Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KDM4E | B2RXH2 | 7/20 | 0.48 |
| ▸ | RAB9A | P51151 | 3/20 | 0.48 |
| ▸ | GLO1 | Q04760 | 1/20 | 0.48 |
| ▸ | POLB | P06746 | 2/20 | 0.47 |
| ▸ | MAPT | P10636 | 6/20 | 0.46 |
| ▸ | NPC1 | O15118 | 2/20 | 0.46 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.46 |
| ▸ | MEN1 | O00255 | 1/20 | 0.46 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.46 |
| ▸ | FAAH | O00519 | 4/20 | 0.45 |
| ▸ | HTT | P42858 | 3/20 | 0.45 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.45 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.45 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.43 |
| ▸ | XDH | P47989 | 1/20 | 0.43 |
| ▸ | CES1 | P23141 | 2/20 | 0.42 |
| ▸ | DAGLA | Q9Y4D2 | 1/20 | 0.42 |
| ▸ | LMNA | P02545 | 2/20 | 0.41 |
| ▸ | GAA | P10253 | 2/20 | 0.41 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.41 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL476618 | 0.85 | KDM4E (0.49) | KDM4ERAB9AGLO1POLBMAPT | |
| SCHEMBL6819064 | 0.84 | MEN1 (0.46) | KDM4ERAB9APOLBMAPTNPC1 | |
| SCHEMBL8067656 | 0.80 | DAGLA (0.33) | KDM4ERAB9AGLO1POLBMAPT | |
| SCHEMBL5708151 | 0.76 | MAPT (0.55) | KDM4ERAB9AGLO1POLBMAPT | |
| SCHEMBL11133076 | 0.75 | RAB9A (0.38) | KDM4ERAB9AGLO1POLBMAPT | |
| SCHEMBL285169 | 0.73 | KDM4E (0.51) | KDM4ERAB9AGLO1POLBMAPT | |
| SCHEMBL12411252 | 0.72 | NPC1 (0.49) | RAB9AMAPTNPC1KMT2AMEN1 | |
| SCHEMBL11206642 | 0.72 | NPC1 (0.49) | RAB9AMAPTNPC1KMT2AMEN1 | |
| SCHEMBL2494588 | 0.72 | MEN1 (0.51) | KDM4ERAB9AMAPTNPC1KMT2A | |
| SCHEMBL9841094 | 0.70 | GLO1 (0.50) | KDM4ERAB9AGLO1MAPTNPC1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 17 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-4985470-A | Three component photoinitiator system, printing plates, photoresists, inks, paints, adhesives | MITSUBISHI KASEI CORPORATION (JP) | 1991-01-15 | — | — | US | claimed |
| JP-60019145-A | — | — | None | — | — | JP | disclosed |
| US-20250355350-A1 | NEGATIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION, PATTERNING PROCESS, METHOD FOR FORMING CURED COATING, INTERLAYER INSULATING FILM, SURFACE PROTECTING FILM, AND ELECTRONIC COMPONENT | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2025-11-20 | — | — | US | disclosed |
| EP-4650874-A1 | NEGATIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION, PATTERNING PROCESS, METHOD FOR FORMING CURED COATING, INTERLAYER INSULATING FILM, SURFACE PROTECTING FILM, AND ELECTRONIC COMPONENT | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2025-11-19 | — | — | EP | disclosed |
| WO-2020162630-A1 | METHOD FOR PRODUCING ORGANIC COMPOUND | ダイキン工業株式会社 | 2020-08-13 | — | — | WO | disclosed |
| US-8575288-B2 | Photocurable resin composition for forming overcoats RGB pixels black matrixes or spacers in color filter production, and color filters | DAI NIPPON PRINTING CO., LTD. (JP) | 2013-11-05 | — | — | US | disclosed |
| US-8029877-B2 | Curable resin composition, curable resin composition for forming photosensitive pattern, color filter, liquid crystal panel substrate and liquid crystal panel | DAI NIPPON PRINTING CO., LTD. (JP) | 2011-10-04 | — | — | US | disclosed |
| US-20100238388-A1 | CURABLE RESIN COMPOSITION, CURABLE RESIN COMPOSITION FOR FORMING PHOTOSENSITIVE PATTERN, COLOR FILTER, LIQUID CRYSTAL PANEL SUBSTRATE AND LIQUID CRYSTAL PANEL | DAI NIPPON PRINTING CO., LTD. (JP) | 2010-09-23 | — | — | US | disclosed |
| US-7537810-B2 | Curable resin composition, photosensitive pattern-forming curable resin composition, color filter, substrate for liquid crystalline panel, and liquid crystalline panel | DAI NIPPON PRINTING CO., LTD. (JP) | 2009-05-26 | — | — | US | disclosed |
| US-7399574-B2 | Curable resin for photo-patterning, process for producing the same, curable resin composition, color filter, liquid crystal panel substrate, and liquid crystal panel | DAI NIPPON PRINTING CO., LTD. (JP) | 2008-07-15 | — | — | US | disclosed |
| US-20060229376-A1 | Curable resin composition, photosensitive pattern-forming curable resin composition,color filter, substrate for liquid crystalline panel, and liquid crystalline panel | DAI NIPPON PRINTING CO., LTD. (JP) | 2006-10-12 | — | — | US | disclosed |
| US-20030118922-A1 | Curable resin for photo-patterning, process for producing the same, curable resin composition, color filter, liquid crystal panel substrate, and liquid crystal panel | DAI NIPPON PRINTING CO., LTD. (JP) | 2003-06-26 | — | — | US | disclosed |
| US-4985470-A | Three component photoinitiator system, printing plates, photoresists, inks, paints, adhesives | MITSUBISHI KASEI CORPORATION (JP) | 1991-01-15 | — | — | US | disclosed |
| EP-0107792-B1 | PHOTOPOLYMERIZABLE COMPOSITIONS | MITSUBISHI KASEI CORPORATION (JP) | 1985-12-27 | — | — | EP | disclosed |
| JP-S6019145-A | COMPOSITE TYPE ELECTROPHOTOGRAPHIC SENSITIVE BODY | HITACHI LTD | 1985-01-31 | — | — | JP | disclosed |
| EP-0107792-A1 | Photopolymerizable compositions | MITSUBISHI KASEI CORPORATION (JP) | 1984-05-09 | — | — | EP | disclosed |
| US-4346157-A | CHARGE GENERATING AND CHARGE TRANSPORT LAYERS | HITACHI, LTD. (JP) | 1982-08-24 | — | — | US | disclosed |