Predicted protein targets (top 13)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | SLC6A4 | P31645 | 12/20 | 0.40 |
| ▸ | SLC6A3 | Q01959 | 9/20 | 0.39 |
| ▸ | SLC6A2 | P23975 | 2/20 | 0.36 |
| ▸ | EPHX2 | P34913 | 2/20 | 0.34 |
| ▸ | PDE2A | O00408 | 1/20 | 0.34 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.34 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.34 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.34 |
| ▸ | AMPD2 | Q01433 | 1/20 | 0.33 |
| ▸ | MEN1 | O00255 | 1/20 | 0.33 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.33 |
| ▸ | ICMT | O60725 | 1/20 | 0.33 |
| ▸ | TGM2 | P21980 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL25564209 | 0.88 | SLC6A4 (0.43) | SLC6A4SLC6A3SLC6A2EPHX2PDE2A | |
| SCHEMBL25564668 | 0.84 | SLC6A4 (0.47) | SLC6A4SLC6A3SLC6A2EPHX2PDE2A | |
| SCHEMBL25564670 | 0.76 | ADORA3 (0.41) | SLC6A4SLC6A3SLC6A2PDE2ACYP3A4 | |
| SCHEMBL26396506 | 0.74 | SLC6A4 (0.38) | SLC6A4SLC6A3SLC6A2EPHX2PDE2A | |
| SCHEMBL25564207 | 0.72 | OPRM1 (0.36) | SLC6A4SLC6A3SLC6A2PDE2ACYP2C19 | |
| SCHEMBL25564148 | 0.71 | SLC6A4 (0.49) | SLC6A4SLC6A3SLC6A2EPHX2PDE2A | |
| SCHEMBL25564249 | 0.70 | SLC6A4 (0.51) | SLC6A4SLC6A3SLC6A2EPHX2PDE2A | |
| SCHEMBL25564200 | 0.70 | DRD2 (0.44) | SLC6A3SLC6A2CYP2C19 | |
| SCHEMBL25564666 | 0.69 | SLC6A3 (0.40) | SLC6A4SLC6A3SLC6A2PDE2ACYP2C19 | |
| SCHEMBL25564653 | 0.67 | HSD11B1 (0.41) | SLC6A4SLC6A3SLC6A2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20230161254-A1 | CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-05-25 | — | — | US | disclosed |
| US-20230161254-A1 | CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-05-25 | — | — | US | disclosed |