SCHEMBL25006128

SCHEMBL25006128

COC(Oc1cc(-c2ccccc2)c(S(=O)(=O)O)c(-c2ccccc2)c1)C(C)(C)C

nearest known ligand 0.35

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ BACE1 P56817 3/20 0.35
▸ PTGS2 P35354 2/20 0.33
▸ PTPN1 P18031 2/20 0.32
▸ PTGDR2 Q9Y5Y4 1/20 0.32
▸ PPARG P37231 1/20 0.32
▸ PPARA Q07869 1/20 0.32
▸ ALDH1A1 P00352 2/20 0.31
▸ NPSR1 Q6W5P4 2/20 0.31
▸ MITF O75030 1/20 0.31
▸ MAPT P10636 1/20 0.31
▸ HTT P42858 1/20 0.31
▸ GAA P10253 2/20 0.31
▸ TDP1 Q9NUW8 1/20 0.31
▸ HSP90AA1 P07900 1/20 0.31
▸ HSP90AB1 P08238 1/20 0.31
▸ KDM4E B2RXH2 1/20 0.31
▸ HPGD P15428 1/20 0.31
▸ KMT2A Q03164 1/20 0.31
▸ PAX8 Q06710 1/20 0.31
▸ HDAC8 Q9BY41 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL23432887 0.84 PRKAB2 (0.34) GAACYP1A2CYP2C9PKMCYP2C19
SCHEMBL24995298 0.70 SLC9A1 (0.32) BACE1PTGS2PTGDR2ALDH1A1NPSR1
SCHEMBL21794265 0.69 PTPN1 (0.47) BACE1PTGS2PTPN1NPSR1MAPT
SCHEMBL23433033 0.69 BACE1 (0.46) BACE1PTGS2KMT2AFGFR1SRC
SCHEMBL23432939 0.69 CA12 (0.43) PTGS2ALDH1A1TDP1
SCHEMBL21794269 0.68 ALDH1A1 (0.48) BACE1ALDH1A1MAPTKDM4EHPGD
SCHEMBL25006154 0.68 CYP1A2 (0.44) PPARGPPARAMAPTGAACYP1A2
SCHEMBL196605 0.67 PTPN1 (0.50) BACE1PTGS2PTPN1PPARGALDH1A1
SCHEMBL24995338 0.67 ERN1 (0.36) PPARGPPARAGAACYP1A2CYP2C9
SCHEMBL24581546 0.66 EGFR (0.47) BACE1MAPTGAAHDAC8

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230038825-A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION FOR MANUFACTURING PHOTOMASK, AND METHOD FOR MANUFACTURING PHOTOMASK FUJIFILM CORPORATION (JP) 2023-02-09 — — US disclosed
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