Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CA1 | P00915 | 13/20 | 0.41 |
| ▸ | CA2 | P00918 | 13/20 | 0.41 |
| ▸ | MMP1 | P03956 | 3/20 | 0.36 |
| ▸ | MMP2 | P08253 | 3/20 | 0.36 |
| ▸ | MMP9 | P14780 | 3/20 | 0.36 |
| ▸ | MMP8 | P22894 | 3/20 | 0.36 |
| ▸ | MMP13 | P45452 | 3/20 | 0.36 |
| ▸ | HSD11B1 | P28845 | 1/20 | 0.36 |
| ▸ | NR1H2 | P55055 | 3/20 | 0.36 |
| ▸ | NR1I2 | O75469 | 1/20 | 0.36 |
| ▸ | NR1H3 | Q13133 | 2/20 | 0.34 |
| ▸ | RORC | P51449 | 1/20 | 0.34 |
| ▸ | MEN1 | O00255 | 1/20 | 0.33 |
| ▸ | S1PR4 | O95977 | 1/20 | 0.33 |
| ▸ | LMNA | P02545 | 1/20 | 0.33 |
| ▸ | TP53 | P04637 | 1/20 | 0.33 |
| ▸ | POLB | P06746 | 1/20 | 0.33 |
| ▸ | HPGD | P15428 | 1/20 | 0.33 |
| ▸ | S1PR1 | P21453 | 1/20 | 0.33 |
| ▸ | SDHB | P21912 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1594210 | 0.95 | CA1 (0.38) | CA1CA2HSD11B1NR1H2NR1I2 | |
| SCHEMBL270030 | 0.87 | CA1 (0.41) | CA1CA2MMP1MMP2MMP9 | |
| SCHEMBL5858665 | 0.86 | CA1 (0.43) | CA1CA2SDHBTLR9 | |
| SCHEMBL563064 | 0.84 | CA1 (0.45) | CA1CA2MMP1MMP2MMP9 | |
| SCHEMBL51400 | 0.83 | CA1 (0.43) | CA1CA2MMP1MMP2MMP9 | |
| SCHEMBL5857759 | 0.83 | HSD11B1 (0.43) | CA1CA2MMP1MMP2MMP9 | |
| SCHEMBL36458 | 0.83 | HTR6 (0.39) | CA1CA2HSD11B1NR1H2NR1I2 | |
| SCHEMBL4535203 | 0.82 | CA2 (0.44) | CA1CA2HSD11B1NR1H2NR1I2 | |
| SCHEMBL60138 | 0.82 | CA2 (0.44) | CA1CA2HSD11B1NR1H2NR1I2 | |
| SCHEMBL60438 | 0.82 | CA2 (0.44) | CA1CA2HSD11B1NR1H2NR1I2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9176381-B2 | Positive type photosensitive resin composition | CHEIL INDUSTRIES INC. (KR) | 2015-11-03 | — | — | US | disclosed |
| US-8133653-B2 | Positive resist composition for forming thick-film resist, thick-film resist laminate, and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2012-03-13 | — | — | US | disclosed |
| US-20110159428-A1 | Positive Type Photosensitive Resin Composition | CHEIL INDUSTRIES INC. (KR) | 2011-06-30 | — | — | US | disclosed |
| US-20110091818-A1 | PROCESS FOR PRODUCING PHOTORESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2011-04-21 | — | — | US | disclosed |
| US-20100279226-A1 | RESIST PROCESSING METHOD | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2010-11-04 | — | — | US | disclosed |
| US-20100273113-A1 | PROCESS FOR PRODUCING PHOTORESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2010-10-28 | — | — | US | disclosed |
| US-20100273112-A1 | PROCESS FOR PRODUCING PHOTORESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2010-10-28 | — | — | US | disclosed |