SCHEMBL26413626

SCHEMBL26413626

O=C(OC1(c2ccccc2)CCNCC1)c1ccc2c(c1)OCO2

nearest known ligand 0.49

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 2/20 0.47
MAPK1 P28482 1/20 0.47
KDM4E B2RXH2 3/20 0.46
PKM P14618 2/20 0.46
NPC1 O15118 4/20 0.46
RAB9A P51151 4/20 0.46
MAPT P10636 3/20 0.46
CTNNB1 P35222 1/20 0.46
WNT3A P56704 1/20 0.46
SMN1; SMN2 Q16637 2/20 0.45
L3MBTL1 Q9Y468 3/20 0.43
PTGS2 P35354 1/20 0.43
SRD5A2 P31213 1/20 0.43
GAA P10253 2/20 0.43
POLB P06746 1/20 0.43
HPGD P15428 1/20 0.43
TSHR P16473 1/20 0.43
CASP3 P42574 1/20 0.42
SENP8 Q96LD8 1/20 0.42
SENP7 Q9BQF6 1/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL24944610 0.86 MAPT (0.50) ALDH1A1KDM4EPKMNPC1RAB9A
SCHEMBL24943664 0.80 OPRM1 (0.46) ALDH1A1GAATSHR
SCHEMBL24944151 0.80 SLC6A4 (0.42) NPC1RAB9AMAPTSMN1; SMN2
SCHEMBL24944621 0.80 ESR1 (0.44) KDM4EPKMMAPTL3MBTL1PTGS2
SCHEMBL26413409 0.79 SLC6A2 (0.41) ALDH1A1MAPTGAATSHR
SCHEMBL24943768 0.79 SLC6A4 (0.39) NPC1RAB9AMAPT
SCHEMBL24944313 0.78 ESR1 (0.42) ALDH1A1MAPK1MAPTTSHR
SCHEMBL26413775 0.78 ALDH1A1 (0.46) ALDH1A1L3MBTL1SRD5A2TSHR
SCHEMBL24943754 0.78 SMN1; SMN2 (0.43) ALDH1A1MAPK1KDM4EMAPTSMN1; SMN2
SCHEMBL24943715 0.78 KMO (0.43) ALDH1A1MAPK1MAPTTSHRTP53

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11644753-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-09 US disclosed
US-11644753-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-09 US disclosed
US-20230131303-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 US disclosed
US-20230131303-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-11644753-B2 Resist composition and patterning process HNRNPU, NSUN2, HNRNPR ALDH1A1 4767/4885MAPK1 1150/4885KDM4E 1069/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.