Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 6/20 | 0.41 |
| ▸ | KMT2A | Q03164 | 4/20 | 0.41 |
| ▸ | MEN1 | O00255 | 3/20 | 0.41 |
| ▸ | LMNA | P02545 | 3/20 | 0.37 |
| ▸ | CA1 | P00915 | 3/20 | 0.35 |
| ▸ | CA2 | P00918 | 3/20 | 0.35 |
| ▸ | CA12 | O43570 | 2/20 | 0.35 |
| ▸ | CA9 | Q16790 | 2/20 | 0.35 |
| ▸ | CA14 | Q9ULX7 | 1/20 | 0.35 |
| ▸ | GAA | P10253 | 1/20 | 0.35 |
| ▸ | POLB | P06746 | 2/20 | 0.35 |
| ▸ | HTT | P42858 | 1/20 | 0.35 |
| ▸ | NOD2 | Q9HC29 | 1/20 | 0.35 |
| ▸ | MMP13 | P45452 | 2/20 | 0.34 |
| ▸ | MMP1 | P03956 | 1/20 | 0.34 |
| ▸ | MMP2 | P08253 | 1/20 | 0.34 |
| ▸ | MMP9 | P14780 | 1/20 | 0.34 |
| ▸ | MMP8 | P22894 | 1/20 | 0.34 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.34 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.34 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1089508 | 0.87 | HSD11B1 (0.41) | ALDH1A1KMT2ALMNACA1CA2 | |
| SCHEMBL27587801 | 0.83 | PSIP1 (0.43) | CA1CA2CA12CA9CA14 | |
| SCHEMBL384657 | 0.80 | ALDH1A1 (0.44) | ALDH1A1KMT2AMEN1LMNACA1 | |
| SCHEMBL2863852 | 0.78 | ALDH1A1 (0.43) | ALDH1A1KMT2AMEN1LMNACA1 | |
| SCHEMBL1089447 | 0.78 | ALDH1A1 (0.43) | ALDH1A1KMT2AMEN1LMNACA1 | |
| SCHEMBL29398676 | 0.76 | KMT2A (0.44) | ALDH1A1KMT2AMEN1LMNACA1 | |
| SCHEMBL9010795 | 0.75 | CES2 (0.48) | ALDH1A1KMT2ALMNAGAAPOLB | |
| SCHEMBL1089095 | 0.74 | ADORA3 (0.40) | ALDH1A1KMT2AMEN1LMNAGAA | |
| SCHEMBL563251 | 0.74 | ALDH1A1 (0.40) | ALDH1A1KMT2AMEN1LMNACA1 | |
| SCHEMBL2529863 | 0.72 | ALDH1A1 (0.37) | ALDH1A1KMT2AMEN1LMNACA1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 482 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-4607278-A1 | CHEMICALLY-AMPLIFIED POSITIVE PHOTORESIST COMPOSITION FOR PATTERN PROFILE IMPROVEMENT AND ETCH RESISTANCE ENHANCEMENT | Ycchem Co., Ltd. (KR) | 2025-08-27 | — | — | EP | claimed |
| US-20250199405-A1 | CHEMICALLY-AMPLIFIED POSITIVE PHOTORESIST COMPOSITION FOR PATTERN PROFILE IMPROVEMENT AND ETCH RESISTANCE ENHANCEMENT | YCCHEM CO., LTD. (KR) | 2025-06-19 | — | — | US | claimed |
| CN-119998727-A | Chemically amplified positive resist composition for improving pattern profile and enhancing etch resistance | YC化学制品株式会社 | 2025-05-13 | — | — | CN | claimed |
| WO-2024085293-A1 | CHEMICALLY-AMPLIFIED POSITIVE PHOTORESIST COMPOSITION FOR PATTERN PROFILE IMPROVEMENT AND ETCH RESISTANCE ENHANCEMENT | 영창케미칼 주식회사 | 2024-04-25 | — | — | WO | claimed |
| EP-2326744-B1 | METAL COMPOSITIONS AND METHODS OF MAKING SAME | PRYOG LLC (US) | 2022-06-01 | — | — | EP | claimed |
| US-20250382500-A1 | PRIMER COMPOSITION, LAMINATE, AND METHOD FOR PRODUCING LAMINATE | TOKYO OHKA KOGYO CO LTD (JP) | 2025-12-18 | — | — | US | disclosed |
| US-12493244-B2 | Photosensitive resin composition, photosensitive dry film, and pattern formation method | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2025-12-09 | — | — | US | disclosed |
| EP-4607278-A1 | CHEMICALLY-AMPLIFIED POSITIVE PHOTORESIST COMPOSITION FOR PATTERN PROFILE IMPROVEMENT AND ETCH RESISTANCE ENHANCEMENT | Ycchem Co., Ltd. (KR) | 2025-08-27 | — | — | EP | disclosed |
| US-20250216790-A1 | MATERIALS AND METHODS FOR FORMING PATTERNED MASK ON SUBSTRATE | GEMINATIO, INC., | 2025-07-03 | — | — | US | disclosed |
| US-20250216782-A1 | MASKING PROCESS USING SWITCHABLE POLYMER | TOKYO ELECTRON LTD (JP) | 2025-07-03 | — | — | US | disclosed |
| US-20250216763-A1 | ANTI-SPACER MASKING PROCESS USING RESIST LAYER WITH SOLUBILITY SHIFTING AGENT | TOKYO ELECTRON LTD (JP) | 2025-07-03 | — | — | US | disclosed |
| US-20250216783-A1 | ANTI-SPACER MASKING PROCESS USING SECOND SWITCHABLE POLYMER | TOKYO ELECTRON LTD (JP) | 2025-07-03 | — | — | US | disclosed |
| EP-0827970-A2 | New acid-labile group protected hydroxystyrene polymers or copolymers thereof and their application to radiation sensitive materials | Clariant AG (CH) | 1998-03-11 | — | — | EP | disclosed |
| US-5670299-A | COATING A PHOTORESISTS POLYMER ON A SUBSTRATE, DEVELOPMENT AND HEAT TREATMENT | WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) | 1997-09-23 | — | — | US | disclosed |
| EP-0679951-B1 | Positive resist composition | TOKYO OHKA KOGYO CO LTD (JP) | 1997-01-15 | — | — | EP | disclosed |
| EP-0749046-A1 | Positive-working photoresist composition | TOKYO OHKA KOGYO CO., LTD. (JP) | 1996-12-18 | — | — | EP | disclosed |
| EP-0749044-A2 | Positive-working photoresist composition | TOKYO OHKA KOGYO CO., LTD. (JP) | 1996-12-18 | — | — | EP | disclosed |
| US-5468589-A | Heat resistant, photosensitive patterns | WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) | 1995-11-21 | — | — | US | disclosed |
| EP-0679951-A1 | Positive resist composition | TOKYO OHKA KOGYO CO., LTD. (JP) | 1995-11-02 | — | — | EP | disclosed |
| EP-0520642-A1 | Resist material and pattern formation process | WAKO PURE CHEMICAL INDUSTRIES LTD (JP) | 1992-12-30 | — | — | EP | disclosed |