Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MMP2 | P08253 | 9/20 | 0.53 |
| ▸ | MMP12 | P39900 | 9/20 | 0.53 |
| ▸ | MMP13 | P45452 | 9/20 | 0.53 |
| ▸ | MMP14 | P50281 | 9/20 | 0.53 |
| ▸ | MMP9 | P14780 | 8/20 | 0.53 |
| ▸ | MMP1 | P03956 | 7/20 | 0.53 |
| ▸ | MMP3 | P08254 | 7/20 | 0.53 |
| ▸ | MMP8 | P22894 | 6/20 | 0.53 |
| ▸ | MMP16 | P51512 | 6/20 | 0.53 |
| ▸ | MAPT | P10636 | 3/20 | 0.47 |
| ▸ | TDP1 | Q9NUW8 | 3/20 | 0.47 |
| ▸ | KDM4E | B2RXH2 | 3/20 | 0.47 |
| ▸ | MAPK1 | P28482 | 2/20 | 0.47 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.47 |
| ▸ | MEN1 | O00255 | 1/20 | 0.47 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.47 |
| ▸ | HPGD | P15428 | 1/20 | 0.47 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.47 |
| ▸ | CES1 | P23141 | 1/20 | 0.47 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.47 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL6026006 | 0.86 | MAPK1 (0.46) | MMP2MMP12MMP13MMP14MMP9 | |
| SCHEMBL6026669 | 0.86 | CA1 (0.54) | MMP2MMP12MMP13MMP14MMP9 | |
| SCHEMBL3673843 | 0.85 | L3MBTL1 (0.42) | MMP2MMP12MMP13MMP14MMP9 | |
| SCHEMBL7196858 | 0.82 | MAPT (0.61) | MAPTTDP1KDM4EMAPK1SMN1; SMN2 | |
| SCHEMBL3672572 | 0.81 | HSD11B1 (0.55) | MMP2MMP12MMP13MMP14MMP9 | |
| SCHEMBL3669454 | 0.80 | MAPT (0.49) | MAPTTDP1KDM4EMAPK1SMN1; SMN2 | |
| SCHEMBL3669105 | 0.80 | KMT2A (0.44) | MAPTTDP1KDM4EMAPK1SMN1; SMN2 | |
| SCHEMBL3670848 | 0.80 | MMP1 (0.45) | MMP2MMP12MMP13MMP14MMP9 | |
| SCHEMBL3671243 | 0.80 | MAOA (0.45) | MMP2MMP12MMP13MMP14MMP9 | |
| SCHEMBL7619216 | 0.78 | SRD5A2 (0.49) | MMP2MMP12MMP13MMP14MMP9 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 46 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-5994022-A | BECOMES SOLUBLE IN ALKALI DEVELOPING SOLUTION BY ACTION OF AN ACID | JSR CORPORATION (JP) | 1999-11-30 | — | — | US | claimed |
| US-10421853-B2 | Photosensitive gas generating agent and photocurable composition | CANON KABUSHIKI KAISHA (JP) | 2019-09-24 | — | — | US | disclosed |
| EP-2941781-B1 | PHOTOSENSITIVE GAS GENERATING AGENT AND PHOTOCURABLE COMPOSITION | CANON KK (JP) | 2017-08-09 | — | — | EP | disclosed |
| US-20150368433-A1 | PHOTOSENSITIVE GAS GENERATING AGENT AND PHOTOCURABLE COMPOSITION | CANON KABUSHIKI KAISHA (JP) | 2015-12-24 | — | — | US | disclosed |
| EP-2941781-A1 | PHOTOSENSITIVE GAS GENERATING AGENT AND PHOTOCURABLE COMPOSITION | Canon Kabushiki Kaisha (JP) | 2015-11-11 | — | — | EP | disclosed |
| US-20150086755-A1 | PHOTOCURED PRODUCT | CANON KABUSHIKI KAISHA (JP) | 2015-03-26 | — | — | US | disclosed |
| WO-2014136977-A1 | PHOTOSENSITIVE GAS GENERATING AGENT AND PHOTOCURABLE COMPOSITION | CANON KABUSHIKI KAISHA (JP) | 2014-09-12 | — | — | WO | disclosed |
| WO-2013183468-A1 | PHOTOCURED PRODUCT | CANON KABUSHIKI KAISHA (JP) | 2013-12-12 | — | — | WO | disclosed |
| US-8582210-B2 | Lens and method for producing lens | CANON KABUSHIKI KAISHA (JP) | 2013-11-12 | — | — | US | disclosed |
| US-20110242672-A1 | LENS AND METHOD FOR PRODUCING LENS | CANON KABUSHIKI KAISHA (JP) | 2011-10-06 | — | — | US | disclosed |
| WO-2000059494-A1 | STYRYL SULFONE ANTICANCER AGENTS | TEMPLE UNIVERSITY- OF THE COMMONWEALTH SYSTEM OF HIGHER EDUCATION (US) | 2000-10-12 | — | — | WO | disclosed |
| US-6114086-A | COMPRISING ALKALI-SOLUBLE RESIN, DISSOLUTION CONTROLLING AGENTS, PHOTOACID GENERATOR, SOLVENT; USED FOR THE MANUFACTURE OF SEMICONDUCTOR DEVICES OR INTEGRATED CIRCUITS | JSR CORPORATION (JP) | 2000-09-05 | — | — | US | disclosed |
| EP-1027330-A1 | STYRYL SULFONE ANTICANCER AGENTS | Temple University of the Commonwealth System of Higher Education (US) | 2000-08-16 | — | — | EP | disclosed |
| US-5994022-A | BECOMES SOLUBLE IN ALKALI DEVELOPING SOLUTION BY ACTION OF AN ACID | JSR CORPORATION (JP) | 1999-11-30 | — | — | US | disclosed |
| US-5916729-A | A POSITIVE TONE TYPE REISTS CONSISTS OF A RESIN WHICH HAS AN ACIDIC FUNCTIONAL GROUP PROTECTED BY AN ACID DECOMPOSABLE GROUP AND IS HYDROLYZABLE, A PHOTOACID GENERATOR AND A SOLVENT MIXTURE OF ALKYL LACTATE WITH PROPYLENE GLYCOL ETHER | JSR CORPORATION (JP) | 1999-06-29 | — | — | US | disclosed |
| WO-1999018068-A1 | STYRYL SULFONE ANTICANCER AGENTS | TEMPLE UNIVERSITY - OF THE COMMONWEALTH SYSTEM OF HIGHER EDUCATION (US) | 1999-04-15 | — | — | WO | disclosed |
| EP-0843220-A1 | Radiation sensitive resin composition | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1998-05-20 | — | — | EP | disclosed |
| EP-0634696-B1 | Chemically amplified resist composition | JAPAN SYNTHETIC RUBBER CO LTD (JP) | 1998-01-14 | — | — | EP | disclosed |
| US-5629135-A | ALKALI-SOLUBLE RESIN, CROSSLINKER, PHOTOACID GENERATOR, SOLVENT | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1997-05-13 | — | — | US | disclosed |
| EP-0634696-A1 | Chemically amplified resist composition | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1995-01-18 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20150368433-A1 | PHOTOSENSITIVE GAS GENERATING AGENT AND PHOTOCURABLE COMPOSITION | PFN1, PFAS, FRG1 | MMP2 4716/4885MMP12 4684/4885MMP13 4833/4885 |
| US-10421853-B2 | Photosensitive gas generating agent and photocurable composition | PFN1, PFAS, FRG1 | MMP2 4716/4885MMP12 4684/4885MMP13 4833/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.