SCHEMBL2746856

SCHEMBL2746856

C#Cc1ccccc1S(=O)(=O)c1ccccc1

nearest known ligand 0.52

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
HTR6 P50406 6/20 0.52
KMT2A Q03164 1/20 0.46
TSHR P16473 1/20 0.43
HTT P42858 1/20 0.43
ALDH1A1 P00352 2/20 0.43
LMNA P02545 1/20 0.43
HPGD P15428 1/20 0.43
POLB P06746 1/20 0.42
GAA P10253 1/20 0.42
GFER P55789 1/20 0.42
HSD11B1 P28845 3/20 0.41
NPSR1 Q6W5P4 1/20 0.40
CA12 O43570 1/20 0.38
CA2 P00918 1/20 0.38
CA9 Q16790 1/20 0.38
KDM4E B2RXH2 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7944156 0.85 HTR6 (0.46) HTR6KMT2ATSHRHTTALDH1A1
SCHEMBL7780736 0.82 HTR6 (0.53) HTR6KMT2ATSHRHTTALDH1A1
SCHEMBL1146161 0.80 HSD11B1 (0.59) HTR6KMT2ATSHRHTTALDH1A1
SCHEMBL2746462 0.79 CA12 (0.46) HTR6KMT2ATSHRHTTALDH1A1
SCHEMBL8080841 0.78 HTR6 (0.72) HTR6KMT2ATSHRHTTALDH1A1
SCHEMBL14159522 0.77 MET (0.48) HTR6KMT2ATSHRHTT
SCHEMBL2468180 0.75 CA2 (0.58) CA12CA2CA9
SCHEMBL30125526 0.75 MYC (0.40) TSHRHTTALDH1A1POLBGAA
SCHEMBL1920956 0.75 MYC (0.40) TSHRHTTALDH1A1POLBGAA
SCHEMBL29890659 0.75 PTGS2 (0.41) HTTALDH1A1POLBGAAHSD11B1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-111302986-B Preparation method of naphthol-based sulfone compound 佛山科学技术学院 2020-08-18 CN disclosed
CN-111302986-A Preparation method of naphthol-based sulfone compound 佛山科学技术学院 2020-06-19 CN disclosed
US-8337982-B2 Comprising first repeating unit obtained by reaction of bisaminophenol compound and dicarboxylic acid, at least one of which has diamondoid structure and second repeating unit obtained by reaction of bisaminophenol compound having no diamondoid structure and dicarboxylic acid; heat resistance SUMITOMO BAKELITE CO., LTD. (JP) 2012-12-25 US disclosed
US-8178631-B2 Resin composition, varnish, resin film and semiconductor device SUMITOMO BAKELITE COMPANY, LTD. (JP) 2012-05-15 US disclosed
US-20090214860-A1 Resin Composition, Varnish, Resin Film and Semiconductor Device SUMITOMO BAKELITE COMPANY, LTD. (JP) 2009-08-27 US disclosed
US-20080206548-A1 Benzoxazole Resin Precursor, Polybenzoxazole Resin, Resin Film And Semiconductor Device SUMITOMO BAKELITE CO., LTD (JP) 2008-08-28 US disclosed
EP-1953181-A1 RESIN COMPOSITION, VARNISH, RESIN FILM AND SEMICONDUCTOR DEVICE Sumitomo Bakelite Company, Ltd. (JP) 2008-08-06 EP disclosed
EP-1832619-A1 BENZOXAZOLE RESIN PRECURSOR, POLYBENZOXAZOLE RESIN, RESIN FILM, AND SEMICONDUCTOR DEVICE Sumitomo Bakelite Company, Limited (JP) 2007-09-12 EP disclosed