SCHEMBL28734

SCHEMBL28734

CC(C)C(C)(C)OOOC(=O)c1ccccc1

nearest known ligand 0.59

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 4/20 0.59
TSHR P16473 3/20 0.59
TDP1 Q9NUW8 3/20 0.59
HSD17B10 Q99714 1/20 0.59
LMNA P02545 4/20 0.52
F2 P00734 1/20 0.52
CYP2D6 P10635 2/20 0.44
CYP1A2 P05177 1/20 0.44
CYP2C19 P33261 1/20 0.44
MAPT P10636 2/20 0.41
L3MBTL1 Q9Y468 1/20 0.41
TP53 P04637 1/20 0.41
ADRB2 P07550 2/20 0.40
ADRB1 P08588 2/20 0.40
ADRB3 P13945 2/20 0.40
PDCD1 Q15116 1/20 0.40
CD274 Q9NZQ7 1/20 0.40
SMN1; SMN2 Q16637 2/20 0.40
MAPK1 P28482 1/20 0.40
HIF1A Q16665 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14862140 0.90 ALDH1A1 (0.68) ALDH1A1TSHRTDP1HSD17B10LMNA
SCHEMBL28697 0.82 TDP1 (0.79) ALDH1A1TSHRTDP1HSD17B10LMNA
SCHEMBL22773856 0.82 SLC6A2 (0.48) ALDH1A1TSHRTDP1HSD17B10CYP2C19
SCHEMBL28970002 0.80 CYP2D6 (0.54) ALDH1A1TSHRTDP1HSD17B10LMNA
SCHEMBL22774306 0.80 ADRB2 (0.43) ALDH1A1TSHRTDP1HSD17B10LMNA
SCHEMBL10062353 0.79 ALDH1A1 (0.68) ALDH1A1TSHRTDP1HSD17B10LMNA
SCHEMBL4783193 0.79 ALDH1A1 (0.40) ALDH1A1TSHRTDP1HSD17B10LMNA
SCHEMBL2839568 0.79 TDP1 (0.62) ALDH1A1TSHRTDP1HSD17B10LMNA
Benzoic Acid SCHEMBL7056645 0.78 TSHR (0.71) ALDH1A1TSHRTDP1HSD17B10LMNA
SCHEMBL22773841 0.78 TSHR (0.54) ALDH1A1TSHRLMNAL3MBTL1ADRB2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 367 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-10308747-B2 Modified polypropylene-based resin, polypropylene-based resin expanded sheet, expanded resin-made container, and method for producing modified polypropylene-based resin SEKISUI PLASTICS CO., LTD. (JP) 2019-06-04 US claimed
US-20260144714-A1 KIT FOR PREPARING CURABLE COMPOSITION FOR DENTAL MATERIAL, CURABLE COMPOSITION FOR DENTAL MATERIAL, AND DENTAL MATERIAL MITSUI CHEMICALS, INC. (JP) 2026-05-28 US disclosed
CN-122070346-A Adhesive composition, connection structure, and method for producing connection structure 株式会社力森诺科 2026-05-19 CN disclosed
EP-3824914-B1 MEDICAL RUBBER COMPOSITION AND MEDICAL RUBBER COMPONENT SUMITOMO RUBBER IND (JP) 2026-04-29 EP disclosed
US-20260103556-A1 METHOD FOR PRODUCING POLYMER, METHOD FOR PRODUCING CURABLE COMPOSITION, METHOD FOR PRODUCING CURED PRODUCT, AND METHOD FOR PRODUCING CONTACT LENS USING CURABLE COMPOSITION NIPPON KAYAKU KABUSHIKI KAISHA (JP) 2026-04-16 US disclosed
EP-3511348-B1 ION-EXCHANGE MEMBRANE ASTOM CORP (JP) 2026-03-04 EP disclosed
EP-4450556-B1 MEDICAL RUBBER COMPOSITION AND MEDICAL RUBBER PRODUCT SUMITOMO RUBBER IND (JP) 2026-01-28 EP disclosed
EP-4633900-A1 SACRIFICIAL ADDITIVELY MANUFACTURED MOLD WITH CONTROLLED MOISTURE AND LIQUID ABSORPTION PROPERTIES STRATASYS, INC. (US) 2025-10-22 EP disclosed
US-12421380-B2 Acrylic copolymer and rubber material OSAKA SODA CO., LTD. (JP) 2025-09-23 US disclosed
US-12378396-B2 Thermoplastic resin composition and molded article manufactured therefrom LOTTE CHEMICAL CORPORATION (KR) 2025-08-05 US disclosed
EP-1441004-A2 Halogen-free flame-retardant resin composition SHIN-ETSU CHEMICAL CO., LTD. (JP) 2004-07-28 EP disclosed
US-20030113666-A1 Lithographic printing plate precursor FUJI PHOTO FILM CO., LTD. 2003-06-19 US disclosed
US-20030107465-A1 Passive element component and substrate with built-in passive element KABUSHIKI KAISHA TOSHIBA (JP) 2003-06-12 US disclosed
US-20030096071-A1 Oil-resistant thermoplastic elastomer composition and moldings using the same JSR CORPORATION (JP) 2003-05-22 US disclosed
EP-1302313-A2 Lithographic printing plate precursor FUJI PHOTO FILM CO., LTD. (JP) 2003-04-16 EP disclosed
EP-1302507-A2 Thermoplastic elastomer composition, moldings using the same JSR Corporation (JP) 2003-04-16 EP disclosed
US-6384151-B1 REACTING MALEIC ANHYDRIDE WITH WATER, REACTING REACTION MIXTURE WITH DICYCLOPENTADIENE, REACTING PRODUCT OBTAINED WITH POLYHYDRIC ALCOHOL, OR POLYHYDRIC ALCOHOL AND POLYBASIC ACID, TO OBTAIN DICYCLOPENTADIENE-MODIFIED UNSATURATED POLYESTER NIPPON SHOKUBAI CO., LTD. (JP) 2002-05-07 US disclosed
EP-1085032-A1 DICYCLOPENTADIENE-MODIFIED UNSATURATED POLYESTER, PROCESS FOR PRODUCING THE SAME, AND RESIN AND MOLDING MATERIAL EACH CONTAINING UNSATURATED POLYESTER Nippon Shokubai Co., Ltd. (JP) 2001-03-21 EP disclosed
US-6136751-A LOW MOLECULAR WEIGHT ORGANIC MATERIAL DISPERSED IN CARBAMATE-CONTAINING ACRYLIC GRAFT POLYMER MATRIX RESIN RICOH COMPANY, LTD. (JP) 2000-10-24 US disclosed
EP-0896012-A2 Molding material Nippon Shokubai Co., Ltd. (JP) 1999-02-10 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20260144714-A1 KIT FOR PREPARING CURABLE COMPOSITION FOR DENTAL MATERIAL, CURABLE COMPOSITION FOR DENTAL MATERIAL, AND DENTAL MATERIAL CAD, KIT, ILK ALDH1A1 675/4885TSHR 4509/4885TDP1 460/4885
US-20260103556-A1 METHOD FOR PRODUCING POLYMER, METHOD FOR PRODUCING CURABLE COMPOSITION, METHOD FOR PRODUCING CURED PRODUCT, AND METHOD FOR PRODUCING CONTACT LENS USING CURABLE COMPOSITION CRYAA, HACL2, CRYAB ALDH1A1 831/4885TSHR 3244/4885TDP1 3647/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.