Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.48 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.48 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.48 |
| ▸ | CA1 | P00915 | 4/20 | 0.45 |
| ▸ | CA2 | P00918 | 4/20 | 0.45 |
| ▸ | CA12 | O43570 | 3/20 | 0.45 |
| ▸ | CA3 | P07451 | 3/20 | 0.45 |
| ▸ | CA4 | P22748 | 3/20 | 0.45 |
| ▸ | CA6 | P23280 | 3/20 | 0.45 |
| ▸ | CA5A | P35218 | 3/20 | 0.45 |
| ▸ | CA7 | P43166 | 3/20 | 0.45 |
| ▸ | CA9 | Q16790 | 3/20 | 0.45 |
| ▸ | CA13 | Q8N1Q1 | 3/20 | 0.45 |
| ▸ | CA14 | Q9ULX7 | 3/20 | 0.45 |
| ▸ | CA5B | Q9Y2D0 | 3/20 | 0.45 |
| ▸ | NFE2L2 | Q16236 | 7/20 | 0.45 |
| ▸ | MEN1 | O00255 | 1/20 | 0.41 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.41 |
| ▸ | MMP1 | P03956 | 1/20 | 0.41 |
| ▸ | MMP2 | P08253 | 1/20 | 0.41 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL27524541 | 0.79 | CA2 (0.45) | ALDH1A1MAPK1CA1CA2CA12 | |
| SCHEMBL27605774 | 0.79 | LMNA (0.46) | ALDH1A1CYP3A4MAPK1CA1CA2 | |
| SCHEMBL1516202 | 0.79 | TLR9 (0.59) | ALDH1A1CYP3A4MAPK1CA1CA2 | |
| SCHEMBL27518701 | 0.79 | NFE2L2 (0.45) | ALDH1A1MAPK1CA1CA2NFE2L2 | |
| SCHEMBL27742835 | 0.79 | ALDH1A1 (0.42) | ALDH1A1MAPK1CA1CA2CA12 | |
| SCHEMBL3443831 | 0.78 | TLR9 (0.52) | ALDH1A1MAPK1CA1CA2CA12 | |
| SCHEMBL4300190 | 0.76 | ALDH1A1 (0.59) | ALDH1A1CYP3A4MAPK1CA1CA2 | |
| SCHEMBL2872244 | 0.75 | PKM (0.53) | ALDH1A1MAPK1CA1CA2CA9 | |
| SCHEMBL2872547 | 0.75 | CA2 (0.50) | ALDH1A1CA1CA2CA12CA3 | |
| SCHEMBL7783593 | 0.75 | ALDH1A1 (0.51) | ALDH1A1CYP3A4MAPK1CA1CA2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 85 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-108084331-A | A kind of biology base film-forming resin and its photoresist of preparation | 江南大学 | 2018-05-29 | — | — | CN | claimed |
| CN-107325218-A | A kind of fluorostyrenic monomers, fluorinated copolymer and the application in 248nm deep ultraviolet light-sensitive lacquers | 苏州瑞红电子化学品有限公司 | 2017-11-07 | — | — | CN | claimed |
| CN-107077070-A | The manufacture method of photosensitive polymer combination, cured film, the element for possessing cured film and semiconductor devices | 东丽株式会社 | 2017-08-18 | — | — | CN | disclosed |
| CN-105467763-A | Compound used for photoresist composition | ZHEJIANG YONGTAI NEW MAT CO LTD | 2016-04-06 | — | — | CN | disclosed |
| CN-105283432-A | Composition comprising a compound containing a vinyl group | TOKYO OHKA KOGYO CO LTD | 2016-01-27 | — | — | CN | disclosed |
| CN-104529795-B | Compound for photoresist composition | ZHEJIANG YONGTAI NEW MATERIAL Co.,Ltd. (CN) | 2016-01-20 | — | — | CN | disclosed |
| CN-104909581-A | Pretreatment method of glass substrate used for forming etching mask | TOKYO OHKA KOGYO COMPANY | 2015-09-16 | — | — | CN | disclosed |
| CN-104649580-A | Chemical tempered glass substrate processing method | TOKYO OHKA KOGYO COMPANY | 2015-05-27 | — | — | CN | disclosed |
| CN-104529795-A | Compound for photoresist composition | Zhejiang yongtai new material co ltd | 2015-04-22 | — | — | CN | disclosed |
| CN-104536265-A | Photoresist composition | ZHEJIANG YONGTAI TECHNOLOGY CO LTD | 2015-04-22 | — | — | CN | disclosed |
| CN-104350084-A | Polymer having terminal structure including plurality of reactive silicon groups, method for manufacturing same, and use for same | KANEKA CORP | 2015-02-11 | — | — | CN | disclosed |
| CN-1316675-A | Chemical amplifying type positive photoetching rubber composition | SUMITOMO CHEMICAL CO (JP) | 2001-10-10 | — | — | CN | disclosed |
| CN-1312489-A | Chemical-amplifying type positive photoetching gel composition | SUMITOMO CHEMICAL CO (JP) | 2001-09-12 | — | — | CN | disclosed |
| CN-1312488-A | Chemical-amplifying type positive photoetching gel composition | SUMITOMO CHEMICAL CO (JP) | 2001-09-12 | — | — | CN | disclosed |
| CN-1311459-A | Chemical amplifying type positive photolithographic gelatin composition | SUMITOMO CHEMICAL CO (JP) | 2001-09-05 | — | — | CN | disclosed |
| CN-1299079-A | Chemical enlargement type positive photoetching gum compositions | SUMITOMO CHEMICAL CO (JP) | 2001-06-13 | — | — | CN | disclosed |
| CN-1276540-A | Positive photoresist composition | SUMITOMO CHEMICAL CO (JP) | 2000-12-13 | — | — | CN | disclosed |
| CN-1263612-A | Chemically amplified resist composition | CLARIANT INT LTD (CH) | 2000-08-16 | — | — | CN | disclosed |
| CN-1263611-A | Method for forming pattern | CLARIANT INT LTD (CH) | 2000-08-16 | — | — | CN | disclosed |
| CN-1245910-A | Chemical intensified positive photoresist composite | SUMITOMO CHEMICAL CO (JP) | 2000-03-01 | — | — | CN | disclosed |