SCHEMBL25698202

SCHEMBL25698202

CCCCC(CC)COC(=O)n1cnc2cc(OC(C)=O)ccc21

nearest known ligand 0.41

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ ALDH1A1 P00352 6/20 0.41
▸ CYP3A4 P08684 3/20 0.41
▸ CA2 P00918 1/20 0.41
▸ MAPK1 P28482 3/20 0.40
▸ TSHR P16473 3/20 0.40
▸ TDP1 Q9NUW8 2/20 0.40
▸ LMNA P02545 3/20 0.39
▸ HSD17B10 Q99714 1/20 0.38
▸ SMN1; SMN2 Q16637 1/20 0.38
▸ PRSS1 P07477 1/20 0.38
▸ PRSS2 P07478 1/20 0.38
▸ PRSS3 P35030 1/20 0.38
▸ ATM Q13315 2/20 0.38
▸ FGFR1 P11362 2/20 0.36
▸ KMT2A Q03164 3/20 0.36
▸ GAA P10253 3/20 0.35
▸ HPGD P15428 1/20 0.35
▸ XBP1 P17861 1/20 0.35
▸ NPSR1 Q6W5P4 1/20 0.35
▸ L3MBTL1 Q9Y468 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL18031565 0.85 ALDH1A1 (0.44) ALDH1A1CYP3A4CA2MAPK1TSHR
SCHEMBL18033701 0.84 ALDH1A1 (0.47) ALDH1A1CYP3A4CA2MAPK1TSHR
SCHEMBL18156658 0.84 ALDH1A1 (0.47) ALDH1A1CYP3A4CA2MAPK1TSHR
SCHEMBL11339612 0.71 ALDH1A1 (0.60) ALDH1A1CYP3A4CA2MAPK1TSHR
SCHEMBL25698251 0.68 ALDH1A1 (0.44) ALDH1A1CYP3A4CA2MAPK1TSHR
SCHEMBL18031574 0.67 ALDH1A1 (0.44) ALDH1A1CYP3A4CA2MAPK1TSHR
SCHEMBL18033713 0.65 HCAR3 (0.53) ALDH1A1CYP3A4CA2MAPK1TSHR
SCHEMBL146937 0.65 CYP3A4 (0.68) ALDH1A1CYP3A4CA2MAPK1TSHR
SCHEMBL14625765 0.65 CYP3A4 (0.68) ALDH1A1CYP3A4CA2MAPK1TSHR
P-Xylene SCHEMBL8440149 0.65 ALDH1A1 (0.60) ALDH1A1CYP3A4CA2MAPK1TSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-4198630-A1 CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND RESIST PATTERN FORMING PROCESS Shin-Etsu Chemical Co., Ltd. (JP) 2023-06-21 — — EP disclosed
Send feedback