Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | LMNA | P02545 | 1/20 | 0.46 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.45 |
| ▸ | TSHR | P16473 | 2/20 | 0.45 |
| ▸ | NT5E | P21589 | 1/20 | 0.45 |
| ▸ | ELANE | P08246 | 2/20 | 0.43 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.43 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.41 |
| ▸ | PKM | P14618 | 5/20 | 0.39 |
| ▸ | POLB | P06746 | 2/20 | 0.38 |
| ▸ | MAPT | P10636 | 1/20 | 0.38 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.38 |
| ▸ | CA1 | P00915 | 2/20 | 0.37 |
| ▸ | CA2 | P00918 | 2/20 | 0.37 |
| ▸ | MMP1 | P03956 | 1/20 | 0.37 |
| ▸ | MMP2 | P08253 | 1/20 | 0.37 |
| ▸ | MMP9 | P14780 | 1/20 | 0.37 |
| ▸ | MMP8 | P22894 | 1/20 | 0.37 |
| ▸ | MMP13 | P45452 | 1/20 | 0.37 |
| ▸ | GAA | P10253 | 1/20 | 0.37 |
| ▸ | HSD11B1 | P28845 | 1/20 | 0.37 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL5484013 | 0.98 | LMNA (0.45) | LMNAALDH1A1TSHRNT5EELANE | |
| SCHEMBL14369906 | 0.88 | TSHR (0.52) | LMNAALDH1A1TSHRNT5EELANE | |
| SCHEMBL2870275 | 0.85 | SNCA (0.40) | LMNAALDH1A1SMN1; SMN2TDP1MAPT | |
| SCHEMBL30180801 | 0.85 | SNCA (0.40) | LMNAALDH1A1SMN1; SMN2TDP1MAPT | |
| SCHEMBL3426860 | 0.84 | ELANE (0.41) | ALDH1A1ELANESMN1; SMN2PKMPOLB | |
| SCHEMBL8496286 | 0.84 | SNCA (0.39) | LMNAALDH1A1SMN1; SMN2TDP1MAPT | |
| SCHEMBL3959387 | 0.84 | SNCA (0.39) | LMNAALDH1A1SMN1; SMN2TDP1MAPT | |
| SCHEMBL29500399 | 0.83 | TSHR (0.42) | LMNATSHRELANESMN1; SMN2TDP1 | |
| SCHEMBL482310 | 0.83 | PKM (0.58) | LMNAALDH1A1TSHRELANESMN1; SMN2 | |
| Hydrochloric Acid SCHEMBL28138788 | 0.82 | LMNA (0.42) | LMNAALDH1A1TSHRNT5EELANE |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 19 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2021241292-A1 | ACTIVE-RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTIVE-RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMATION METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE | 富士フイルム株式会社 | 2021-12-02 | — | — | WO | disclosed |
| WO-2021065450-A1 | ACTIVE LIGHT SENSITIVE OR RADIATION SENSITIVE RESIN COMPOSITION, ACTIVE LIGHT SENSITIVE OR RADIATION SENSITIVE FILM, PATTERN FORMING METHOD, AND METHOD FOR PRODUCING ELECTRONIC DEVICE | 富士フイルム株式会社 | 2021-04-08 | — | — | WO | disclosed |
| US-10248019-B2 | Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition and resist film | FUJIFILM CORPORATION (JP) | 2019-04-02 | — | — | US | disclosed |
| US-20160209747-A1 | ACTIVE LIGHT SENSITIVE OR RADIATION SENSITIVE COMPOSITION, AND RESIST FILM, PATTERN FORMING METHOD, RESIST-COATED MASK BLANK, METHOD FOR PRODUCING PHOTOMASK, PHOTOMASK, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE, EACH OF WHICH USES SAID ACTIVE LIGHT SENSITIVE OR RADIATION SENSITIVE COMPOSITION | FUJIFILM CORPORATION (JP) | 2016-07-21 | — | — | US | disclosed |
| US-20130122427-A1 | PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION AND RESIST FILM | FUJIFILM CORPORATION (JP) | 2013-05-16 | — | — | US | disclosed |
| EP-1951801-B1 | IONIZING RADIATION STABLE THERMOPLASTIC COMPOSITION, METHOD OF MAKING, AND ARTICLES FORMED THEREFROM | SABIC INNOVATIVE PLASTICS IP (NL) | 2013-01-02 | — | — | EP | disclosed |
| US-7812078-B2 | Blend of an uncappped polycarbonate and an arylcarboxylate-endcapped homo-or copolycarbonate that is prepared by interfacial polymerization of diol, activated carbonyl compound and an arylcarbonyl halide; decreased discoloration after exposure to gamma radiation | SABIC INNOVATIVE PLASTICS IP B.V. (NL) | 2010-10-12 | — | — | US | disclosed |
| EP-1951802-B1 | IONIZING RADIATION STABLE THERMOPLASTIC COMPOSITION, METHOD OF MAKING, AND ARTICLES FORMED THEREFROM | SABIC INNOVATIVE PLASTICS IP (NL) | 2010-07-28 | — | — | EP | disclosed |
| US-7649039-B2 | Blend of an uncappped polycarbonate and an arylcarboxylate-endcapped homo-or copolycarbonate that is prepared by interfacial polymerization of diol, activated carbonyl compound and an arylcarbonyl halide; decreased discoloration after exposure to gamma radiation | SABIC INNOVATIVE PLASTICS IP B.V. (NL) | 2010-01-19 | — | — | US | disclosed |
| EP-1951802-A1 | IONIZING RADIATION STABLE THERMOPLASTIC COMPOSITION, METHOD OF MAKING, AND ARTICLES FORMED THEREFROM | General Electric Company (US) | 2008-08-06 | — | — | EP | disclosed |
| EP-1951801-A2 | IONIZING RADIATION STABLE THERMOPLASTIC COMPOSITION, METHOD OF MAKING, AND ARTICLES FORMED THEREFROM | General Electric Company (US) | 2008-08-06 | — | — | EP | disclosed |
| WO-2007053311-A2 | IONIZING RADIATION STABLE THERMOPLASTIC COMPOSITION, METHOD OF MAKING, AND ARTICLES FORMED THEREFROM | GENERAL ELECTRIC COMPANY (US) | 2007-05-10 | — | — | WO | disclosed |
| WO-2007053305-A1 | IONIZING RADIATION STABLE THERMOPLASTIC COMPOSITION, METHOD OF MAKING, AND ARTICLES FORMED THEREFROM | GENERAL ELECTRIC COMPANY (US) | 2007-05-10 | — | — | WO | disclosed |
| US-20070100021-A1 | Ionizing radiation stable thermoplastic composition, method of making, and articles formed therefrom | SHPP GLOBAL TECHNOLOGIES B.V. (NL) | 2007-05-03 | — | — | US | disclosed |
| US-20070100038-A1 | Ionizing radiation stable thermoplastic composition, method of making, and articles formed therefrom | SABIC GLOBAL TECHNOLOGIES IP B.V. (NL) | 2007-05-03 | — | — | US | disclosed |
| US-6869744-B2 | Chemically amplified positive resist composition | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2005-03-22 | — | — | US | disclosed |
| US-20020042017-A1 | Chemically amplified positive resist composition | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2002-04-11 | — | — | US | disclosed |
| EP-0968196-A1 | PERFLUOROVINYL IONIC COMPOUNDS AND THEIR USE IN CONDUCTIVE MATERIALS | ACEP INC. (CA) | 2000-01-05 | — | — | EP | disclosed |
| WO-1999005126-A1 | PERFLUOROVINYL IONIC COMPOUNDS AND THEIR USE IN CONDUCTIVE MATERIALS | ACEP INC. (CA) | 1999-02-04 | — | — | WO | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-10248019-B2 | Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition and resist film | ACTR3, RXRA, RARA | LMNA 1393/4885ALDH1A1 1688/4885TSHR 3293/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.