Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HSD11B1 | P28845 | 1/20 | 0.44 |
| ▸ | NOX4 | Q9NPH5 | 2/20 | 0.44 |
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.43 |
| ▸ | MAPT | P10636 | 3/20 | 0.43 |
| ▸ | ACHE | P22303 | 3/20 | 0.43 |
| ▸ | BCHE | P06276 | 2/20 | 0.43 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.43 |
| ▸ | BMP1 | P13497 | 1/20 | 0.41 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.40 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.40 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.40 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.40 |
| ▸ | PKM | P14618 | 1/20 | 0.40 |
| ▸ | FFAR1 | O14842 | 1/20 | 0.39 |
| ▸ | CDK1 | P06493 | 1/20 | 0.39 |
| ▸ | CCNB1 | P14635 | 1/20 | 0.39 |
| ▸ | CCNA2 | P20248 | 1/20 | 0.39 |
| ▸ | CDK2 | P24941 | 1/20 | 0.39 |
| ▸ | CDK7 | P50613 | 1/20 | 0.39 |
| ▸ | CCNH | P51946 | 1/20 | 0.39 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2898276 | 0.94 | HSD11B1 (0.48) | HSD11B1NOX4ALDH1A1MAPTMAPK1 | |
| SCHEMBL3129717 | 0.89 | AHR (0.45) | HSD11B1NOX4ALDH1A1BMP1PKM | |
| SCHEMBL3143266 | 0.89 | AHR (0.45) | HSD11B1NOX4ALDH1A1BMP1PKM | |
| SCHEMBL13401275 | 0.89 | ACHE (0.52) | MAPTACHEMAPK1AHR | |
| SCHEMBL2901788 | 0.89 | ACHE (0.52) | ALDH1A1MAPTACHEBCHECYP1A2 | |
| SCHEMBL450797 | 0.89 | ACHE (0.52) | ALDH1A1MAPTACHEBCHECYP1A2 | |
| SCHEMBL3136569 | 0.85 | ALDH1A1 (0.46) | HSD11B1ALDH1A1MAPTACHEBCHE | |
| SCHEMBL3132913 | 0.85 | ALDH1A1 (0.46) | HSD11B1ALDH1A1MAPTACHEBCHE | |
| SCHEMBL3136043 | 0.85 | ALDH1A1 (0.46) | HSD11B1ALDH1A1MAPTACHEBCHE | |
| SCHEMBL3143572 | 0.85 | ALDH1A1 (0.46) | HSD11B1ALDH1A1MAPTACHEBCHE |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 18 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1253470-B1 | Radiation-sensitive resin composition | JSR CORP (JP) | 2010-06-16 | — | — | EP | disclosed |
| EP-1270553-B1 | Acid generator, sulfonic acid, sulfonic acid derivatives and radiation-sensitive resin composition | JSR CORP (JP) | 2009-11-18 | — | — | EP | disclosed |
| EP-1640804-B1 | Positive-tone radiation-sensitive resin composition | JSR CORP (JP) | 2008-11-19 | — | — | EP | disclosed |
| US-7335457-B2 | Positive-tone radiation-sensitive resin composition | JSR CORPORATION (JP) | 2008-02-26 | — | — | US | disclosed |
| US-7258962-B2 | Positive-tone radiation-sensitive resin composition | JSR CORPORATION (JP) | 2007-08-21 | — | — | US | disclosed |
| US-20060078821-A1 | A caroboxyalkylanthracene based compound, a hydroxy or alkoxystyrene polymer, and a sulfonimide compound as photoacid generator; low sublimation properties and excellent compatibility with other components; exhibits optimum controllability of radiation transmittance; microfabrication | JSR CORPORATION (JP) | 2006-04-13 | — | — | US | disclosed |
| EP-1640804-A2 | Positive-tone radiation-sensitive resin composition | JSR Corporation (JP) | 2006-03-29 | — | — | EP | disclosed |
| US-20050244747-A1 | Positive-tone radiation-sensitive resin composition | JSR CORPORATION (JP) | 2005-11-03 | — | — | US | disclosed |
| US-6908722-B2 | Acid generator, sulfonic acid, sulfonic acid derivatives and radiation-sensitive resin composition | JSR CORPORATION (JP) | 2005-06-21 | — | — | US | disclosed |
| US-6846607-B2 | Carbazole derivative and chemically amplified radiation-sensitive resin composition | JSR CORPORATION (JP) | 2005-01-25 | — | — | US | disclosed |
| US-6824954-B2 | DIHALOMETHYL SULFONYLOXIME COMPOUNDS; FOR EXAMPLE, 2,2-DIFLUORO-2-METHYLACETOPHENONE-O-METHYLSULFONYLOXIME; HEAT STABILITY AND STORAGE STABILITY; SENSITIVE TO FAR ULTRAVIOLET RADIATION OR ELECTRON BEAMS; RESISTS | JSR CORPORATION (JP) | 2004-11-30 | — | — | US | disclosed |
| US-6821705-B2 | USED AS CHEMICALLY AMPLIFIED RESIST, EXHIBITS HIGH SENSITIVITY, RESOLUTION, RADIATION TRANSMITTANCE, AND SURFACE SMOOTHNESS, AND IS FREE FROM THE PROBLEM OF PARTIAL INSOLUBLIZATION DURING OVEREXPOSURE | JSR CORPORATION (JP) | 2004-11-23 | — | — | US | disclosed |
| US-6770780-B1 | QUATERNIZATION OF T-BUTYL BROMOACETATE WITH TRI(N-BUTYL)PHOSPHINE TO FORM PHOSPHONIUM SALT; REACTING WITH BASE TO FORM PHOSPHORUS YLIDE; FORMING 2,4,6-TRIS(3', 5'-DI-T-BUTYL-4'-HYDROXYBENZYL)METHYL-STYRENE; HYDROLYSIS | JSR CORPORATION (JP) | 2004-08-03 | — | — | US | disclosed |
| US-20030113658-A1 | Acid generator, sulfonic acid, sulfonic acid derivatives and radiation-sensitive resin composition | JSR CORPORATION (JP) | 2003-06-19 | — | — | US | disclosed |
| US-20030113660-A1 | Sulfonyloxime compound, and radiation sensitive acid generator, positive type radiation sensitive resin composition and negative type radiation sensitive resin composition using same | JSR CORPORATION (JP) | 2003-06-19 | — | — | US | disclosed |
| EP-1270553-A2 | Acid generator, sulfonic acid, sulfonic acid derivatives and radiation-sensitive resin composition | JSR Corporation (JP) | 2003-01-02 | — | — | EP | disclosed |
| EP-1253470-A2 | Radiation-sensitive resin composition | JSR Corporation (JP) | 2002-10-30 | — | — | EP | disclosed |
| EP-1231205-A1 | VINYLPHENYLPROPIONIC ACID DERIVATIVES, PROCESSES FOR PRODUCTION OF THE DERIVATIVES, POLYMERS THEREOF AND RADIOSENSITIVE RESIN COMPOSITIONS | JSR Corporation (JP) | 2002-08-14 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20030113658-A1 | Acid generator, sulfonic acid, sulfonic acid derivatives and radiation-sensitive resin composition | ASIC1, PFAS, RARA | HSD11B1 3894/4885NOX4 1677/4885ALDH1A1 1216/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.