SCHEMBL25969093

SCHEMBL25969093

CC(=O)N(C(C)=O)c1cc(O)c(O)c(O)c1

nearest known ligand 0.41

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KDM4E B2RXH2 3/20 0.41
LMNA P02545 3/20 0.41
TDP1 Q9NUW8 3/20 0.41
SELL P14151 2/20 0.41
SELP P16109 2/20 0.41
FUT7 Q11130 2/20 0.41
ALDH1A1 P00352 2/20 0.41
MAPT P10636 2/20 0.41
HPGD P15428 2/20 0.41
HSD17B10 Q99714 2/20 0.41
CA12 O43570 1/20 0.41
CA1 P00915 1/20 0.41
CA2 P00918 1/20 0.41
TP53 P04637 1/20 0.41
CA3 P07451 1/20 0.41
FUT4 P22083 1/20 0.41
CA4 P22748 1/20 0.41
CA6 P23280 1/20 0.41
DPP4 P27487 1/20 0.41
MAPK1 P28482 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL25969088 0.78 CA5A (0.48) LMNAALDH1A1HPGDHSD17B10CA12
SCHEMBL11800568 0.77 KDM4E (0.52) KDM4ELMNATDP1ALDH1A1MAPT
SCHEMBL6890531 0.71 KDM4E (0.37) KDM4ELMNATDP1SELLSELP
SCHEMBL803612 0.71 GAA (0.48) KDM4EALDH1A1MAPTHPGDHSD17B10
SCHEMBL25969195 0.70 GAA (0.47) ALDH1A1MAPTCA12CA1CA2
SCHEMBL28028762 0.70 ESR1 (0.45) KDM4ETDP1ALDH1A1MAPTHPGD
SCHEMBL5702823 0.69 POLB (0.31) HSD17B10POLBNPSR1
SCHEMBL10292556 0.68 ALDH1A1 (0.45) KDM4ELMNAALDH1A1MAPTHPGD
SCHEMBL10398568 0.68 CRHBP (0.65) LMNAALDH1A1HSD17B10GAAPOLB
SCHEMBL96069 0.67 LMNA (0.59) KDM4ELMNATDP1SELLSELP

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230260787-A1 COMPOSITION FOR FORMING PROTECTIVE FILM AGAINST ALKALINE AQUEOUS HYDROGEN PEROXIDE, SUBSTRATE FOR PRODUCING SEMICONDUCTOR APPARATUS, METHOD FOR FORMING PROTECTIVE FILM, AND METHOD FOR FORMING PATTERN SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-08-17 US disclosed