Predicted protein targets (top 14)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | PGR | P06401 | 5/20 | 0.47 |
| ▸ | HSD11B1 | P28845 | 1/20 | 0.47 |
| ▸ | NFE2L2 | Q16236 | 4/20 | 0.46 |
| ▸ | KEAP1 | Q14145 | 3/20 | 0.46 |
| ▸ | KAT6A | Q92794 | 3/20 | 0.45 |
| ▸ | TAS2R14 | Q9NYV8 | 1/20 | 0.45 |
| ▸ | MEP1B | Q16820 | 1/20 | 0.43 |
| ▸ | FFAR4 | Q5NUL3 | 1/20 | 0.43 |
| ▸ | CTSG | P08311 | 1/20 | 0.42 |
| ▸ | CMA1 | P23946 | 1/20 | 0.42 |
| ▸ | CA12 | O43570 | 1/20 | 0.40 |
| ▸ | CA1 | P00915 | 1/20 | 0.40 |
| ▸ | CA2 | P00918 | 1/20 | 0.40 |
| ▸ | CA9 | Q16790 | 1/20 | 0.40 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3177012 | 1.00 | PGR (0.47) | PGRHSD11B1NFE2L2KEAP1KAT6A | |
| SCHEMBL3177826 | 0.95 | MEP1B (0.46) | PGRHSD11B1NFE2L2KEAP1KAT6A | |
| SCHEMBL3166497 | 0.86 | KMT2A (0.48) | PGRHSD11B1CA1CA2 | |
| SCHEMBL3160621 | 0.81 | HTR6 (0.40) | NFE2L2KEAP1MEP1BFFAR4 | |
| SCHEMBL30137796 | 0.81 | HTR6 (0.40) | NFE2L2KEAP1MEP1BFFAR4 | |
| SCHEMBL65095 | 0.80 | SMN1; SMN2 (0.46) | CA12CA1CA2CA9 | |
| SCHEMBL3160442 | 0.80 | HTR6 (0.39) | NFE2L2KEAP1MEP1BFFAR4 | |
| SCHEMBL28299239 | 0.80 | MTNR1B (0.41) | PGRHSD11B1NFE2L2KEAP1TAS2R14 | |
| SCHEMBL30137805 | 0.80 | HTR6 (0.39) | NFE2L2KEAP1MEP1BFFAR4 | |
| SCHEMBL6932659 | 0.80 | HSD11B1 (0.54) | PGRHSD11B1KAT6A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-122072436-A | Negative photosensitive resin composition, cured film, and resist film | DIC株式会社 | 2026-05-22 | — | — | CN | disclosed |
| CN-119575759-A | Positive photosensitive resin composition, photosensitive film, resist underlayer film, resist permanent film, and method for producing film | DIC株式会社 | 2025-03-07 | — | — | CN | disclosed |
| CN-113348188-B | Phenolic hydroxyl group-containing resin, photosensitive composition, resist film, curable composition, and cured product | DIC株式会社 | 2024-05-10 | — | — | CN | disclosed |
| CN-118011733-A | Positive photosensitive resin composition, resist film, resist underlayer film, and resist permanent film | DIC株式会社 | 2024-05-10 | — | — | CN | disclosed |
| CN-117075428-A | Negative photosensitive resin composition | DIC株式会社 | 2023-11-17 | — | — | CN | disclosed |
| CN-110959138-B | Resist material | DIC株式会社 | 2023-06-30 | — | — | CN | disclosed |