SCHEMBL294982

SCHEMBL294982

CC(C)OC(=O)C1CC1(C)C

nearest known ligand 0.39

Predicted protein targets (top 15)

geneUniProtsupporting neighboursconfidence
TSHR P16473 3/20 0.39
KDM4E B2RXH2 1/20 0.34
USP2 O75604 1/20 0.34
ALDH1A1 P00352 1/20 0.34
LMNA P02545 1/20 0.34
HSD17B10 Q99714 1/20 0.34
SMN1; SMN2 Q16637 1/20 0.34
CHRNB2 P17787 1/20 0.33
CHRNA3 P32297 1/20 0.33
CHRNA4 P43681 1/20 0.33
CHRNB3 Q05901 1/20 0.33
CHRNA6 Q15825 1/20 0.33
POLB P06746 1/20 0.31
HCAR2 Q8TDS4 1/20 0.31
GAA P10253 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6447701 0.78 CHRNB2 (0.32) TSHRCHRNB2CHRNA3CHRNA4CHRNB3
SCHEMBL11216230 0.78 LMNA (0.33) TSHRKDM4EUSP2ALDH1A1LMNA
SCHEMBL1577528 0.77 TSHR (0.34) TSHRKDM4EUSP2ALDH1A1LMNA
SCHEMBL12786300 0.77 GAA (0.42) TSHRSMN1; SMN2GAA
SCHEMBL12132942 0.76 TSHR (0.37) TSHRKDM4EUSP2ALDH1A1LMNA
SCHEMBL7103265 0.75 CHRNB2 (0.30) CHRNB2CHRNA3CHRNA4CHRNB3CHRNA6
SCHEMBL294509 0.73
SCHEMBL15977400 0.72 TSHR (0.35) TSHRALDH1A1LMNASMN1; SMN2POLB
SCHEMBL9348489 0.72
SCHEMBL293438 0.72 TSHR (0.39) TSHRALDH1A1LMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 17 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1683782-B1 Chiral copper complex and production processes thereof and using the same SUMITOMO CHEMICAL CO (JP) 2012-03-14 EP disclosed
EP-1683783-B1 Chiral copper complex and production processes thereof and using the same SUMITOMO CHEMICAL CO (JP) 2012-03-14 EP disclosed
EP-1120402-B1 Chiral copper complex and production processes thereof and using the same SUMITOMO CHEMICAL CO (JP) 2008-06-25 EP disclosed
CN-1310924-C Chiral copper complex and production processes thereof and using the same SUMITOMO CHEMICAL CO (JP) 2007-04-18 CN disclosed
EP-1683782-A2 Chiral copper complex and production processes thereof and using the same Sumitomo Chemical Company, Limited (JP) 2006-07-26 EP disclosed
EP-1683783-A2 Chiral copper complex and production processes thereof and using the same Sumitomo Chemical Company, Limited (JP) 2006-07-26 EP disclosed
CN-1246299-C Chiral copper complex, preparation method and application thereof SUMITOMO CHEMICAL CO (JP) 2006-03-22 CN disclosed
US-7009079-B2 Chiral copper complex and production processes thereof and using the same SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2006-03-07 US disclosed
CN-1616465-A Chiral copper complex and production processes thereof and using the same SUMITOMO CHEMICAL CO (JP) 2005-05-18 CN disclosed
US-20050090684-A1 Chiral copper complex and production processes thereof and using the same SUMITOMO CHEMICAL CO., LTD. 2005-04-28 US disclosed
US-6670500-B2 Chiral copper complex and production processes thereof and using the same SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2003-12-30 US disclosed
US-6469198-B2 OBTAINED BY CONTACTING N-SALICYLIDENEAMINOALCOHOL WITH MONO OR DIVALENT COPPER COMPOUND; FORMATION OF OPTICALLY ACTIVE CYCLOPROPANE-CARBOXYLIC ESTER FROM PROCHIRAL OLEFIN AND DIAZOACETIC ACID ESTER SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2002-10-22 US disclosed
US-20020004618-A1 Chiral copper complex and production processes thereof and using the same SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2002-01-10 US disclosed
US-20010037036-A1 Chiral copper complex catalyst composition and asymmetric production process using the same SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2001-11-01 US disclosed
CN-1313277-A Chiral copper complex, preparation method and application thereof SUMITOMO CHEMICAL CO (JP) 2001-09-19 CN disclosed
EP-1120401-A2 Chiral copper complex catalyst composition and asymmetric production process using the same SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2001-08-01 EP disclosed
EP-1120402-A2 Chiral copper complex and production processes thereof and using the same SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2001-08-01 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20050090684-A1 Chiral copper complex and production processes thereof and using the same SOD1, CYP1A1, NFXL1 TSHR 1375/4885KDM4E 3764/4885USP2 308/4885
US-20010037036-A1 Chiral copper complex catalyst composition and asymmetric production process using the same AP1M1, UBA3, AP1S1 TSHR 4320/4885KDM4E 3086/4885USP2 63/4885
US-20020004618-A1 Chiral copper complex and production processes thereof and using the same SOD1, XDH, NFXL1 TSHR 2499/4885KDM4E 3518/4885USP2 243/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.