Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | LMNA | P02545 | 4/20 | 0.56 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.56 |
| ▸ | HTT | P42858 | 2/20 | 0.56 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.56 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.56 |
| ▸ | ALDH1A1 | P00352 | 5/20 | 0.49 |
| ▸ | MAPT | P10636 | 2/20 | 0.49 |
| ▸ | ATM | Q13315 | 1/20 | 0.49 |
| ▸ | TUBB4A | P04350 | 1/20 | 0.49 |
| ▸ | TUBB | P07437 | 1/20 | 0.49 |
| ▸ | TUBA3C | P0DPH7 | 1/20 | 0.49 |
| ▸ | TUBA1B | P68363 | 1/20 | 0.49 |
| ▸ | TUBA4A | P68366 | 1/20 | 0.49 |
| ▸ | TUBB4B | P68371 | 1/20 | 0.49 |
| ▸ | TUBB3 | Q13509 | 1/20 | 0.49 |
| ▸ | TUBB2A | Q13885 | 1/20 | 0.49 |
| ▸ | TUBB8 | Q3ZCM7 | 1/20 | 0.49 |
| ▸ | TUBA3E | Q6PEY2 | 1/20 | 0.49 |
| ▸ | TUBA1A | Q71U36 | 1/20 | 0.49 |
| ▸ | TUBA1C | Q9BQE3 | 1/20 | 0.49 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Iodobenzene SCHEMBL2896056 | 0.91 | TDP1 (0.58) | LMNATDP1HTTSMN1; SMN2L3MBTL1 | |
| SCHEMBL10413156 | 0.87 | HTT (0.60) | LMNATDP1HTTSMN1; SMN2L3MBTL1 | |
| SCHEMBL6938753 | 0.87 | HTT (0.60) | LMNATDP1HTTSMN1; SMN2L3MBTL1 | |
| Diphenylsulfane SCHEMBL14632336 | 0.87 | LMNA (0.55) | LMNATDP1HTTSMN1; SMN2L3MBTL1 | |
| SCHEMBL8057975 | 0.86 | MEN1 (0.53) | LMNAHTTSMN1; SMN2ALDH1A1MAPT | |
| SCHEMBL3100955 | 0.86 | MEN1 (0.53) | LMNAHTTSMN1; SMN2ALDH1A1MAPT | |
| Iodide SCHEMBL9733834 | 0.86 | HTT (0.58) | LMNATDP1HTTSMN1; SMN2L3MBTL1 | |
| Iodobenzene SCHEMBL2339151 | 0.85 | TDP1 (0.44) | LMNATDP1HTTSMN1; SMN2ALDH1A1 | |
| SCHEMBL196606 | 0.84 | TDP1 (0.70) | LMNATDP1HTTSMN1; SMN2L3MBTL1 | |
| Iodobenzene SCHEMBL2904026 | 0.83 | TDP1 (0.51) | LMNATDP1HTTSMN1; SMN2L3MBTL1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 25 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-114341215-A | Curable composition | 株式会社日本触媒 | 2022-04-12 | — | — | CN | disclosed |
| CN-107406407-B | Liquid crystal composition, polymer/liquid crystal composite material, optical element, and compound | 捷恩智株式会社 | 2021-01-22 | — | — | CN | disclosed |
| US-20150185512-A1 | LIQUID-CRYSTAL DISPLAY ELEMENT AND SUBSTRATE USED IN SAME | KYUSHU UNIVERSITY, NATIONAL UNIVERSITY CORPORATION (JP) | 2015-07-02 | — | — | US | disclosed |
| US-20130021546-A1 | LIQUID-CRYSTAL DISPLAY ELEMENT AND SUBSTRATE USED IN SAME | KYUSHU UNIVERSITY, NATIONAL UNIVERSITY CORPORATION (JP) | 2013-01-24 | — | — | US | disclosed |
| EP-1253470-B1 | Radiation-sensitive resin composition | JSR CORP (JP) | 2010-06-16 | — | — | EP | disclosed |
| EP-1238972-B1 | Novel carbazole derivative and chemically amplified radiation-sensitive resin composition | JSR CORP (JP) | 2009-12-16 | — | — | EP | disclosed |
| EP-1270553-B1 | Acid generator, sulfonic acid, sulfonic acid derivatives and radiation-sensitive resin composition | JSR CORP (JP) | 2009-11-18 | — | — | EP | disclosed |
| US-7323284-B2 | Negative type radiation sensitive resin composition | JSR CORPORATION (JP) | 2008-01-29 | — | — | US | disclosed |
| US-6908722-B2 | Acid generator, sulfonic acid, sulfonic acid derivatives and radiation-sensitive resin composition | JSR CORPORATION (JP) | 2005-06-21 | — | — | US | disclosed |
| US-6846607-B2 | Carbazole derivative and chemically amplified radiation-sensitive resin composition | JSR CORPORATION (JP) | 2005-01-25 | — | — | US | disclosed |
| EP-1343048-A2 | Anthracene derivative and radiation-sensitive resin composition | JSR Corporation (JP) | 2003-09-10 | — | — | EP | disclosed |
| US-20030113658-A1 | Acid generator, sulfonic acid, sulfonic acid derivatives and radiation-sensitive resin composition | JSR CORPORATION (JP) | 2003-06-19 | — | — | US | disclosed |
| US-20030113660-A1 | Sulfonyloxime compound, and radiation sensitive acid generator, positive type radiation sensitive resin composition and negative type radiation sensitive resin composition using same | JSR CORPORATION (JP) | 2003-06-19 | — | — | US | disclosed |
| US-20030022095-A1 | Negative type radiation sensitive resin composition | JSR CORPORATION (JP) | 2003-01-30 | — | — | US | disclosed |
| EP-1270553-A2 | Acid generator, sulfonic acid, sulfonic acid derivatives and radiation-sensitive resin composition | JSR Corporation (JP) | 2003-01-02 | — | — | EP | disclosed |
| US-20020192593-A1 | Used as chemically amplified resist, exhibits high sensitivity, resolution, radiation transmittance, and surface smoothness, and is free from the problem of partial insolublization during overexposure | JSR CORPORATION (JP) | 2002-12-19 | — | — | US | disclosed |
| US-20020172885-A1 | Novel carbazole derivative and chemically amplified radiation-sensitive resin composition | JSR CORPORATION (JP) | 2002-11-21 | — | — | US | disclosed |
| EP-1253470-A2 | Radiation-sensitive resin composition | JSR Corporation (JP) | 2002-10-30 | — | — | EP | disclosed |
| EP-1238972-A1 | Novel carbazole derivative and chemically amplified radiation-sensitive resin composition | JSR Corporation (JP) | 2002-09-11 | — | — | EP | disclosed |
| EP-1231205-A1 | VINYLPHENYLPROPIONIC ACID DERIVATIVES, PROCESSES FOR PRODUCTION OF THE DERIVATIVES, POLYMERS THEREOF AND RADIOSENSITIVE RESIN COMPOSITIONS | JSR Corporation (JP) | 2002-08-14 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20020172885-A1 | Novel carbazole derivative and chemically amplified radiation-sensitive resin composition | ARID2, RAD1, RAD51 | LMNA 3785/4885TDP1 958/4885HTT 3475/4885 |
| US-20130021546-A1 | LIQUID-CRYSTAL DISPLAY ELEMENT AND SUBSTRATE USED IN SAME | ZKSCAN2, L1CAM, SDC2 | LMNA 1704/4885TDP1 3216/4885HTT 4122/4885 |
| US-20030113658-A1 | Acid generator, sulfonic acid, sulfonic acid derivatives and radiation-sensitive resin composition | ASIC1, PFAS, RARA | LMNA 3265/4885TDP1 2888/4885HTT 4125/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.