Predicted protein targets (top 5)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | GPR3 | P46089 | 1/20 | 0.32 |
| ▸ | NPY1R | P25929 | 1/20 | 0.31 |
| ▸ | NPY5R | Q15761 | 1/20 | 0.31 |
| ▸ | SLC6A9 | P48067 | 2/20 | 0.31 |
| ▸ | CNR1 | P21554 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL6393281 | 0.89 | — | — | |
| Trifluoromethanesulfonic Acid SCHEMBL6845188 | 0.82 | ACHE (0.32) | GPR3CNR1 | |
| Trifluoromethanesulfonic Acid SCHEMBL6014088 | 0.80 | GPR3 (0.37) | GPR3 | |
| Trifluoromethanesulfonic Acid SCHEMBL3366125 | 0.80 | HPGD (0.32) | SLC6A9 | |
| Trifluoromethanesulfonic Acid SCHEMBL6838193 | 0.80 | HCRTR1 (0.33) | SLC6A9 | |
| Trifluoromethanesulfonic Acid SCHEMBL6562875 | 0.79 | GPR3 (0.36) | GPR3 | |
| SCHEMBL6400059 | 0.79 | KDM4E (0.36) | CNR1 | |
| Trifluoromethanesulfonic Acid SCHEMBL3363923 | 0.78 | NPC1 (0.31) | — | |
| Trifluoromethanesulfonic Acid SCHEMBL3364433 | 0.78 | ACHE (0.32) | — | |
| Trifluoromethanesulfonic Acid SCHEMBL2745482 | 0.78 | MEN1 (0.32) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 15 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20130244185-A9 | RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PATTERN, ORGANIC ACID AND ACID GENERATING AGENT | JSR CORPORATION (JP) | 2013-09-19 | — | — | US | disclosed |
| US-20130065186-A1 | RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PATTERN, ORGANIC ACID AND ACID GENERATING AGENT | JSR CORPORATION (JP) | 2013-03-14 | — | — | US | disclosed |
| US-8178159-B2 | Organosilicate resin formulation for use in microelectronic devices | DOW GLOBAL TECHNOLOGIES LLC | 2012-05-15 | — | — | US | disclosed |
| EP-1614151-B1 | METHOD FOR FORMING AN ANTIREFLECTIVE LAYER | DOW GLOBAL TECHNOLOGIES INC (US) | 2010-11-03 | — | — | EP | disclosed |
| EP-1164434-B1 | Radiation-sensitive resin composition | JSR CORP (JP) | 2010-10-06 | — | — | EP | disclosed |
| US-20070185298-A1 | Organosilicate resin formulation for use in microelectronic devices | DOW GLOBAL TECHNOLOGIES LLC | 2007-08-09 | — | — | US | disclosed |
| EP-1614151-A2 | ORGANOSILICATE RESIN FORMULATION FOR USE IN MICROELECTRONIC DEVICES | DOW GLOBAL TECHNOLOGIES INC. (US) | 2006-01-11 | — | — | EP | disclosed |
| US-6964840-B2 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2005-11-15 | — | — | US | disclosed |
| WO-2004090965-A2 | ORGANOSILICATE RESIN FORMULATION FOR USE IN MICROELECTRONIC DEVICES | DOW GLOBAL TECHNOLOGIES INC. (US) | 2004-10-21 | — | — | WO | disclosed |
| US-6800414-B2 | FLUOROPOLYMER | JSR CORPORATION (JP) | 2004-10-05 | — | — | US | disclosed |
| US-6403280-B1 | TERPOLYMER COMPRISING MALEIC ANHYDRIDE, NORBORNENE ESTER DERIVATIVE, AND ALICYCLIC (METH)ACRYLATE MONOMERS; DURABILITY TO DRY ETCHING; TRANSPARENCY, STORAGE STABILITY | JSR CORPORATION (JP) | 2002-06-11 | — | — | US | disclosed |
| US-20020009668-A1 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2002-01-24 | — | — | US | disclosed |
| EP-1164434-A2 | Radiation-sensitive resin composition | JSR Corporation (JP) | 2001-12-19 | — | — | EP | disclosed |
| EP-1048983-A1 | Radiation sensitive resin composition | JSR Corporation (JP) | 2000-11-02 | — | — | EP | disclosed |
| EP-0930541-A1 | Radiation sensitive resin composition | JSR Corporation (JP) | 1999-07-21 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20130244185-A9 | RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PATTERN, ORGANIC ACID AND ACID GENERATING AGENT | GLRA3, RER1, RXRG | GPR3 113/4885NPY1R 172/4885NPY5R 669/4885 |
| US-20130065186-A1 | RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PATTERN, ORGANIC ACID AND ACID GENERATING AGENT | GLRA3, RER1, FPR3 | GPR3 111/4885NPY1R 185/4885NPY5R 686/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.