Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 9/20 | 0.51 |
| ▸ | MEN1 | O00255 | 4/20 | 0.51 |
| ▸ | KMT2A | Q03164 | 4/20 | 0.51 |
| ▸ | MAPT | P10636 | 3/20 | 0.51 |
| ▸ | HPGD | P15428 | 3/20 | 0.51 |
| ▸ | LMNA | P02545 | 3/20 | 0.51 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.51 |
| ▸ | HIF1A | Q16665 | 2/20 | 0.51 |
| ▸ | CYP1A2 | P05177 | 2/20 | 0.51 |
| ▸ | CYP3A4 | P08684 | 2/20 | 0.51 |
| ▸ | CYP2C19 | P33261 | 2/20 | 0.51 |
| ▸ | NPSR1 | Q6W5P4 | 2/20 | 0.51 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.51 |
| ▸ | TSHR | P16473 | 2/20 | 0.51 |
| ▸ | NPC1 | O15118 | 1/20 | 0.51 |
| ▸ | GMNN | O75496 | 1/20 | 0.51 |
| ▸ | DRD1 | P21728 | 1/20 | 0.51 |
| ▸ | DRD3 | P35462 | 1/20 | 0.51 |
| ▸ | CCR2 | P41597 | 1/20 | 0.51 |
| ▸ | RAB9A | P51151 | 1/20 | 0.51 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL7030067 | 0.79 | ALDH1A1 (0.56) | ALDH1A1MEN1KMT2AMAPTHPGD | |
| SCHEMBL1516202 | 0.79 | TLR9 (0.59) | ALDH1A1MEN1KMT2AMAPTHPGD | |
| SCHEMBL28845730 | 0.77 | LMNA (0.41) | ALDH1A1MEN1KMT2AMAPTHPGD | |
| SCHEMBL11451716 | 0.76 | ALDH1A1 (0.58) | ALDH1A1MEN1KMT2AMAPTHPGD | |
| SCHEMBL27518701 | 0.75 | NFE2L2 (0.45) | ALDH1A1MEN1KMT2AMAPTLMNA | |
| SCHEMBL27605774 | 0.75 | LMNA (0.46) | ALDH1A1MEN1KMT2AMAPTHPGD | |
| SCHEMBL27495449 | 0.75 | ALDH1A1 (0.48) | ALDH1A1MEN1KMT2AHPGDCYP3A4 | |
| SCHEMBL27524541 | 0.75 | CA2 (0.45) | ALDH1A1MAPTLMNASMN1; SMN2TSHR | |
| SCHEMBL2872244 | 0.74 | PKM (0.53) | ALDH1A1MAPTLMNASMN1; SMN2TSHR | |
| SCHEMBL27742835 | 0.74 | ALDH1A1 (0.42) | ALDH1A1MEN1KMT2AMAPTLMNA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 87 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-108084331-A | A kind of biology base film-forming resin and its photoresist of preparation | 江南大学 | 2018-05-29 | — | — | CN | claimed |
| CN-107325218-A | A kind of fluorostyrenic monomers, fluorinated copolymer and the application in 248nm deep ultraviolet light-sensitive lacquers | 苏州瑞红电子化学品有限公司 | 2017-11-07 | — | — | CN | claimed |
| CN-105566552-A | Acrylate copolymer and 248nm photoresist composition made thereof | UNIV JIANGNAN | 2016-05-11 | — | — | CN | claimed |
| CN-108084331-A | A kind of biology base film-forming resin and its photoresist of preparation | 江南大学 | 2018-05-29 | — | — | CN | disclosed |
| CN-105566552-A | Acrylate copolymer and 248nm photoresist composition made thereof | UNIV JIANGNAN | 2016-05-11 | — | — | CN | disclosed |
| CN-105467763-A | Compound used for photoresist composition | ZHEJIANG YONGTAI NEW MAT CO LTD | 2016-04-06 | — | — | CN | disclosed |
| CN-105283432-A | Composition comprising a compound containing a vinyl group | TOKYO OHKA KOGYO CO LTD | 2016-01-27 | — | — | CN | disclosed |
| CN-104529795-B | Compound for photoresist composition | ZHEJIANG YONGTAI NEW MATERIAL Co.,Ltd. (CN) | 2016-01-20 | — | — | CN | disclosed |
| CN-104909581-A | Pretreatment method of glass substrate used for forming etching mask | TOKYO OHKA KOGYO COMPANY | 2015-09-16 | — | — | CN | disclosed |
| CN-104649580-A | Chemical tempered glass substrate processing method | TOKYO OHKA KOGYO COMPANY | 2015-05-27 | — | — | CN | disclosed |
| CN-104529795-A | Compound for photoresist composition | Zhejiang yongtai new material co ltd | 2015-04-22 | — | — | CN | disclosed |
| CN-1312488-A | Chemical-amplifying type positive photoetching gel composition | SUMITOMO CHEMICAL CO (JP) | 2001-09-12 | — | — | CN | disclosed |
| CN-1312489-A | Chemical-amplifying type positive photoetching gel composition | SUMITOMO CHEMICAL CO (JP) | 2001-09-12 | — | — | CN | disclosed |
| CN-1311459-A | Chemical amplifying type positive photolithographic gelatin composition | SUMITOMO CHEMICAL CO (JP) | 2001-09-05 | — | — | CN | disclosed |
| CN-1306224-A | Iodonium salt used as potential acid provider | CIBA SPECIATY CHEMICALS HOLDIN (CH) | 2001-08-01 | — | — | CN | disclosed |
| CN-1299079-A | Chemical enlargement type positive photoetching gum compositions | SUMITOMO CHEMICAL CO (JP) | 2001-06-13 | — | — | CN | disclosed |
| CN-1276540-A | Positive photoresist composition | SUMITOMO CHEMICAL CO (JP) | 2000-12-13 | — | — | CN | disclosed |
| CN-1263611-A | Method for forming pattern | CLARIANT INT LTD (CH) | 2000-08-16 | — | — | CN | disclosed |
| CN-1263612-A | Chemically amplified resist composition | CLARIANT INT LTD (CH) | 2000-08-16 | — | — | CN | disclosed |
| CN-1245910-A | Chemical intensified positive photoresist composite | SUMITOMO CHEMICAL CO (JP) | 2000-03-01 | — | — | CN | disclosed |