SCHEMBL2497217

SCHEMBL2497217

CC(C)N(c1ccc(C(=O)c2ccc(N(C(C)C)C(C)C)cc2)cc1)C(C)C

nearest known ligand 0.58

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
HPGD P15428 6/20 0.58
ALDH1A1 P00352 5/20 0.58
MAPT P10636 2/20 0.58
RAB9A P51151 2/20 0.50
NPC1 O15118 1/20 0.50
LMNA P02545 2/20 0.46
ELANE P08246 2/20 0.44
SRD5A2 P31213 3/20 0.42
HTT P42858 2/20 0.42
ESR1 P03372 1/20 0.42
ESR2 Q92731 1/20 0.42
PKM P14618 1/20 0.42
NPSR1 Q6W5P4 2/20 0.41
MCOLN3 Q8TDD5 1/20 0.41
ABCB1 P08183 1/20 0.41
SMN1; SMN2 Q16637 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL925065 0.84 TSHR (0.52) HPGDALDH1A1RAB9ANPC1SRD5A2
SCHEMBL1128718 0.83 PARP10 (0.50) HPGDALDH1A1MAPT
SCHEMBL20438385 0.80 ALDH1A1 (0.39) ALDH1A1
SCHEMBL960521 0.78 MPO (0.52) HPGDALDH1A1MAPTRAB9ALMNA
SCHEMBL1006322 0.78 GSK3B (0.55) ABCB1
SCHEMBL18458446 0.75 RAB9A (0.58) HPGDALDH1A1MAPTRAB9ANPC1
SCHEMBL6843785 0.74 HPGD (0.59) HPGDALDH1A1MAPTRAB9ANPC1
Bicarbonate SCHEMBL6665758 0.74 ALDH1A1 (0.43) ALDH1A1MAPTRAB9ANPC1LMNA
SCHEMBL28974215 0.74 AKR1C3 (0.37) HPGDRAB9ANPC1
SCHEMBL17709712 0.74 HPGD (0.56) HPGDALDH1A1MAPTRAB9ANPC1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 14 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8029877-B2 Curable resin composition, curable resin composition for forming photosensitive pattern, color filter, liquid crystal panel substrate and liquid crystal panel DAI NIPPON PRINTING CO., LTD. (JP) 2011-10-04 US disclosed
US-20100238388-A1 CURABLE RESIN COMPOSITION, CURABLE RESIN COMPOSITION FOR FORMING PHOTOSENSITIVE PATTERN, COLOR FILTER, LIQUID CRYSTAL PANEL SUBSTRATE AND LIQUID CRYSTAL PANEL DAI NIPPON PRINTING CO., LTD. (JP) 2010-09-23 US disclosed
US-7758930-B2 Curable resin composition, curable resin composition for forming photosensitive pattern, color filter, liquid crystal panel substrate and liquid crystal panel DAI NIPPON PRINTING CO., LTD. (JP) 2010-07-20 US disclosed
US-20090202749-A1 CURABLE RESIN COMPOSITION, CURABLE RESIN COMPOSITION FOR FORMING PHOTOSENSITIVE PATTERN, COLOR FILTER, LIQUID CRYSTAL PANEL SUBSTRATE AND LIQUID CRYSTAL PANEL HAYASHI SHINJI 2009-08-13 US disclosed
US-7537810-B2 Curable resin composition, photosensitive pattern-forming curable resin composition, color filter, substrate for liquid crystalline panel, and liquid crystalline panel DAI NIPPON PRINTING CO., LTD. (JP) 2009-05-26 US disclosed
US-20060229376-A1 Curable resin composition, photosensitive pattern-forming curable resin composition,color filter, substrate for liquid crystalline panel, and liquid crystalline panel DAI NIPPON PRINTING CO., LTD. (JP) 2006-10-12 US disclosed
US-5738974-A PHOTOPOLYMERIZABLE COMPOSITION, INITIATOR COMPRISING TITANOCENE COMPOUND AND COUMARIN COMPOUND ON ANODIZED ALUMINUM SUBSTRATE MITSUBISHI CHEMICAL CORPORATION (JP) 1998-04-14 US disclosed
EP-0704764-B1 Photopolymerizable composition and photosensitive lithographic printing plate MITSUBISHI CHEM CORP (JP) 1998-03-25 EP disclosed
US-5576138-A MIXTURE OF RESIN, PHOTOSENSITIZER AND BENZOPHENONE COMPOUND TOKYO OHKA KOGYO CO., LTD. (JP) 1996-11-19 US disclosed
EP-0704764-A1 Photopolymerizable composition and photosensitive lithographic printing plate MITSUBISHI CHEMICAL CORPORATION (JP) 1996-04-03 EP disclosed
US-5498641-A PHOTOPOLYMERIZATION MITSUBISHI CHEMICAL CORPORATION (JP) 1996-03-12 US disclosed
EP-0619520-B1 Photopolymerizable composition MITSUBISHI CHEM CORP (JP) 1996-01-31 EP disclosed
US-5478692-A Fine patterning for electronics TOKYO OHKA KOGYO CO., LTD. (JP) 1995-12-26 US disclosed
EP-0619520-A1 Photopolymerizable composition Mitsubishi Chemical Corporation (JP) 1994-10-12 EP disclosed