SCHEMBL2529863

SCHEMBL2529863

CC(=O)OC(C)(C)C(=[N+]=[N-])S(=O)(=O)c1ccc(C)cc1

nearest known ligand 0.37

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 6/20 0.37
LMNA P02545 5/20 0.37
HTT P42858 2/20 0.37
POLB P06746 2/20 0.37
NOD2 Q9HC29 1/20 0.37
KMT2A Q03164 3/20 0.36
GAA P10253 2/20 0.36
MEN1 O00255 2/20 0.36
CYP3A4 P08684 1/20 0.36
CYP2C9 P11712 1/20 0.36
MAPK1 P28482 1/20 0.36
CYP2C19 P33261 1/20 0.36
PKM P14618 1/20 0.35
MAPT P10636 1/20 0.34
CA1 P00915 2/20 0.33
CA2 P00918 2/20 0.33
MMP1 P03956 1/20 0.33
MMP2 P08253 1/20 0.33
MMP9 P14780 1/20 0.33
MMP8 P22894 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2529463 0.87 SMN1; SMN2 (0.40) ALDH1A1LMNAHTTKMT2AGAA
SCHEMBL4655000 0.81 ALDH1A1 (0.39) ALDH1A1LMNAHTTPOLBNOD2
SCHEMBL383775 0.72 ALDH1A1 (0.41) ALDH1A1LMNAHTTPOLBNOD2
SCHEMBL2863852 0.70 ALDH1A1 (0.43) ALDH1A1LMNAHTTPOLBNOD2
SCHEMBL384657 0.70 ALDH1A1 (0.44) ALDH1A1LMNAHTTPOLBNOD2
SCHEMBL7720737 0.70 LMNA (0.59) ALDH1A1LMNAPOLBKMT2AGAA
SCHEMBL3207137 0.69 ALDH1A1 (0.42) ALDH1A1LMNAHTTPOLBNOD2
SCHEMBL36092 0.69 GAA (0.48) ALDH1A1LMNAHTTPOLBNOD2
SCHEMBL29438577 0.69 STAT3 (0.44) ALDH1A1LMNAKMT2AGAAMEN1
SCHEMBL29398676 0.68 KMT2A (0.44) ALDH1A1LMNAHTTPOLBNOD2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 22 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8389204-B2 Method for producing comb-shaped electrode TOKYO OHKA KOGYO CO., LTD. (JP) 2013-03-05 US disclosed
US-20110256484-A1 METHOD FOR PRODUCING COMB-SHAPED ELECTRODE TOKYO METROPOLITAN UNIVERSITY (JP) 2011-10-20 US disclosed
US-20100016465-A1 Composite Material Comprising A Water-Or Acid-Releasing Agent DENTOFIT A/S (DK) 2010-01-21 US disclosed
EP-1996144-A2 COMPOSITE MATERIAL, IN PARTICULAR A DENTAL FILLING MATERIAL Dentofit A/S (DK) 2008-12-03 EP disclosed
WO-2007104312-A2 COMPOSITE MATERIAL, IN PARTICULAR A DENTAL FILLING MATERIAL DENTOFIT A/S (DK) 2007-09-20 WO disclosed
US-7179399-B2 Material for forming protective film TOKYO OHKA KOGYO CO., LTD. (JP) 2007-02-20 US disclosed
US-6693049-B2 FILLING WITH AN OXYALKYLATED MELAMINE, BENZOGUANAMINE, ACETOGUANAMINE, GLYCOL URYL, UREA, THIOUREA, GUANIDINE, ALKYLENEUREA OR SUCCINYLAMIDE AND HEATING AT 150-250 C, WHEREBY NO BUBBLE IS GENERATED WHEN THE FINE HOLE IS FILLED. TOKYO OHKA KOGYO CO., LTD. (JP) 2004-02-17 US disclosed
US-6689535-B2 A NOVALAK RESIN CROSSLINKING AGENT HAVING HYDROXYALKYL AND/OR ALKOXYALKYL GROUPS AND AN ACIDIC COMPOUND; UNDERCOATINGS; A RECTANGULAR CROSS-SECTIONAL PROFILE WITHOUT CAUSING FOOTING, UNDERCUTTING, ETC. AT THE BOTTOM TOKYO OHKA KOGYO CO., LTD (JP) 2004-02-10 US disclosed
US-RE38254-E1 Positive resist composition TOKYO OHKA KOGYO CO., LTD. (JP) 2003-09-16 US disclosed
US-20030032280-A1 Method for filling fine hole TOKYO OHKA KOGYO CO., LTD. (JP) 2003-02-13 US disclosed
EP-0827970-B1 New acid-labile group protected hydroxystyrene polymers or copolymers thereof and their application to radiation sensitive materials CLARIANT FINANCE BVI LTD (VG) 2001-09-26 EP disclosed
US-6159652-A Positive resist composition TOKYO OHKA KOGYO CO., LTD. (JP) 2000-12-12 US disclosed
US-5955240-A MODIFIED POLYHYDROXYSTYRENE, ACID GENERATING CHEMICAL, CARBOXYLIC ACID, AMINE TOKYO OHKA KOGYO CO., LTD. (JP) 1999-09-21 US disclosed
US-5948589-A HIGH SENSITIVITY AND HIGH RESOLUTION CAPABLE OF EXHIBITING HIGH STABILITY OF LATENT IMAGES; TERT-BUTYOXYCARBONYL-SUBSTITUTED POLYVINYLPHENOL AND ALKOXYALKYL-SUBSTITUTED POLYVINYLPHENOL. TOKYO OHKA KOGYO CO., LTD. (JP) 1999-09-07 US disclosed
US-5854357-A Process for the production of polyhydroxstyrene TOKYO OHKA KOGYO CO., LTD. (JP) 1998-12-29 US disclosed
US-5852128-A Acid-labile group protected hydroxystyrene polymers or copolymers thereof and their application to radiation sensitive materials CLARIANT AG (CH) 1998-12-22 US disclosed
US-5736296-A Positive resist composition comprising a mixture of two polyhydroxystyrenes having different acid cleavable groups and an acid generating compound TOKYO OHKA KOGYO CO., LTD. (JP) 1998-04-07 US disclosed
EP-0827970-A2 New acid-labile group protected hydroxystyrene polymers or copolymers thereof and their application to radiation sensitive materials Clariant AG (CH) 1998-03-11 EP disclosed
EP-0679951-B1 Positive resist composition TOKYO OHKA KOGYO CO LTD (JP) 1997-01-15 EP disclosed
EP-0679951-A1 Positive resist composition TOKYO OHKA KOGYO CO., LTD. (JP) 1995-11-02 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20100016465-A1 Composite Material Comprising A Water-Or Acid-Releasing Agent PLA2G2C, SMARCA1, VMA21 ALDH1A1 1006/4885LMNA 917/4885HTT 243/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.