LIQUID CRYSTAL DISPLAY COMPRISING THE SAME DAINIPPON PRINTING CO., LTD. (JP) 2003-04-03 WO disclosed
US-4987056-A IMPROVED SENSITIVITY TO VISIBLE LIGHT TOYO BOSEKI KABUSHIKI KAISHA (JP) 1991-01-22 US disclosed
US-4985470-A Three component photoinitiator system, printing plates, photoresists, inks, paints, adhesives MITSUBISHI KASEI CORPORATION (JP) 1991-01-15 US disclosed
EP-0107792-B1 PHOTOPOLYMERIZABLE COMPOSITIONS MITSUBISHI KASEI CORPORATION (JP) 1985-12-27 EP disclosed
EP-0107792-A1 Photopolymerizable compositions MITSUBISHI KASEI CORPORATION (JP) 1984-05-09 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20210371391-A1 METHOD FOR PRODUCING ORGANIC COMPOUND PHF2, CYP2F1, INF2 MEN1 202/4885KMT2A 287/4885MAPT 3984/4885
US-12559468-B2 Method for producing organic compound FOXM1, FOXO3, FOXO1 MEN1 693/4885KMT2A 3164/4885MAPT 4434/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.