SCHEMBL27218966

SCHEMBL27218966

C=C(Cl)C(=O)OC(c1ccc(OC)cc1)(C(F)(F)F)C(F)(F)F

nearest known ligand 0.40

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
HSD11B1 P28845 1/20 0.40
PDK1 Q15118 1/20 0.38
PDK2 Q15119 1/20 0.38
PDK3 Q15120 1/20 0.38
PDK4 Q16654 1/20 0.38
MAPT P10636 3/20 0.38
CYP1A1 P04798 1/20 0.38
CYP1B1 Q16678 1/20 0.38
MAOB P27338 1/20 0.38
ALDH1A1 P00352 2/20 0.37
LMNA P02545 1/20 0.37
ALOX15 P16050 1/20 0.37
APEX1 P27695 1/20 0.37
MAPK1 P28482 1/20 0.37
RECQL P46063 1/20 0.37
HSD17B10 Q99714 1/20 0.37
TDP1 Q9NUW8 1/20 0.37
GAA P10253 1/20 0.36
CES2 O00748 1/20 0.36
CES1 P23141 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL21834941 0.81 MAPT (0.40) MAPTALDH1A1LMNACES1CA1
SCHEMBL10396191 0.76 NPSR1 (0.37) MAPTALDH1A1LMNAHSD17B10CES2
SCHEMBL10396190 0.76 LMNA (0.38) MAPTALDH1A1LMNACES2CES1
SCHEMBL7084775 0.71 RORC (0.38) HSD11B1MAPTLMNAMAPK1MEN1
SCHEMBL24908565 0.71 ESR1 (0.40) MAPTCYP1A1CYP1B1ALDH1A1LMNA
SCHEMBL9418936 0.70 RORC (0.39) HSD11B1MAPTCYP1A1CYP1B1LMNA
SCHEMBL15840364 0.70 SMN1; SMN2 (0.47) LMNA
SCHEMBL9418917 0.69 CA1 (0.36) MAPTLMNACES2CES1CA1
SCHEMBL11377615 0.68 KIF11 (0.53) MAOBALDH1A1CES2CES1CA1
SCHEMBL24168350 0.68 LMNA (0.36) MAPTALDH1A1LMNAALOX15MEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20240160102-A1 POSITIVE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN ZEON CORPORATION (JP) 2024-05-16 US disclosed
WO-2022190714-A1 POSITIVE RESIST COMPOSITION AND RESIST PATTERN FORMATION METHOD 日本ゼオン株式会社 2022-09-15 WO disclosed