Known targets — ChEMBL curated mechanism
ABCC8ACEADORA1ADORA2AADORA2BADORA3ALDH5A1ALOX5ALOX5APATP4AATP4BBRAFCA1CA12CA2CA4CYSLTR1DHFRDPEP1EDNRAEDNRBESR2F10FDPSFGF1GABBR1GABBR2GABRA1GABRA2GABRA3GABRA4GABRA5GABRA6GABRB1GABRB2GABRB3GABRDGABREGABRG1GABRG2GABRG3GABRPGABRQGARTGNRHRGSC1HMGCRIMPDH1IMPDH2KCNJ11LY96NOD2NR3C1NS3NS4ANS5bP2RY1P2RY12P2RY2P2RY4P2RY6PBP2XPDE3APDE3BPDE4APDE4BPDE4CPDE4DPDK1PDK2PDK3PDK4PPARGPPATPTGIRPTGS1PTGS2RAF1RYR1RYR3SCN10ASCN11ASCN1ASCN2ASCN3ASCN4ASCN5ASCN7ASCN8ASCN9ASERPINC1SLC12A1SLC12A3SYKTHRATHRBTLR3TLR4TLR9TUBA1ATUBA1BTUBA1CTUBA3CTUBA3ETUBA4ATUBBTUBB1TUBB2ATUBB2BTUBB3TUBB4ATUBB4BTUBB6TUBB8TYMSVKORC1XDHblablaIMP-1blaOXA-33blaOXA-58blaT-3blaT-4blaT-5blaT-6dacAdacBdacCfolAfolPfolP1ftsIfusAgaggyrAgyrBmecAmrcAmrcBmrdApbp1apbp1bpbp2pbp2apbp2bpbp3pbp4pbpApbpBpbpCpbpFpolponBrplArplBrplCrplDrplErplFrplJrplKrplLrplMrplNrplOrplPrplQrplRrplSrplTrplUrplVrplWrplXrplYrpmArpmBrpmCrpmDrpmErpmFrpmGrpmHrpmIrpmJrpoArpoBrpoCrpoZrpsArpsBrpsCrpsDrpsErpsFrpsGrpsHrpsIrpsJrpsKrpsLrpsMrpsNrpsOrpsPrpsQrpsRrpsSrpsTrpsUykgMykgO
The experimentally established mechanism targets of None. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL17910252 | 0.87 | — | — | |
| SCHEMBL29233 | 0.82 | — | — | |
| SCHEMBL2552665 | 0.82 | — | — | |
| SCHEMBL64142 | 0.82 | — | — | |
| SCHEMBL1812705 | 0.82 | CA1 (0.33) | — | |
| SCHEMBL7558679 | 0.67 | — | — | |
| SCHEMBL5327269 | 0.67 | — | — | |
| SCHEMBL994441 | 0.67 | — | — | |
| Water SCHEMBL8907703 | 0.67 | — | — | |
| SCHEMBL8006316 | 0.67 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 51 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20190233962-A1 | TIN-INDIUM ALLOY ELECTROPLATING SOLUTION | NEW MEXICO TECH UNIVERSITY RESEARCH PARK CORPORATION | 2019-08-01 | — | — | US | claimed |
| CN-207867820-U | A kind of display screen that industrial automation use can be dust-proof | 苏州红隼机电科技有限公司 | 2018-09-14 | — | — | CN | claimed |
| CN-108288435-A | A kind of display screen that industrial automation use can be dust-proof | 苏州甫腾智能科技有限公司 | 2018-07-17 | — | — | CN | claimed |
| US-20160137852-A1 | ANTI-FINGERPRINT TREATMENT REAGENT AND METHOD PROCESSING THE SAME | XIAMEN RUNNER INDUSTRIAL CORPORATION (CN) | 2016-05-19 | — | — | US | claimed |
| US-20250346495-A1 | ELECTRODES, ELECTRODE MATERIALS, AND MANUFACTURING THEREOF | UNIGRID INC (US) | 2025-11-13 | — | — | US | disclosed |
| EP-4069709-B1 | METAL COMPLEXES | UDC IRELAND LTD (IE) | 2025-04-23 | — | — | EP | disclosed |
| US-12281023-B2 | Electrodes, electrode materials, and manufacturing thereof | UNIGRID, INC. (US) | 2025-04-22 | — | — | US | disclosed |
| US-12281404-B2 | Tin-indium alloy electroplating solution | NEW MEXICO TECH UNIVERSITY RESEARCH PARK CORPORATION (US) | 2025-04-22 | — | — | US | disclosed |
| EP-4330257-B1 | NITROGEN-CONTAINING HETEROCYCLIC COMPOUNDS FOR ELECTROLUMINESCENT DEVICES | MERCK PATENT GMBH (DE) | 2025-03-19 | — | — | EP | disclosed |
| US-20240254001-A1 | ELECTRODES, ELECTRODE MATERIALS, AND MANUFACTURING THEREOF | UNIGRID, INC. | 2024-08-01 | — | — | US | disclosed |
| US-20230383430-A1 | TIN-INDIUM ALLOY ELECTROPLATING SOLUTION | NEW MEXICO TECH UNIVERSITY RESEARCH PARK CORPORATION | 2023-11-30 | — | — | US | disclosed |
| US-11760651-B1 | Electrodes, electrode materials, and manufacturing thereof | UNIGRID, INC. (US) | 2023-09-19 | — | — | US | disclosed |
| WO-1998045364-A1 | FLAME RETARDANT RESIN COMPOSITIONS | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1998-10-15 | — | — | WO | disclosed |
| WO-1998045363-A1 | FLAME RETARDANT RESIN COMPOSITIONS | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1998-10-15 | — | — | WO | disclosed |
| EP-0868486-A1 | POLYAMIDE OR POLYESTER COMPOSITIONS | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1998-10-07 | — | — | EP | disclosed |
| US-5708065-A | POLYESTER OR ALIPATIC POLYAMIDE, MELAMINE PYROPHOSPHATE OR MELAMINE AND ZINC BORATE | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1998-01-13 | — | — | US | disclosed |
| WO-1997023565-A1 | POLYAMIDE OR POLYESTER COMPOSITIONS | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1997-07-03 | — | — | WO | disclosed |
| US-5618865-A | POLYESTER OR POLYAMIDE, REINFORCING AGENT AND MELAMINE PHOSPHATE OR MELAMINE PYROPHOSPHATE CONTAINING CHARRING CATALYST OF CHAR FORMER | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1997-04-08 | — | — | US | disclosed |
| US-4880601-A | Hydrogen peroxide disinfecting system for contact lenses | LABORATOIRES, P.O.S. (FR) | 1989-11-14 | — | — | US | disclosed |
| US-4880601-A | Hydrogen peroxide disinfecting system for contact lenses | LABORATOIRES, P.O.S. (FR) | 1989-11-14 | — | — | US | disclosed |