⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL23432887 | 0.81 | PRKAB2 (0.34) | — | |
| SCHEMBL25006128 | 0.68 | BACE1 (0.35) | — | |
| SCHEMBL24995338 | 0.67 | ERN1 (0.36) | — | |
| SCHEMBL26057587 | 0.66 | MAP4K4 (0.33) | — | |
| SCHEMBL21784161 | 0.64 | HSP90AA1 (0.30) | — | |
| SCHEMBL24995588 | 0.62 | KIF11 (0.44) | — | |
| SCHEMBL21794146 | 0.62 | SMN1; SMN2 (0.50) | — | |
| SCHEMBL21794096 | 0.61 | PDE5A (0.36) | — | |
| SCHEMBL25006154 | 0.60 | CYP1A2 (0.44) | — | |
| SCHEMBL21794138 | 0.59 | ELANE (0.50) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-4130878-A1 | ACTIVE-LIGHT-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTIVE-LIGHT-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMATION METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, ACTIVE-LIGHT-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION FOR MANUFACTURING PHOTOMASK, AND METHOD FOR MANUFACTURING PHOTOMASK | FUJIFILM Corporation (JP) | 2023-02-08 | — | — | EP | disclosed |