Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | PKM | P14618 | 4/20 | 0.53 |
| ▸ | NFE2L2 | Q16236 | 7/20 | 0.47 |
| ▸ | CA1 | P00915 | 2/20 | 0.46 |
| ▸ | CA2 | P00918 | 2/20 | 0.46 |
| ▸ | MMP1 | P03956 | 1/20 | 0.46 |
| ▸ | MMP2 | P08253 | 1/20 | 0.46 |
| ▸ | MMP9 | P14780 | 1/20 | 0.46 |
| ▸ | MMP8 | P22894 | 1/20 | 0.46 |
| ▸ | MMP13 | P45452 | 1/20 | 0.46 |
| ▸ | GAA | P10253 | 1/20 | 0.46 |
| ▸ | NPC1 | O15118 | 2/20 | 0.44 |
| ▸ | RAB9A | P51151 | 2/20 | 0.44 |
| ▸ | PKLR | P30613 | 1/20 | 0.44 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.44 |
| ▸ | LMNA | P02545 | 1/20 | 0.44 |
| ▸ | TP53 | P04637 | 1/20 | 0.44 |
| ▸ | MAPT | P10636 | 1/20 | 0.44 |
| ▸ | TSHR | P16473 | 1/20 | 0.44 |
| ▸ | XBP1 | P17861 | 1/20 | 0.44 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.44 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL28047968 | 0.80 | NFE2L2 (0.55) | NFE2L2CA1CA2CA9 | |
| SCHEMBL4188150 | 0.79 | NPC1 (0.70) | PKMNFE2L2CA1CA2MMP1 | |
| SCHEMBL1516202 | 0.79 | TLR9 (0.59) | CA1CA2MMP1MMP2MMP9 | |
| SCHEMBL27616948 | 0.77 | MEN1 (0.46) | CA1CA2ALDH1A1LMNAMAPT | |
| SCHEMBL7379397 | 0.76 | PKM (0.61) | PKMNFE2L2CA1CA2MMP1 | |
| SCHEMBL27495449 | 0.75 | ALDH1A1 (0.48) | PKMNFE2L2CA1CA2MMP1 | |
| SCHEMBL27524541 | 0.75 | CA2 (0.45) | CA1CA2MMP1MMP2MMP9 | |
| SCHEMBL27605774 | 0.75 | LMNA (0.46) | PKMCA1CA2GAANPC1 | |
| SCHEMBL27518701 | 0.75 | NFE2L2 (0.45) | PKMNFE2L2CA1CA2MMP1 | |
| SCHEMBL7783593 | 0.74 | ALDH1A1 (0.51) | CA1CA2GAANPC1RAB9A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 29 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-107001550-A | Novolak phenolics, its manufacture method, photosensitive composite, erosion resistant and film | DIC株式会社 | 2017-08-01 | — | — | CN | disclosed |
| CN-107003612-A | Resist lower membrane formation photosensitive composite and resist lower membrane | DIC株式会社 | 2017-08-01 | — | — | CN | disclosed |
| CN-105555820-A | Modified hydroxy naphthalene novolak resin, production method for modified hydroxy naphthalene novolak resin, photosensitive composition, resist material and coating | DAINIPPON INK & CHEMICALS | 2016-05-04 | — | — | CN | disclosed |
| CN-105283432-A | Composition comprising a compound containing a vinyl group | TOKYO OHKA KOGYO CO LTD | 2016-01-27 | — | — | CN | disclosed |
| CN-105190439-A | Modified phenolic novolac resin, resist material, coating film, and permanent resist film | DAINIPPON INK & | 2015-12-23 | — | — | CN | disclosed |
| CN-104909581-A | Pretreatment method of glass substrate used for forming etching mask | TOKYO OHKA KOGYO COMPANY | 2015-09-16 | — | — | CN | disclosed |
| CN-104649580-A | Chemical tempered glass substrate processing method | TOKYO OHKA KOGYO COMPANY | 2015-05-27 | — | — | CN | disclosed |
| CN-103797418-A | Negative-type photosensitive resin composition, pattern forming method, cured film, insulating film, color filter, and display device | TOKYO OHKA KOGYO CO LTD | 2014-05-14 | — | — | CN | disclosed |
| CN-103543606-A | Photoresist composition and method for processing glass | TOKYO OHKA KOGYO CO LTD | 2014-01-29 | — | — | CN | disclosed |
| CN-103000723-A | Solar cell | MOTECH IND INC | 2013-03-27 | — | — | CN | disclosed |
| CN-101135850-A | Imaging material with purple laser photosensitive resist material layer and resist imaging method thereof | MITSUBISHI CHEM CORP (JP) | 2008-03-05 | — | — | CN | disclosed |
| CN-100346230-C | Material for preservative formation | TOKYO O KAGAKU KOGYO CO LTD (JP) | 2007-10-31 | — | — | CN | disclosed |
| CN-1273865-C | Method for forming pattern | CLARIANT INT LTD (JP) | 2006-09-06 | — | — | CN | disclosed |
| CN-1811600-A | Pattern forming method | AZ ELECTRONIC MATERIAL CO LTD (JP) | 2006-08-02 | — | — | CN | disclosed |
| CN-1241064-C | Chemically amplified resist composition | AZ ELECTRONIC MATERIALS JAPAN (JP) | 2006-02-08 | — | — | CN | disclosed |
| CN-1705913-A | Negative cyan violet laser photosensitive composition, image forming material, image forming element and image forming method | MITSUBISHI CHEM CORP (JP) | 2005-12-07 | — | — | CN | disclosed |
| CN-1675588-A | Imaging material with purple laser photosensitive resist material layer and resist imaging method thereof | MITSUBISHI CHEM CORP (JP) | 2005-09-28 | — | — | CN | disclosed |
| CN-1388414-A | Material for preservative formation | TOKYO O KAGAKU KOGYO CO LTD (JP) | 2003-01-01 | — | — | CN | disclosed |
| CN-1263612-A | Chemically amplified resist composition | CLARIANT INT LTD (CH) | 2000-08-16 | — | — | CN | disclosed |
| CN-1263611-A | Method for forming pattern | CLARIANT INT LTD (CH) | 2000-08-16 | — | — | CN | disclosed |