Predicted protein targets (top 2)
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL7792964 | 0.80 | ALDH1A1 (0.37) | — | |
| Trifluoromethanesulfonic Acid SCHEMBL6562807 | 0.80 | GPR3 (0.34) | GPR3 | |
| Trifluoromethanesulfonic Acid SCHEMBL2745658 | 0.79 | GPR3 (0.32) | GPR3 | |
| Trifluoromethanesulfonic Acid SCHEMBL36383 | 0.77 | GPR3 (0.43) | GPR3PTPN1 | |
| Trifluoromethanesulfonic Acid SCHEMBL6564774 | 0.77 | HSD11B1 (0.34) | GPR3 | |
| Trifluoromethanesulfonic Acid SCHEMBL6564518 | 0.76 | RORC (0.33) | GPR3 | |
| Trifluoromethanesulfonic Acid SCHEMBL7792426 | 0.76 | CTSL (0.34) | GPR3 | |
| Trifluoromethanesulfonic Acid SCHEMBL6564008 | 0.76 | KCNH2 (0.33) | GPR3 | |
| Trifluoromethanesulfonic Acid SCHEMBL36325 | 0.75 | GPR3 (0.42) | GPR3PTPN1 | |
| Trifluoromethanesulfonic Acid SCHEMBL6562721 | 0.75 | STS (0.30) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-0849634-B1 | Radiation sensitive resin composition | JSR CORP (JP) | 2004-03-31 | — | — | EP | disclosed |
| US-6322949-B2 | SULFONIUM COMPOUND AS PHOTOACID GENERATOR | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 2001-11-27 | — | — | US | disclosed |
| US-20010014427-A1 | Radiation sensitive resin composition | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 2001-08-16 | — | — | US | disclosed |
| US-6187504-B1 | PHOTOSENSITIVE BLEND CONTAINING A NAPHTHALENE SULFONIUM SULFONATE DERIVATIVE PHOTOACID GENERATOR, RESIN HAVING ALKALI INSOLUBLE GROUPS CLEAVABLE BY ACID, AN ALKALI SOLUBLE RESIN AND A SOLUBILITY CONTROL AGENT; POSITIVES, RESOLUTION | JSR CORPORATION (JP) | 2001-02-13 | — | — | US | disclosed |
| EP-0849634-A1 | Radiation sensitive resin composition | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1998-06-24 | — | — | EP | disclosed |