Known targets — ChEMBL curated mechanism
ABL1BMXBRAFBTKCHRNA4CHRNB2CSNK1EEGFRERBB2F10FLT1FLT3FLT4IGF1RINSRITKJAK3KDRKITOPRM1PARP1PARP2PDGFRBPIK3CDRAF1RETSLC18A2TECTXKdacAdacBdacCftsImrcAmrcBmrdArplArplBrplCrplDrplErplFrplJrplKrplLrplMrplNrplOrplPrplQrplRrplSrplTrplUrplVrplWrplXrplYrpmArpmBrpmCrpmDrpmErpmFrpmGrpmHrpmIrpmJrpsArpsBrpsCrpsDrpsErpsFrpsGrpsHrpsIrpsJrpsKrpsLrpsMrpsNrpsOrpsPrpsQrpsRrpsSrpsTrpsUykgMykgO
The experimentally established mechanism targets of None. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 7/20 | 0.40 |
| ▸ | NPC1 | O15118 | 2/20 | 0.38 |
| ▸ | RAB9A | P51151 | 2/20 | 0.38 |
| ▸ | GAA | P10253 | 2/20 | 0.38 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.38 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.37 |
| ▸ | TSHR | P16473 | 1/20 | 0.37 |
| ▸ | CNR1 | P21554 | 1/20 | 0.36 |
| ▸ | CNR2 | P34972 | 1/20 | 0.36 |
| ▸ | ADORA3 | P0DMS8 | 1/20 | 0.36 |
| ▸ | KCNH2 | Q12809 | 1/20 | 0.35 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.35 |
| ▸ | EPHX2 | P34913 | 1/20 | 0.35 |
| ▸ | PSEN1 | P49768 | 1/20 | 0.35 |
| ▸ | PSEN2 | P49810 | 1/20 | 0.35 |
| ▸ | APH1B | Q8WW43 | 1/20 | 0.35 |
| ▸ | NCSTN | Q92542 | 1/20 | 0.35 |
| ▸ | APH1A | Q96BI3 | 1/20 | 0.35 |
| ▸ | PSENEN | Q9NZ42 | 1/20 | 0.35 |
| ▸ | POLB | P06746 | 2/20 | 0.34 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL244367 | 0.79 | KMT2A (0.41) | ALDH1A1NPC1RAB9AGAACYP3A4 | |
| Trifluoromethanesulfonic Acid SCHEMBL7082064 | 0.77 | KMT2A (0.31) | ALDH1A1KMT2AMAPT | |
| SCHEMBL7682726 | 0.75 | ALDH1A1 (0.47) | ALDH1A1NPC1RAB9AGAACYP2D6 | |
| SCHEMBL1553778 | 0.75 | ALDH1A1 (0.47) | ALDH1A1NPC1RAB9AGAACYP2D6 | |
| SCHEMBL5561314 | 0.75 | ALDH1A1 (0.47) | ALDH1A1NPC1RAB9AGAACYP2D6 | |
| SCHEMBL2799786 | 0.74 | ALDH1A1 (0.46) | ALDH1A1NPC1RAB9AGAACYP2D6 | |
| SCHEMBL5566428 | 0.73 | CYP2D6 (0.48) | ALDH1A1NPC1RAB9AGAACYP2D6 | |
| SCHEMBL3965098 | 0.73 | ALDH1A1 (0.41) | ALDH1A1NPC1RAB9AGAACYP2D6 | |
| Phosphine SCHEMBL28194487 | 0.72 | GAA (0.52) | ALDH1A1GAACYP2D6CYP3A4TSHR | |
| Cyclohexanone SCHEMBL669721 | 0.71 | ALDH1A1 (0.45) | ALDH1A1GAACYP2D6CYP3A4KMT2A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 25 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20260146026-A1 | COMPOUND, COMPOSITION, CURED PRODUCT, METHOD FOR PRODUCING CURED PRODUCT, AND METHOD FOR PRODUCING ELECTRONIC COMPONENT | ADEKA CORPORATION (JP) | 2026-05-28 | — | — | US | disclosed |
| US-20260008932-A1 | COMPOSITION FOR FORMING RESIST UNDERLAYER FILM, PATTERNING PROCESS, AND RESIST UNDERLAYER FILM FORMATION PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2026-01-08 | — | — | US | disclosed |
| CN-120202438-A | Photosensitive resin composition, photosensitive resin coating film, photosensitive dry film, pattern forming method and light emitting element | 信越化学工业株式会社 | 2025-06-24 | — | — | CN | disclosed |
| CN-120092212-A | Photosensitive resin composition, photosensitive resin coating film, photosensitive dry film, pattern forming method and light emitting element | 信越化学工业株式会社 | 2025-06-03 | — | — | CN | disclosed |
| CN-120019329-A | Photosensitive resin composition, photosensitive resin coating film, photosensitive dry film, pattern forming method and light emitting element | 信越化学工业株式会社 | 2025-05-16 | — | — | CN | disclosed |
| CN-119987132-A | Photosensitive resin composition, photosensitive resin coating film, photosensitive dry film and pattern forming method | 信越化学工业株式会社 | 2025-05-13 | — | — | CN | disclosed |
| CN-119955091-A | Polymer, positive-type negative-type photosensitive resin composition, pattern forming method, cured film forming method, interlayer insulating film, surface protective film, and electronic component | 信越化学工业株式会社 | 2025-05-09 | — | — | CN | disclosed |
| EP-4508493-A1 | PHOTOLITHOGRAPHIC METHOD USING SILICON PHOTORESIST | Suntific Materials (Weifang), Ltd. (CN) | 2025-02-19 | — | — | EP | disclosed |
| EP-4508495-A1 | MANUFACTURE OF INTEGRATED CIRUIT USING POSITIVE TONE PHOTOPATTERNABLE DIELECTRIC INCLUDING HIGH SILICON CONTENT POLYSILSESQUIOXANE | Suntific Materials (Weifang), Ltd. (CN) | 2025-02-19 | — | — | EP | disclosed |
| CN-119439625-A | Negative photosensitive resin composition, pattern forming method, cured coating film forming method, interlayer insulating film, surface protective film, and electronic component | 信越化学工业株式会社 | 2025-02-14 | — | — | CN | disclosed |
| CN-111381447-B | Photosensitive resin composition, laminate, and pattern forming method | 信越化学工业株式会社 | 2024-03-08 | — | — | CN | disclosed |
| CN-111234236-B | Siloxane polymer containing isocyanuric acid and polyether skeleton, photosensitive resin composition, and pattern formation method | 信越化学工业株式会社 | 2023-03-24 | — | — | CN | disclosed |
| CN-111205463-B | Polysiloxane skeleton polymer, photosensitive resin composition, pattern forming method and manufacturing of optical semiconductor device | 信越化学工业株式会社 | 2023-02-14 | — | — | CN | disclosed |
| CN-108388082-B | Photosensitive resin composition, photosensitive dry film, photosensitive resin coating and pattern forming method | 信越化学工业株式会社（JP） | 2023-01-13 | — | — | CN | disclosed |
| CN-115044040-A | Polyimide-containing polymer, positive photosensitive resin composition, negative photosensitive resin composition, and pattern formation method | 信越化学工业株式会社 | 2022-09-13 | — | — | CN | disclosed |
| CN-115023653-A | Photosensitive resin composition, photosensitive resin coating film, photosensitive dry film, and pattern formation method | 信越化学工业株式会社 | 2022-09-06 | — | — | CN | disclosed |
| CN-114746809-A | Photosensitive resin composition, photosensitive resin coating film, photosensitive dry film, pattern forming method, and light-emitting element | 信越化学工业株式会社 | 2022-07-12 | — | — | CN | disclosed |
| WO-2022131346-A1 | COMPOUND AND COMPOSITION | 株式会社ADEKA | 2022-06-23 | — | — | WO | disclosed |
| CN-109422881-B | Epoxy group-containing isocyanurate-modified silicone resin, photosensitive resin composition, photosensitive dry film, laminate, and pattern formation method | 信越化学工业株式会社 | 2022-04-19 | — | — | CN | disclosed |
| CN-114253069-A | Photosensitive resin composition, pattern forming method, cured film forming method, interlayer insulating film, and surface protective film | 信越化学工业株式会社 | 2022-03-29 | — | — | CN | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20260008932-A1 | COMPOSITION FOR FORMING RESIST UNDERLAYER FILM, PATTERNING PROCESS, AND RESIST UNDERLAYER FILM FORMATION PROCESS | ASH2L, ALKBH2, ITGA1 | ALDH1A1 841/4885NPC1 4479/4885RAB9A 2955/4885 |
| US-20260146026-A1 | COMPOUND, COMPOSITION, CURED PRODUCT, METHOD FOR PRODUCING CURED PRODUCT, AND METHOD FOR PRODUCING ELECTRONIC COMPONENT | CBR3, CBR1, NOTUM | ALDH1A1 827/4885NPC1 2346/4885RAB9A 3875/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.