SCHEMBL26035837

SCHEMBL26035837

CCCCOc1ccc(N(c2cc(C(F)(F)F)cc(C(F)(F)F)c2)c2cc(C(F)(F)F)cc(C(F)(F)F)c2)cc1

nearest known ligand 0.46

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ PSEN1 P49768 2/20 0.46
▸ PSEN2 P49810 2/20 0.46
▸ APH1B Q8WW43 2/20 0.46
▸ NCSTN Q92542 2/20 0.46
▸ APH1A Q96BI3 2/20 0.46
▸ PSENEN Q9NZ42 2/20 0.46
▸ FAAH O00519 2/20 0.43
▸ RHOC P08134 1/20 0.41
▸ RHOA P61586 1/20 0.41
▸ ATP4A P20648 2/20 0.41
▸ ATP4B P51164 2/20 0.41
▸ LTA4H P09960 3/20 0.41
▸ PTGES O14684 2/20 0.40
▸ NR5A1 Q13285 1/20 0.40
▸ PPARG P37231 2/20 0.40
▸ PPARA Q07869 2/20 0.40
▸ ALOX5 P09917 1/20 0.40
▸ PPARD Q03181 1/20 0.39
▸ CYP3A4 P08684 1/20 0.39
▸ CYP2D6 P10635 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14163830 0.81 LTA4H (0.57) LTA4HPTGESNR5A1CYP3A4CYP2D6
SCHEMBL8944015 0.81 LTA4H (0.57) LTA4HPTGESNR5A1CYP3A4CYP2D6
SCHEMBL12409185 0.79 CHRNB2 (0.54) ATP4AATP4BLTA4HNR5A1PPARA
SCHEMBL12937113 0.79 CES2 (0.39) —
SCHEMBL5016258 0.78 FAAH (0.48) PSEN1FAAHRHOCRHOAATP4A
SCHEMBL5016257 0.77 CHRNB2 (0.47) FAAHRHOCRHOALTA4HPTGES
SCHEMBL28423723 0.76 NR5A1 (0.56) ATP4AATP4BLTA4HNR5A1PPARA
SCHEMBL6002774 0.76 FAAH (0.46) FAAHRHOCRHOALTA4HPTGES
SCHEMBL6002773 0.76 RHOC (0.48) PSEN1PSEN2APH1BNCSTNAPH1A
SCHEMBL8944305 0.76 LTA4H (0.68) LTA4HPTGESNR5A1CYP3A4CYP2D6

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2023157456-A1 RADIATION-SENSITIVE COMPOSITION AND METHOD FOR FORMING RESIST PATTERN JSR株式会社 2023-08-24 — — WO disclosed
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