Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | L3MBTL1 | Q9Y468 | 3/20 | 0.42 |
| ▸ | NPC1 | O15118 | 2/20 | 0.42 |
| ▸ | RAB9A | P51151 | 2/20 | 0.42 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.42 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.42 |
| ▸ | KCNH2 | Q12809 | 1/20 | 0.40 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.39 |
| ▸ | MAPT | P10636 | 1/20 | 0.38 |
| ▸ | MAOA | P21397 | 2/20 | 0.38 |
| ▸ | MAOB | P27338 | 2/20 | 0.38 |
| ▸ | PDE5A | O76074 | 1/20 | 0.38 |
| ▸ | LMNA | P02545 | 2/20 | 0.38 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.38 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.38 |
| ▸ | PDE7A | Q13946 | 1/20 | 0.36 |
| ▸ | PDE7B | Q9NP56 | 1/20 | 0.36 |
| ▸ | ATM | Q13315 | 1/20 | 0.36 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.36 |
| ▸ | NR1H3 | Q13133 | 2/20 | 0.36 |
| ▸ | GAA | P10253 | 1/20 | 0.36 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL125466 | 0.83 | MEN1 (0.44) | L3MBTL1NPC1RAB9ACYP1A2CYP2C19 | |
| SCHEMBL4900598 | 0.83 | MEN1 (0.47) | L3MBTL1NPC1RAB9ACYP1A2CYP2C19 | |
| SCHEMBL80527 | 0.83 | MEN1 (0.47) | L3MBTL1NPC1RAB9ACYP1A2CYP2C19 | |
| SCHEMBL14040238 | 0.83 | S1PR1 (0.39) | L3MBTL1NPC1RAB9AALDH1A1MAPT | |
| SCHEMBL8412982 | 0.81 | NPC1 (0.38) | L3MBTL1NPC1RAB9AALDH1A1MAPT | |
| SCHEMBL2833718 | 0.80 | RAB9A (0.47) | NPC1RAB9AALDH1A1MAPTKDM4E | |
| SCHEMBL9871106 | 0.79 | ESR1 (0.57) | L3MBTL1NPC1RAB9AALDH1A1MAPT | |
| SCHEMBL2760438 | 0.79 | IDO1 (0.39) | PDE7APDE7B | |
| SCHEMBL765590 | 0.79 | ADORA3 (0.38) | PDE7APDE7B | |
| SCHEMBL2832962 | 0.79 | TP53 (0.43) | NPC1RAB9ACYP1A2ALDH1A1MAPT |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 16 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-10656520-B2 | Photosensitive resin composition and cured film prepared therefrom | ROHM AND HAAS ELECTRONIC MATERIALS KOREA LTD (KR) | 2020-05-19 | — | — | US | disclosed |
| US-20180373144-A1 | PHOTOSENSITIVE RESIN COMPOSITION AND CURED FILM PREPARED THEREFROM | ROHM AND HAAS ELECTRONIC MATERIALS KOREA LTD. (KR) | 2018-12-27 | — | — | US | disclosed |
| EP-1564591-B1 | Polymerizable composition | FUJIFILM CORP (JP) | 2016-08-03 | — | — | EP | disclosed |
| US-20100112474-A1 | PHOTOSENSITIVE COMPOSITION, PHOTOSENSITIVE FILM, METHOD FOR FORMING A PERMANENT PATTERN, AND PRINTED BOARD | FUJIFILM CORPORATION (JP) | 2010-05-06 | — | — | US | disclosed |
| US-20080268374-A1 | Photosensitive Composition, Pattern Forming Material, Photosensitive Laminate, Pattern Forming Apparatus, and Pattern Forming Process | FUJIFILM CORPORATION (JP) | 2008-10-30 | — | — | US | disclosed |
| US-20080118867-A1 | Pattern Forming Material, Pattern Forming Apparatus, And Pattern Forming Process | ASAHI KASEI E-MATERIALS CORPORATION (JP) | 2008-05-22 | — | — | US | disclosed |
| US-7374863-B2 | Polyurethane binder, photoinitiator, and acrylic acid; for use as image recording layer of negative lithographic printing plate precursor; drawing with laser light | FUJIFILM CORPORATION (JP) | 2008-05-20 | — | — | US | disclosed |
| US-7374863-B2 | Polyurethane binder, photoinitiator, and acrylic acid; for use as image recording layer of negative lithographic printing plate precursor; drawing with laser light | FUJIFILM CORPORATION (JP) | 2008-05-20 | — | — | US | disclosed |
| US-20080113302-A1 | Pattern Forming Process | FUJIFILM CORPORATION (JP) | 2008-05-15 | — | — | US | disclosed |
| EP-1780599-A1 | PHOTOSENSITIVE COMPOSITION, PATTERN FORMING MATERIAL, PHOTOSENSITIVE LAMINATE, PATTERN FORMING APPARATUS AND METHOD OF PATTERN FORMATION | FUJIFILM Corporation (JP) | 2007-05-02 | — | — | EP | disclosed |
| WO-2006004171-A1 | PHOTOSENSITIVE FILM, PROCESS FOR PRODUCING THE SAME, PROCESS FOR FORMING PERMANENT PATTERN | FUJI PHOTO FILM CO., LTD. (JP) | 2006-01-12 | — | — | WO | disclosed |
| WO-2005109098-A1 | PATTERN FORMING MATERIAL, PATTERN FORMING APPARATUS, AND PATTERN FORMING PROCESS | FUJI PHOTO FILM CO., LTD. (JP) | 2005-11-17 | — | — | WO | disclosed |
| WO-2005093793-A1 | PROCESS FOR FORMING PERMANENT PATTERN | FUJI PHOTO FILM CO., LTD. (JP) | 2005-10-06 | — | — | WO | disclosed |
| WO-2005093515-A1 | PHOTOSENSITIVE COMPOSITION, PHOTOSENSITIVE FILM, AND PERMANENT PATTERN AND PROCESS FOR FORMING THE SAME | FUJI PHOTO FILM CO., LTD. (JP) | 2005-10-06 | — | — | WO | disclosed |
| WO-2005091078-A1 | PATTERN FORMING PROCESS AND PATTERN | FUJI PHOTO FILM CO., LTD. (JP) | 2005-09-29 | — | — | WO | disclosed |
| WO-2005083522-A1 | PATTERN FORMING PROCESS | FUJI PHOTO FILM CO., LTD. (JP) | 2005-09-09 | — | — | WO | disclosed |