SCHEMBL2833718

SCHEMBL2833718

CCCCc1ccc(-c2nc(C(Cl)(Cl)Cl)nc(C(Cl)(Cl)Cl)n2)cc1

nearest known ligand 0.47

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
RAB9A P51151 3/20 0.47
SMN1; SMN2 Q16637 3/20 0.47
ALDH1A1 P00352 3/20 0.47
MAPT P10636 3/20 0.47
NPC1 O15118 2/20 0.47
S1PR1 P21453 2/20 0.47
NFKB1 P19838 1/20 0.47
NFKB2 Q00653 1/20 0.47
RELA Q04206 1/20 0.47
NPSR1 Q6W5P4 1/20 0.47
RARB P10826 6/20 0.45
MEN1 O00255 2/20 0.44
KMT2A Q03164 2/20 0.44
KDM4E B2RXH2 1/20 0.44
USP2 O75604 1/20 0.44
GAA P10253 1/20 0.44
HPGD P15428 1/20 0.44
HSD17B10 Q99714 1/20 0.44
CTRC Q99895 1/20 0.44
TP53 P04637 1/20 0.43

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14040238 0.90 S1PR1 (0.39) RAB9ASMN1; SMN2ALDH1A1MAPTNPC1
SCHEMBL2832962 0.83 TP53 (0.43) RAB9ASMN1; SMN2ALDH1A1MAPTNPC1
SCHEMBL13539887 0.82 RAB9A (0.57) RAB9ASMN1; SMN2ALDH1A1MAPTNPC1
SCHEMBL3343534 0.81 TP53 (0.42) RAB9ASMN1; SMN2ALDH1A1MAPTNPC1
SCHEMBL3311317 0.80 L3MBTL1 (0.42) RAB9AALDH1A1MAPTNPC1NPSR1
SCHEMBL14409988 0.79 TRPV1 (0.54) RAB9AALDH1A1MAPTNPC1RARB
SCHEMBL990934 0.79 RAB9A (0.56) RAB9ASMN1; SMN2ALDH1A1MAPTNPC1
SCHEMBL8412982 0.78 NPC1 (0.38) RAB9AALDH1A1MAPTNPC1MEN1
SCHEMBL9945516 0.78 RAB9A (0.50) RAB9ASMN1; SMN2ALDH1A1MAPTNPC1
SCHEMBL1817406 0.77 S1PR1 (0.36) RAB9ASMN1; SMN2ALDH1A1MAPTNPC1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8216770-B2 aromatic polyester copolymer is alkali-developable photosensitive or thermal curable; used to form pattern on filter which exhibit physical properties resist to heat and chemicals, improve developability, and adhesiveness, high resolution; use for Liquid crystal display devices CHEIL INDUSTRIES INC. (KR) 2012-07-10 US disclosed
US-20100163811-A1 Organic Layer Photosensitive Resin Composition and Organic Layer Fabricated Using Same CHEIL INDUSTRIES INC. (KR) 2010-07-01 US disclosed
WO-2008047992-A1 RESIN COMPOSITION COMPRISING CARDO RESIN, METHOD FOR FORMING PATTERN USING THE RESIN COMPOSITION AND COLOR FILTER USING PATTERN FORMED BY THE METHOD CHEIL INDUSTRIES INC. (KR) 2008-04-24 WO disclosed
US-20080090177-A1 Resin Composition Comprising Cardo Resin, Method for Forming Pattern Using the Resin Composition and Color Filter Using Pattern Formed by the Method CHEIL INDUSTRIES INC. (KR) 2008-04-17 US disclosed