SCHEMBL25969088

SCHEMBL25969088

CC(=O)N(C(C)=O)c1cc(O)cc(O)c1

nearest known ligand 0.48

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CA5A P35218 1/20 0.48
LMNA P02545 1/20 0.43
MEN1 O00255 2/20 0.41
CYP3A4 P08684 2/20 0.41
KMT2A Q03164 2/20 0.41
HPGD P15428 1/20 0.41
BACE1 P56817 1/20 0.40
CA12 O43570 4/20 0.39
CA1 P00915 4/20 0.39
CA2 P00918 4/20 0.39
CA7 P43166 4/20 0.39
CA9 Q16790 4/20 0.39
CA14 Q9ULX7 4/20 0.39
CRHBP P24387 1/20 0.38
CRHR2 Q13324 1/20 0.38
GAA P10253 1/20 0.37
FASN P49327 1/20 0.34
HSP90AB1 P08238 1/20 0.34
POLB P06746 1/20 0.34
NPSR1 Q6W5P4 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL25969093 0.78 KDM4E (0.41) CA5ALMNAMEN1CYP3A4KMT2A
SCHEMBL15874167 0.78 CA5A (0.46) CA5ALMNAMEN1CYP3A4KMT2A
SCHEMBL8374423 0.78 ALDH1A1 (0.57) CA5ALMNACYP3A4CA12CA1
SCHEMBL10292556 0.75 ALDH1A1 (0.45) CA5ALMNAMEN1CYP3A4KMT2A
Phloroglucinol SCHEMBL9742017 0.74 CA5A (0.67) CA5ALMNAMEN1CYP3A4KMT2A
SCHEMBL803612 0.73 GAA (0.48) KMT2AHPGDCRHBPCRHR2GAA
Phloroglucinol SCHEMBL4159496 0.72 CA5A (0.63) CA5ALMNAMEN1CYP3A4KMT2A
Phloroglucinol SCHEMBL4901780 0.72 CA5A (0.63) CA5ALMNAMEN1CYP3A4KMT2A
Phloroglucinol SCHEMBL10695302 0.72 CA5A (0.63) CA5ALMNAMEN1CYP3A4KMT2A
SCHEMBL10398568 0.70 CRHBP (0.65) LMNAMEN1CYP3A4KMT2ACRHBP

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230260787-A1 COMPOSITION FOR FORMING PROTECTIVE FILM AGAINST ALKALINE AQUEOUS HYDROGEN PEROXIDE, SUBSTRATE FOR PRODUCING SEMICONDUCTOR APPARATUS, METHOD FOR FORMING PROTECTIVE FILM, AND METHOD FOR FORMING PATTERN SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-08-17 US disclosed